Abstract: An object of the present invention is to provide a resin membrane filter having excellent separation accuracy, toughness, and filtration speed, and a manufacturing method of the resin membrane filter. The resin membrane filter of the present invention includes a first main surface, a second main surface, and a plurality of through-holes, in which the resin membrane filter is a single membrane, in the through-hole, in a case where an average area of an opening portion at a position A which is located at a distance of 10% of a thickness of the resin membrane filter from the first main surface is denoted as Sva and an average area of an opening portion at a position B which is located at a distance of 90% of the thickness of the resin membrane filter from the first main surface is denoted as Svb, Sva/Svb<0.80, and a number ratio Ra of through-holes in which an area of the opening portion at the position A is more than 1.2 times Sva is 3.0% or less.

Abstract: An object of the present invention is to provide a resin membrane filter having excellent separation accuracy and excellent toughness, and a manufacturing method of the resin membrane filter. The resin membrane filter of the present invention includes a first main surface, a second main surface, and a plurality of through-holes, in which, in the through-hole, in a case where an average area of an opening portion at a position A which is located at a distance of 10% of a thickness of the resin membrane filter from the first main surface is denoted as Sva and an average area of an opening portion at a position B which is located at a distance of 90% of the thickness of the resin membrane filter from the first main surface is denoted as Svb, 0.8?Sva/Svb?1.25, a number ratio Ra of through-holes in which an area of the opening portion at the position A is more than 1.25 times Sva is 3.0% or less, and a number ratio Rb of through-holes in which an area of the opening portion at the position B is more than 1.

Abstract: An antifogging laminate includes a coating layer on a water absorbent film, in which a water absorption rate of the water absorbent film is 1% or more and 50% or less, and the coating layer contains a water absorbent resin and inorganic oxide particles.

Abstract: Provided are a method for producing a laminate, including a step 1 of preparing a laminate precursor having a base material, a first transparent conductive portion, and a photosensitive composition layer in this order, a step 2 of pattern-exposing the photosensitive composition layer with scattered light from a side of the photosensitive composition layer opposite to a side on which the base material is provided, and a step 3 of developing the pattern-exposed photosensitive composition layer to form a patterned cured layer; and an application thereof.

Abstract: An antifogging laminate includes a coating layer on a water absorbent film, in which a water absorption rate of the water absorbent film is 1% or more and 50% or less, and the coating layer contains a water absorbent resin and inorganic oxide particles.

Abstract: A coating agent includes a hydrolyzate of a compound represented by General Formula (1), silica particles, a high boiling point solvent having a boiling point of 120° C. or higher, and a resin having a pyrrolidone group in a side chain. In General Formula (1), R1, R2, R3, and R4 each independently represent a monovalent organic group having 1 to 6 carbon atoms.

Abstract: An object is to provide a photosensitive composition capable of obtaining a cured film having excellent reliability even when being heated at a low temperature and patterning by photolithography. A photosensitive composition of the present invention includes a polymerizable monomer having three or more (meth)acryloyl groups and one or more carboxy groups in a molecule as Component A, a polymerizable monomer having three or more (meth)acryloyl groups and not having a carboxy group in a molecule as Component B, a photopolymerization initiator as Component C, a solvent as Component D, a blocked isocyanate compound as Component N, and a polymerization inhibitor as Component K, in which a content of Component A is 10% to 50% by mass with respect to a total content of Component A and Component B.

Abstract: An object is to provide a photosensitive composition capable of obtaining a cured film having excellent reliability even when being heated at a low temperature and patterning by photolithography. A photosensitive composition of the present invention includes a polymerizable monomer having three or more (meth)acryloyl groups and one or more carboxy groups in a molecule as Component A, a polymerizable monomer having three or more (meth)acryloyl groups and not having a carboxy group in a molecule as Component B, a photopolymerization initiator as Component C, a solvent as Component D, a blocked isocyanate compound as Component N, and a polymerization inhibitor as Component K, in which a content of Component A is 10% to 50% by mass with respect to a total content of Component A and Component B.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract: There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied photosensitive resin composition; (3) an exposure step of patternwise exposing the photosensitive resin composition from which the solvent has been removed, to an active radiation; (4) a development step of developing the exposed photosensitive resin composition using an aqueous developer liquid; (5) an overcoating step of providing an overcoat layer on the developed photosensitive resin composition; (6) a heat-treating step of heat-treating the photosensitive resin composition on which the overcoat layer has been provided; and (7) a removal step of removing the overcoat layer.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance.

Abstract: It's object is to provide a (meth)acrylate compound excellent in photocurability, a curable composition comprising the compound and excellent in all of pattern accuracy, peelability, surface hardness, elasticity recovery and solvent resistance, an optical nanoimprint composition and a cured product of the curable composition and a method for producing it, especially to provide a composition favorable for a permanent film for flat panel displays, etc. A (meth)acrylate compound represented by the following formula (1): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a substituent having carbon atoms of 2 to 6 and having a carbon-carbon double bond, X represents an organic group having carbon atoms of 1 to 10, m and n each are an integer of 1 to 3.

Abstract: There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied photosensitive resin composition; (3) an exposure step of patternwise exposing the photosensitive resin composition from which the solvent has been removed, to an active radiation; (4) a development step of developing the exposed photosensitive resin composition using an aqueous developer liquid; (5) an overcoating step of providing an overcoat layer on the developed photosensitive resin composition; (6) a heat-treating step of heat-treating the photosensitive resin composition on which the overcoat layer has been provided; and (7) a removal step of removing the overcoat layer.

Abstract: There is provided a method for producing a pattern, and the method includes forming a film by removing the solvent from a photosensitive resin composition containing (Component A) a polymer including a monomer unit (a1) having a residue of a carboxyl group or a phenolic hydroxyl group protected with an acid-decomposable group, and a monomer unit (a2) having an epoxy group and/or an oxetanyl group; (Component B) a photo acid generator; and (Component C) a solvent; exposing the film patternwise to an active radiation; developing the exposed film with an aqueous developer liquid to form a pattern; and baking the pattern by heating.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract: It's object is to provide a (meth)acrylate compound excellent in photocurability, a curable composition comprising the compound and excellent in all of pattern accuracy, peelability, surface hardness, elasticity recovery and solvent resistance, an optical nanoimprint composition and a cured product of the curable composition and a method for producing it, especially to provide a composition favorable for a permanent film for flat panel displays, etc. A (meth)acrylate compound represented by the following formula (1): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a substituent having carbon atoms of 2 to 6 and having a carbon-carbon double bond, X represents an organic group having carbon atoms of 1 to 10, m and n each are an integer of 1 to 3.

Abstract: A curable composition for photoimprints comprising a photopolymerizable monomer, a polymerization initiator and a compound of the following formula (1), wherein the content of compounds having a molecular weight of at least 1000 is at most 10% by mass of all the solid content therein, and the content of the compound of the formula (1) is from 0.3 to 10.0% by mass of all the solid content therein: wherein Z represents an aliphatic hydrocarbon group; R1 and R2 represent a hydrogen atom or a substituent; R3 and R4 represent a methyl group, an ethyl group, a methoxy group or an ethoxy group; and R5 represents a methoxy group or an ethoxy group.