Patents by Inventor Hisamitsu Tomeba

Hisamitsu Tomeba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AND PHOTOSENSITIVE FILM, PATTERN FORMING METHOD, PATTERN FILM, LOW REFRACTIVE INDEX FILM, OPTICAL DEVICE AND SOLID-STATE IMAGING DEVICE EACH USING THE SAME
    Publication number: 20120003436
    Abstract: A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound capable of changing in the solubility for an alkali developer by the action of the active species.
    Type: Application
    Filed: June 30, 2011
    Publication date: January 5, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Toshiyuki SAIE, Kenji WADA, Masaomi MAKINO, Hisamitsu TOMEBA, Mitsuji YOSHIBAYASHI
  • ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME
    Publication number: 20110293900
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a fluorine-containing compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein the acid has a polarity converting group, and the fluorine content of the fluorine-containing compound (A) is 20% or more based on the molecular weight of the fluorine-containing compound (A).
    Type: Application
    Filed: May 27, 2011
    Publication date: December 1, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Hisamitsu TOMEBA, Akinori SHIBUYA
  • ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH
    Publication number: 20100255418
    Abstract: According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n?1, m?2 and n<m.
    Type: Application
    Filed: April 5, 2010
    Publication date: October 7, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Hisamitsu Tomeba, Mitsuhiro Fujita
  • Organosilicon compounds and method of manufacturing the same
    Patent number: 7253243
    Abstract: There is provided a method of synthesizing an organosilicon compound. This method comprises polymerizing, as a starting material, allyl-(4-alkynyl-phenyl) silane represented by the following general formula (3) in a solvent selected from methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane and under the presence of hafnium tetrachloride to obtain an organosilicon compound represented by the following general formula (1). (wherein R is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a phenyl group, R's may be the same or different and are individually an alkyl group having 1 or 2 carbon atoms or a phenyl group, and n is an integer of 4 to 2500).
    Type: Grant
    Filed: August 18, 2006
    Date of Patent: August 7, 2007
    Assignee: Japan Science and Technology Agency
    Inventors: Yoshinori Yamamoto, Naoki Asao, Hisamitsu Tomeba
  • Organosilicon compounds and method of manufacturing the same
    Publication number: 20060281890
    Abstract: There is provided a method of synthesizing an organosilicon compound. This method comprises polymerizing, as a starting material, allyl-(4-alkynyl-phenyl) silane represented by the following general formula (3) in a solvent selected from methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane and under the presence of hafnium tetrachloride to obtain an organosilicon compound represented by the following general formula (1). (wherein R is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a phenyl group, R's may be the same or different and are individually an alkyl group having 1 or 2 carbon atoms or a phenyl group, and n is an integer of 4 to 2500).
    Type: Application
    Filed: August 18, 2006
    Publication date: December 14, 2006
    Inventors: Yoshinori Yamamoto, Naoki Asao, Hisamitsu Tomeba