Patents by Inventor Hiroyuki Tamura

Hiroyuki Tamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6157122
    Abstract: A color cathode ray tube having electron gun with a plurality of electrodes for generating and focusing three in-line electron beams toward a phosphor screen. A deflection device is mounted between a funnel portion and a neck portion for deflecting the three electron beams in horizontal and vertical directions, and a convergence correction device including a plurality of magnetic pieces positioned with respect to the three electron beams in an in-line direction of the three electron beams in magnetic deflection fields generated by the deflection device.
    Type: Grant
    Filed: May 4, 1999
    Date of Patent: December 5, 2000
    Assignees: Hitachi, Ltd., Hitachi Device Engineering Co., Ltd.
    Inventors: Masayoshi Misono, Hiroyuki Tamura, Tsutomu Tojyo
  • Patent number: 6144151
    Abstract: A color cathode ray tube has at least an electron gun, constituted by a cathode for forming a plurality of electron beams arranged in line and a plurality of electrodes, and a fluorescent screen, wherein the plurality of electrodes including an anode are arranged in the axial direction of the tube and have dissimilar potentials, and a main lens is constituted of the anode and another electrode neighboring the anode. The electrode neighboring the anode includes at least two division electrodes having the same potential and being arranged with a gap in the axial direction of the tube, and one of the division electrodes is opposed to the anode and has, in the opposed surface thereof, a single opening for passing the plurality of electron beams in common. The one division electrode opposed to the anode has a length in the axial direction of the tube that is from about 1.0 to about 1.6 times as great as the diameter of the single opening in a direction at right angles with the in-line direction.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: November 7, 2000
    Assignees: Hitachi, Ltd., Hitachi Device Engineering Co., Ltd.
    Inventors: Tsutomu Tojo, Hiroyuki Tamura, Masayoshi Misono
  • Patent number: 6005340
    Abstract: A color cathode ray tube includes an electron gun having a plurality of electrodes, an electron beam deflection device and a phosphor screen. A deflection defocusing correcting element is located in a deflection magnetic field produced by the deflection device to locally modify the magnetic field in a path of an electron beam and corrects the deflection defocusing of the electron beam corresponding to deflection of the electron beam. The deflection defocusing element includes the magnetic metal plate providing magnetic pole pieces and a non-magnetic metal support for holding the magnetic metal plate in place. The magnetic metal plate and the non-magnetic metal support are laminated or clad one on another, or joined edge-to-edge.
    Type: Grant
    Filed: February 26, 1997
    Date of Patent: December 21, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Masayoshi Misono, Tutomu Tojyo, Hiroyuki Tamura, Mitsuhiro Sugiyama
  • Patent number: 5912530
    Abstract: A color cathode ray tube includes a vacuum envelope formed by a panel, neck and funnel portions. The cathode ray tube includes a phosphor screen, a shadow mask, an electron gun and a deflection device. The cathode ray tube further includes a convergence correction device having a plurality of magnetic pieces positioned on opposite sides of each of the three electron beams in an in-line direction of the electron beams in a magnetic deflection fields generated by the deflection device. The plurality of magnetic pieces include a first pair of magnetic pieces positioned on a neck wall side of each of side electron beams in the in-line direction and a second pair of magnetic pieces positioned on opposite sides of a center electron beam of the three electron beams in the in-line direction. The plurality of magnetic pieces are configured so as to locally modify the magnetic deflection fields to make three rasters formed on the phosphor screen by the three electron beams coincident with each other.
    Type: Grant
    Filed: August 19, 1997
    Date of Patent: June 15, 1999
    Assignees: Hitachi, Ltd., Hitachi Device EngineeringCo., Ltd.
    Inventors: Masayoshi Misono, Hiroyuki Tamura, Tsutomu Tojyo
  • Patent number: 5817892
    Abstract: A process for producing an unsaturated alcohol wherein the catalytic activity and the capability of maintaining double bond are sustained for a long time and side-reactions are suppressed. An unsaturated alcohol is obtained by hydrogenating an alkyl or alkenyl ester of an unsaturated fatty acid or a triglyceride having a long-chain aliphatic unsaturated hydrocarbon group in the presence of a catalytic composition which is a composite metal oxide consisting of (a) zinc oxide and (b) oxide(s) of at least one metal selected from the group consisting of the elements of the group 3A in the periodic table and having a weight ratio of (a)/(b) of from 1/0.01 to 1/1.2.
    Type: Grant
    Filed: August 21, 1997
    Date of Patent: October 6, 1998
    Assignee: Kao Corporation
    Inventors: Hiroyuki Tamura, Hideo Tahara, Yoshinori Mitsuda, Yasuyuki Hattori
  • Patent number: 5293059
    Abstract: A MOS semiconductor device with a double-layer gate electrode structure includes a silicon substrate and a field oxide layer which is selectively formed on one major surface of the substrate in such a manner as to surround an active region. A first silicon oxide layer is deposited in a region of a gate electrode of the semiconductor device. A polycrystalline silicon layer is provided on the first silicon layer and in a portion which extends from the region of the gate electrode to above the field oxide layer. Source and drain diffusion regions are defined in a part of the active region of the major surface of the substrate. An impurity-doped second silicon oxide layer is deposited on the entire surface of a laminate which is constituted by the substrate to the source and drain diffusion regions except for the surface of that portion of the polycrystalline silicon layer which overlies the field oxide layer.
