Abstract: To provide a piezoelectric body film that can suppress decrease in the piezoelectric constant d31, a method of producing a piezoelectric body film, and a piezoelectric body device. A piezoelectric body film comprising a fluororesin as a piezoelectric material, the fluororesin containing, as a main constituent unit, a repeating unit derived from vinylidene fluoride, a piezoelectric constant d31 of the piezoelectric body film being 20 pC/N or greater, and an extrapolated onset temperature at start of shrinkage determined by TMA measurement being not lower than 90° C. and not higher than 115° C. The difference between piezoelectric constants d31 measured before and after heating the piezoelectric body film at 100° C. for 24 hours relative to the piezoelectric constant d31 before the heating for 24 hours is 20% or less.

Abstract: This application discloses a High-Frequency plasma processing apparatus comprising a process chamber in which a substrate to be processed is placed, a process-gas introduction line for introducing a process gas into the process chamber, a first HF electrode provided in the process chamber, a first HF power source for applying voltage to the first HF electrode, thereby generating plasma of the process gas. The apparatus further comprises a second HF electrode facing the first HF electrode in the process chamber, interposing discharge space, and a series resonator connecting the second HF electrode and the ground. The frequency of the first HF power source is not lower than 30 MHz. The series resonator is resonant as the distributed constant circuit at the frequency of the first HF power source.

Abstract: This application discloses a High-Frequency plasma processing apparatus comprising a process chamber in which a substrate to be processed is placed, a process-gas introduction line for introducing a process gas into the process chamber, a first HF electrode provided in the process chamber, a first HF power source for applying voltage to the first HF electrode, thereby generating plasma of the process gas. The apparatus further comprises a second HF electrode facing the first HF electrode in the process chamber, interposing discharge space, and a series resonator connecting the second HF electrode and the ground. The frequency of the first HF power source is not lower than 30 MHz. The series resonator is resonant as the distributed constant circuit at the frequency of the first HF power source.

Abstract: The present invention stably provides a high-strength hot-dip galvanized steel sheet having a high tensile strength and no non-plated portions and being excellent in workability and surface properties even when the employed equipment has only a reduction annealing furnace and a steel sheet containing relatively large amounts of Si, Mn and Al that are regarded as likely to cause non-plated portions is used as the substrate.

Abstract: The present invention stably provides a high-strength hot-dip galvanized steel sheet having a high tensile strength and no non-plated portions and being excellent in workability and surface properties even when the employed equipment has only a reduction annealing furnace and a steel sheet containing relatively large amounts of Si, Mn and Al that are regarded as likely to cause non-plated portions is used as the substrate.

Abstract: This application discloses a High-Frequency plasma processing apparatus comprising a process chamber in which a substrate to be processed is placed, a process-gas introduction line for introducing a process gas into the process chamber, a first HF electrode provided in the process chamber, a first HF power source for applying voltage to the first HF electrode, thereby generating plasma of the process gas. The apparatus further comprises a second HF electrode facing the first HF electrode in the process chamber, interposing discharge space, and a series resonator connecting the second HF electrode and the ground. The frequency of the first HF power source is not lower than 30 MHz. The series resonator is resonant as the distributed constant circuit at the frequency of the first HF power source.

Abstract: This application discloses a High-Frequency plasma processing apparatus comprising a process chamber in which a substrate to be processed is placed, a process-gas introduction line for introducing a process gas into the process chamber, a first HF electrode provided in the process chamber, a first HF power source for applying voltage to the first HF electrode, thereby generating plasma of the process gas. The apparatus further comprises a second HF electrode facing the first HF electrode in the process chamber, interposing discharge space, and a series resonator connecting the second electrode and the ground. The frequency of the first HF power source is not lower than 30 MHz. The series resonator is resonant as the distributed constant circuit at the frequency of the first HF power source.

Abstract: The present invention stably provides a high-strength hot-dip galvanized steel sheet having a high tensile strength and no non-plated portions and being excellent in workability and surface properties even when the employed equipment has only a reduction annealing furnace and a steel sheet containing relatively large amounts of Si, Mn and Al that are regarded as likely to cause non-plated portions is used as the substrate.

Abstract: The present invention stably provides a high-strength hot-dip galvanized steel sheet having a high tensile strength and no non-plated portions and being excellent in workability and surface properties even when the employed equipment has only a reduction annealing furnace and a steel sheet containing relatively large amounts of Si, Mn and Al that are regarded as likely to cause non-plated portions is used as the substrate.

Abstract: This application discloses a High-Frequency plasma processing apparatus comprising a process chamber in which a substrate to be processed is placed, a process-gas introduction line for introducing a process gas into the process chamber, a first HF electrode provided in the process chamber, a first HF power source for applying voltage to the first HF electrode, thereby generating plasma of the process gas. The apparatus further comprises a second HF electrode facing the first HF electrode in the process chamber, interposing discharge space, and a series resonator connecting the second electrode and the ground. The frequency of the first HF power source is not lower than 30 MHz. The series resonator is resonant as the distributed constant circuit at the frequency of the first HF power source.

Abstract: A tin-plating or aluminum-plating surface treated steel material with excellent corrosion resistance containing an intermetallic compound composed of one or more Group IIa (alkaline earth metal) elements and one or more Group IVb elements in a tin-based plating layer or aluminum-based plating layer on the surface of a steel material. For a tin-based plating layer, the long diameter of the intermetallic compound massive bodies is 1 82 m or greater and the short diameter/long diameter ratio is at least 0.4. For an aluminum-based plating layer, the long diameter of the intermetallic compound massive bodies is 10 &mgr;m or greater and the short diameter/long diameter ratio is at least 0.4.

