Patents by Inventor Hisanao Anpuku

Hisanao Anpuku has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Box-shaped facing-targets sputtering apparatus and method for producing compound thin film
    Patent number: 7135097
    Abstract: Disclosed is a box-shaped facing-targets sputtering apparatus capable of forming, at low temperature, a compound thin film of high quality while causing minimal damage to an underlying layer.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: November 14, 2006
    Assignee: FTS Corporation
    Inventors: Sadao Kadokura, Hisanao Anpuku
  • Facing-targets-type sputtering apparatus
    Patent number: 6881311
    Abstract: Disclosed is a facing-targets-type sputtering apparatus including a sputtering unit including a pair of facing targets which are disposed a predetermined distance away from each other, and permanent magnets serving as magnetic-field generation means which are disposed around each of the facing targets, the permanent magnets being provided so as to generate a facing-mode magnetic field and a magnetron-mode magnetic field, the facing-mode magnetic field extending in the direction perpendicular to the facing targets in such a manner as to surround a confinement space provided between the targets, and the magnetron-mode magnetic field extending from the vicinity of a peripheral edge portion of each of the targets to a center portion thereof, thereby confining plasma within the confinement space by means of these magnetic fields for forming a thin film on a substrate disposed beside the confinement space, which apparatus further includes magnetic-field regulation means for regulating the magnetron-mode magnetic fi
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: April 19, 2005
    Assignee: FTS Corporation
    Inventors: Sadao Kadokura, Hisanao Anpuku
  • Box-shaped facing-targets sputtering apparatus and method for producing compound thin film
    Publication number: 20050023129
    Abstract: Disclosed is a box-shaped facing-targets sputtering apparatus capable of forming, at low temperature, a compound thin film of high quality while causing minimal damage to an underlying layer.
    Type: Application
    Filed: November 26, 2003
    Publication date: February 3, 2005
    Applicant: FTS CORPORATION
    Inventors: Sadao Kadokura, Hisanao Anpuku
  • Facing-targets-type sputtering apparatus
    Publication number: 20030094365
    Abstract: Disclosed is a facing-targets-type sputtering apparatus including a sputtering unit including a pair of facing targets which are disposed a predetermined distance away from each other, and permanent magnets serving as magnetic-field generation means which are disposed around each of the facing targets, the permanent magnets being provided so as to generate a facing-mode magnetic field and a magnetron-mode magnetic field, the facing-mode magnetic field extending in the direction perpendicular to the facing targets in such a manner as to surround a confinement space provided between the targets, and the magnetron-mode magnetic field extending from the vicinity of a peripheral edge portion of each of the targets to a center portion thereof, thereby confining plasma within the confinement space by means of these magnetic fields for forming a thin film on a substrate disposed beside the confinement space, which apparatus further includes magnetic-field regulation means for regulating the magnetron-mode magnetic fi
    Type: Application
    Filed: November 15, 2002
    Publication date: May 22, 2003
    Applicant: FTS CORPORATION
    Inventors: Sadao Kadokura, Hisanao Anpuku