    Type: Grant
    Filed: March 10, 1992
    Date of Patent: March 8, 1994
    Assignee: Oki Electric Industry Co., Ltd.
    Inventor: Hiroyuki Tamura
  • Patent number: 5254705
    Abstract: A process for producing desulfurized fats and oils or fatty acid esters, which are highly suitable as a starting material for producing alcohols via hydrogenation, at a high yield is disclosed. Desulfurized fats and oils or fatty acid esters are obtained by contacting fats and oils or fatty acid esters with a catalyst represented by the following formula (I) under a hydrogen atmosphere or a mixture of hydrogen with an inert gas:Ni.Cu.sub.x O.sub.y (I)wherein x represents an atomic ratio of Cu determined by referring Ni as 1 and a value of from 0.02 to 8; and y is an atomic ratio of oxygen satisfying the valence requirements of Ni and Cu. A process for producing alcohols using the desulfurized fats and oils or fatty acid esters is also disclosed. A process for producing an alcohols using desulfurized fats and oils or fatty acid esters is also disclosed.
    Type: Grant
    Filed: May 29, 1992
    Date of Patent: October 19, 1993
    Assignee: Kao Corporation
    Inventors: Yasuyuki Hattori, Hiroyuki Tamura, Hidetoshi Kadowaki, Kiyoshi Tsukada
  • Patent number: 5250713
    Abstract: A process for producing desulfurized fats and oils or fatty acid esters is disclosed, which comprises treating fats and oils or fatty acid esters under hydrogen or a mixture of hydrogen and an inert gas atmosphere at a pressure of from 0.1 to 500 kg/cm.sup.2 in the absolute pressure at a temperature of from 100.degree. to 350.degree. C. in the presence of a catalyst of the following formula (I):Cu.multidot.X.sub.x .multidot.Y.sub.y .multidot.O.sub.z (I)wherein all symbols are defined in the disclosure. A process for producing an alcohols using desulfurized fats and oils or fatty acid esters is also disclosed. According to the process for producing an alcohol of the present invention, an alcohol of a high purity and good qualities can efficiently and effectively be produced.
    Type: Grant
    Filed: March 11, 1992
    Date of Patent: October 5, 1993
    Assignee: Kao Corporation
    Inventors: Hiroyuki Tamura, Yasuyuki Hattori, Kunizo Hashiba, Osamu Tabata, Kiyoshi Tsukada, Noriaki Fukuoka
  • Patent number: 5120885
    Abstract: A process for producing alcohols comprising catalytically reducing fats and oils or fatty acid esters with hydrogen in the presence of a catalyst for ester reduction is disclosed, wherein the starting oils are first treated at a temperature of from 50.degree. to 200.degree. C. in hydrogen gas or a mixed gas of hydrogen and an inert gas in the presence of a nickel catalyst to yield a sulfur content at not more than 0.6 ppm an acid value (KOH mg/g) of not more than 2. By use of the thus purified starting oils, the catalyst for ester reduction exhibits a prolonged duration.
    Type: Grant
    Filed: September 9, 1991
    Date of Patent: June 9, 1992
    Assignee: Kao Corporation
    Inventors: Kiyoshi Tsukada, Yasuyuki Hattori, Hiroyuki Tamura, Akira Yamamuro, Kunizo Hashiba, Osamu Tabata
  • Patent number: 4900690
    Abstract: A MOS semiconductor device with a double-layer gate electrode structure includes a silicon substrate and a field oxide layer which is selectively formed on one major surface of the substrate in such a manner as to surround an active region. A first silicon oxide layer is deposited in a region of a gate electrode of the semiconductor device. A polycrystalline silicon layer is provided on the first silicon layer and in a portion which extends from the region of the gate electrode to above the field oxide layer. Source and drain diffusion regions are defined in a part of the active region of the major surface of the substrate. An impurity-doped second silicon oxide layer is deposited on the entire surface of a laminate which is constituted by the substrate to the source and drain diffusion regions except for the surface of that portion of the polycrystalline silicon layer which overlies the field oxide layer.
    Type: Grant
    Filed: September 6, 1988
    Date of Patent: February 13, 1990
    Assignee: OKI Electric Industry Co., Ltd.
    Inventor: Hiroyuki Tamura
  • Patent number: 4438079
    Abstract: Arsenic anhydride of high purity is inexpensively manufactured from an arsenic sulfide-containing substance by first contacting the arsenic sulfide-containing substance with a copper sulfate-containing aqueous solution so as to provide an extract solution containing arsenious acid, the extract solution is subjected to aeration in the presence of copper ions such that the arsenious acid therein is mostly oxidized to arsenic acid, the thus provided treated solution is subjected to a weak reducing agent to cause crystals of arsenious anhydride to form, and these crystals are then recovered.
    Type: Grant
    Filed: March 26, 1982
    Date of Patent: March 20, 1984
    Assignee: Sumitomo Metal Mining Company Limited
    Inventors: Tadashi Nakano, Hiroyuki Tamura, Naoki Kubo