Abstract: A rotary valve actuator arrangement including a rotary valve and an electromagnetic actuator actuating the rotary valve. The rotary valve includes a valve shaft rotatable about an axis and a valve body disposed on the valve shaft for unitary rotation therewith. The electromagnetic actuator includes two stator cores, two coils wound on the stator cores, and a rotor rotatable about the axis and including two projecting portions opposed to the stator cores. Mutually opposed surfaces of the stator cores and the projecting portions define a continuously variable area forming a magnetic path when the coil is energized.

Abstract: A plasma processing apparatus includes a cathode 54 having a large diameter part 56 and a long thin small diameter part 58, and the upper end surface of the large diameter part 56 faces the plasma forming space 76. The substrate 66 which is to be processed is mounted on the upper end surface of the large diameter part 56. The lower end of the small diameter part 58 is connected via the matching circuit 60 to the high frequency power source 62. The transmission path within the chamber comprises a large diameter coaxial line, a small diameter coaxial line and a radial line which connects them. The large diameter coaxial line includes the large diameter part 56, the first side wall 42 and the insulator 70. The radial line includes the lower surface of the large diameter part 56, the upper surface of the bottom plate 46 and the gap 72 between them. The small diameter coaxial line includes the small diameter part 58, the second side wall 68 and the gap 74.

Abstract: An apparatus for controlling a throttle valve electronically in an internal combustion engine. A rotational rod is coupled to a gear lever and the mechanism for putting the throttle back, which is protected by a cover. A throttle sensor is coupled to the rotational rod, which is also covered by a cover. Since the mechanism for putting the throttle back is covered, it is easy to prevent the deterioration of the mechanical parts, the entry of the foreign matter, corrosion, and to improve reliability. Also, because the throttle sensor is installed to the end of the apparatus for controlling the throttle valve, it is easy to adjust/readjust or install/exchange the throttle sensor, improve miniaturization, reduce weight, and lower cost.

Abstract: This invention discloses a plasma processing apparatus for carrying out a process onto a substrate utilizing a plasma generated by supplying RF energy with a plasma generation gas. This apparatus comprises a vacuum chamber having a pumping system, a substrate holder for placing the substrate to be processed in the vacuum chamber, a gas introduction means for introducing the plasma generation gas into a plasma generation space, an energy supply means for supplying the RF energy with the plasma generation gas. The antenna has multiple antenna elements provided symmetrically to the center on the axis of the substrate and an end shorting member shorting each end of the antenna elements so that an RF current path symmetrical to the center is applied. Multiple circuits resonant at a frequency of the RF energy are formed symmetrically of the antenna elements and the end shorting member.

Abstract: A throttle valve device for an internal combustion engine of an automotive vehicle. The throttle valve device comprises a throttle body having a part of an intake air passageway. A throttle valve is fixedly mounted on a valve shaft and rotatably disposed in the part of the intake air passageway. A driving device is disposed to the throttle body to drive the throttle valve through the valve shaft. A reduction gear mechanism through which the driving device and the valve shaft are mechanically connected is provided to transmit a driving force of the driving device to the valve shaft in a manner to accomplish a speed-reduction for a rotational movement of the driving device to be transmitted to the valve shaft. A cam follower is rotatably disposed to the throttle body. A single biasing device is provided to always bias the cam follower onto the cam surface of the cam lever.

Abstract: For controlling a throttle valve of an internal combustion engine, there is provided a control valve control device. The device includes a throttle body; a pivot shaft rotatably held by the throttle body and extending across a throttle chamber of the throttle body, the throttle valve being secured to the throttle shaft to pivot therewith; an electric actuator mounted to the throttle body to produce a power to drive the pivot shaft; and a reduction gear mechanism arranged between the electric actuator and the pivot shaft to reduce a speed of an actuation motion applied to the pivot shaft from the actuator.

Abstract: An apparatus for controlling a throttle valve electronically in an internal combustion engine comprises a throttle valve with a rotation axis disposed in an intake air passage of an internal combustion engine, and an actuator with two ends and a central body disposed in parallel with the rotation axis of the throttle valve and extending back part way along the length of the throttle valve, and a casing formed around the throttle valve and the actuator, but not covering the central body of the actuator to thereby allow a mold for the casing to be slidably removed in a direction at approximately a right angle to the rotation axis.

Abstract: An apparatus for controlling a throttle valve electronically in an internal combustion engine. The actuator 2 is supported on a body 1A by fixing a base plate 7 to a flange 1B of the body 1A with a bolt 6, and an elastic member 9 is fixed at an outer surface of a cylindrical projection 2C which is positioned on one end 2B of the body of the actuator 2. The inner surface of a case 1C of the body 1A covers cylindrical projection 2C. One end 2B of the body of the actuator 2, opposite the actuator output end, is thus supported by the body 1A via elastic member 9. Therefore, it is not necessary to provide a heavy wall thickness of the flange by which the actuator 2 is supported or of the body of the actuator, and increase the strength of the internal structure of the actuator, and increase weight, size, and cost of the actuator.

Abstract: An apparatus for controlling a throttle valve electronically in an internal combustion engine. The actuator 2 is supported on a body 1A by fixing a base plate 7 to a flange 1B of the body 1A with a bolt 6, and an elastic member 9 is fixed at an outer surface of a cylindrical projection 2C which is positioned on one end 2B of the body of the actuator 2. The inner surface of a case 1C of the body 1A covers cylindrical projection 2C. One end 2B of the body of the actuator 2, opposite the actuator output end, is thus supported by the body 1A via elastic member 9. Therefore, it is not necessary to provide a heavy wall thickness of the flange by which the actuator 2 is supported or of the body of the actuator, and increase the strength of the internal structure of the actuator, and increase weight, size, and cost of the actuator.