Patents by Inventor Hisaaki Kanda

Hisaaki Kanda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9365507
    Abstract: The present invention provides a diaryl sulfone compound represented by Formula (1): wherein R1 to R4 and R1? to R4? are the same or different, and each represents hydrogen, C1-4 alkyl, or halogen, and R5 represents C2-6 alkenyl, C1-4 alkyl, or aromatic heterocyclic group; a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4?-dihaloarylsulfone compound with thiol salt compound having an alkylene group; and a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4?-dihaloarylsulfone compound with a thiol salt compound having a hydroxyl group, and subjecting the resulting compound to reaction with a halogenating agent, followed by a dehydrohalogenation reaction.
    Type: Grant
    Filed: March 9, 2011
    Date of Patent: June 14, 2016
    Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Paul Kuad, Hisaaki Kanda, Takeshi Fujiwara, Hiroyuki Shiraishi
  • Patent number: 9040724
    Abstract: The present invention provides a diaryl sulfone compound represented by Formula (1) below: wherein R1 to R4 and R1? to R4? are the same or different; each represents hydrogen, C1-4 alkyl, or halogen; and R5 is (thio)glycidyl, acryloyl, or the like; and a method for producing the same. According to the present invention, a novel compound useful as a monomer for producing synthetic resin having a high refractive index and excellent transparency for optical materials can be efficiently produced with a simple production process, using an inexpensive material as a starting material.
    Type: Grant
    Filed: March 9, 2011
    Date of Patent: May 26, 2015
    Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Paul Kuad, Hisaaki Kanda, Takeshi Fujiwara, Hiroyuki Shiraishi
  • Publication number: 20140012018
    Abstract: The present invention aims to provide, with combination of a sulfolane compound and an organic alkanolamine compound, a sulfolane composition which is not likely to cause odor, can suppress pyrolysis of the sulfolane compound with a reduced amount of additives, and can reduce generation of sulfur dioxide. The present invention relates to a sulfolane composition containing a sulfolane compound represented by formula (1) and an organic alkanolamine compound, wherein R1 to R6 each independently represent a hydrogen atom or a C1-6 alkyl group.
    Type: Application
    Filed: December 27, 2011
    Publication date: January 9, 2014
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Masayoshi Miyada, Katsumi Takano, Hisaaki Kanda
  • Publication number: 20130345434
    Abstract: The present invention provides a method for producing a 1,2-benzisothiazol-3-one compound by reacting a 2-(alkylthio)benzonitrile compound with a halogenating agent in the presence of water, wherein an alkyl halide that is generated as by-product is reacted with a sulfide to form an alkylthiol, which is converted into an alkali metal salt, and then the resulting alkali metal salt is reacted with a 2-halobenzonitrile compound to be converted into a 2-(alkylthio)benzonitrile compound and reused as a starting material for the production of a 1,2-benzisothiazol-3-one compound. By means of the present invention, it is possible to efficiently use the by-product that is generated during the production of a 1,2-benzisothiazol-3-one compound and economically produce a 1,2-benzisothiazol-3-one compound without placing a burden on the environment.
    Type: Application
    Filed: February 28, 2012
    Publication date: December 26, 2013
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Hisaaki Kanda, Hirotsugu Konishi, Hiroki Yamaguchi
  • Patent number: 8436193
    Abstract: An object of the present invention is to provide a method for manufacturing a sulfolene compound, the method being capable of inhibiting generation of polymers. Another object of the present invention is to provide a method for manufacturing a sulfolane compound, the method being capable of controlling inhibition of hydrogenation catalyst activity and smoothly hydrogenating a sulfolene compound. The present invention is a method for manufacturing a sulfolene compound represented by a formula (2), which comprises the step of reacting a conjugated diene compound represented by a formula (1) with sulfur dioxide in the presence of a metallocene compound: in the formula (1), R1 to R6 each independently represents a hydrogen atom or a C1 to C6 alkyl group, in the formula (2), R1 to R6 represent the same groups represented by R1 to R6 in the formula (1).
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: May 7, 2013
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Seiji Bando, Hisaaki Kanda, Yuichi Onoda, Masayoshi Miyada
  • Publication number: 20130005982
    Abstract: The present invention provides a diaryl sulfone compound represented by Formula (1): wherein R1 to R4 and R1? to R4? are the same or different, and each represents hydrogen, C1-4 alkyl, or halogen, and R5 represents C2-6 alkenyl, C1-4 alkyl, or aromatic heterocyclic group; a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4?-dihaloarylsulfone compound with thiol salt compound having an alkylene group; and a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4?-dihaloarylsulfone compound with a thiol salt compound having a hydroxyl group, and subjecting the resulting compound to reaction with a halogenating agent, followed by a dehydrohalogenation reaction.
    Type: Application
    Filed: March 9, 2011
    Publication date: January 3, 2013
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Paul Kuad, Hisaaki Kanda, Takeshi Fujiwara, Hiroyuki Shiraishi
  • Publication number: 20130005993
    Abstract: The present invention provides a diaryl sulfone compound represented by Formula (1) below: wherein R1 to R4 and R1? to R4? are the same or different; each represents hydrogen, C1-4 alkyl, or halogen; and R5 is (thio)glycidyl, acryloyl, or the like; and a method for producing the same. According to the present invention, a novel compound useful as a monomer for producing synthetic resin having a high refractive index and excellent transparency for optical materials can be efficiently produced with a simple production process, using an inexpensive material as a starting material.
    Type: Application
    Filed: March 9, 2011
    Publication date: January 3, 2013
    Applicant: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Paul Kuad, Hisaaki Kanda, Takeshi Fujiwara, Hiroyuki Shiraishi
  • Publication number: 20110288307
    Abstract: An object of the present invention is to provide a method for manufacturing a sulfolene compound, the method being capable of inhibiting generation of polymers. Another object of the present invention is to provide a method for manufacturing a sulfolane compound, the method being capable of controlling inhibition of hydrogenation catalyst activity and smoothly hydrogenating a sulfolene compound. The present invention is a method for manufacturing a sulfolene compound represented by a formula (2), which comprises the step of reacting a conjugated diene compound represented by a formula (1) with sulfur dioxide in the presence of a metallocene compound: in the formula (1), R1 to R6 each independently represents a hydrogen atom or a C1 to C6 alkyl group, in the formula (2), R1 to R6 represent the same groups represented by R1 to R6 in the formula (1).
    Type: Application
    Filed: November 30, 2009
    Publication date: November 24, 2011
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Seiji Bando, Hisaaki Kanda, Yuichi Onoda, Masayoshi Miyada