Patents by Inventor Hisahiro Einaga

Hisahiro Einaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for production of hydrogen using nonthermal plasma
    Patent number: 6884326
    Abstract: A method of producing a synthesis gas by a reforming reaction of an organic compound with a reforming agent, in which the reforming reaction is performed using nonthermal plasma.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: April 26, 2005
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventors: Shigeru Futamura, Hajime Kabashima, Hisahiro Einaga
  • Method decomposing fluorine-containing organic material
    Patent number: 6875902
    Abstract: A method of decomposing a fluorine-containing organic material, which includes irradiating a mixture of an aqueous phase containing a photocatalyst with the fluorine-containing organic material with light in the presence of an oxygen source. The fluorine-containing organic material may be contained in a carbon dioxide phase such that the aqueous phase and the carbon dioxide phase are mixed with each other with stirring to form a mixed phase which is irradiated with the light.
    Type: Grant
    Filed: November 6, 2002
    Date of Patent: April 5, 2005
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventors: Hisao Hori, Hisahiro Einaga
  • Method decomposing fluorine-containing organic material
    Publication number: 20040084296
    Abstract: A method of decomposing a fluorine-containing organic material, which includes irradiating a mixture of an aqueous phase containing a photocatalyst with the fluorine-containing organic material with light in the presence of an oxygen source. The fluorine-containing organic material may be contained in a carbon dioxide phase such that the aqueous phase and the carbon dioxide phase are mixed with each other with stirring to form a mixed phase which is irradiated with the light.
    Type: Application
    Filed: November 6, 2002
    Publication date: May 6, 2004
    Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hisao Hori, Hisahiro Einaga
  • Method of producing synthesis gas using nonthermal plasma
    Publication number: 20030084613
    Abstract: A method of producing a synthesis gas by a reforming reaction of an organic compound with a reforming agent, in which the reforming reaction is performed using nonthermal plasma.
    Type: Application
    Filed: October 29, 2002
    Publication date: May 8, 2003
    Inventors: Shigeru Futamura, Hajime Kabashima, Hisahiro Einaga
  • Process for production of hydrogen using nonthermal plasma
    Publication number: 20020175084
    Abstract: A process for the production of hydrogen, which includes subjecting a hydrogen-containing compound (with the exception of a nitrogen-containing compound) to a decomposition reaction with nonthermal plasma.
    Type: Application
    Filed: March 11, 2002
    Publication date: November 28, 2002
    Inventors: Shigeru Futamura, Hajime Kabashima, Hisahiro Einaga