Abstract: The present invention provides a method of removing a foreign particle on a first member, comprising: supplying a composition on the first member; pressing a second member against the composition supplied on the first member; curing the composition on the first member after the pressing; and separating the second member together with the composition from the first member, after the curing, wherein in the supplying, a supply amount of the composition to be supplied on the first member is controlled based on a cure shrinkage rate of the composition in the curing and an estimated size of a foreign particle being presumably adhered on the first member, such that a thickness of a portion of the composition cured in the curing, which exists between the second member and the first member, becomes larger than the estimated size.

Abstract: The present invention provides a foreign particle removing method of removing a foreign particle on a first member, comprising: supplying a composition to a supply region on the first member; setting a target region wider than the supply region on the first member, and pressing a second member against the composition supplied on the first member in the supplying; curing the composition on the first member after the pressing, in a state in which the composition and the second member are in contact with each other; and separating the second member from the first member after the curing, in a state in which the second member and the composition adhere to each other, thereby separating the composition from the target region of the first member.

Abstract: A curable composition on a substrate is cured in a state where a member is in contact with the curable composition. Thereafter, the member having adhered to the curable composition is separated from the substrate, whereby the curable composition and a particle are removed from the substrate.

Abstract: The present invention provides an evaluation method for evaluating a state in an apparatus concerning particles existing inside a substrate processing apparatus for processing a substrate, including arranging a plate in a charged state inside the apparatus and obtaining the number of particles adhered to the plate by performing a dummy operation different from an operation of processing the substrate, and evaluating the state in the apparatus based on a coefficient representing a ratio of the number of particles adhered to the plate by performing the dummy operation for the plate in an uncharged state to the number of particles adhered to the plate in the charged state, and the number of particles obtained in the arranging the plate.

Abstract: An imprint apparatus forms a pattern on a substrate by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck having a substrate holding region for holding the substrate, a peripheral member arranged to surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.

Abstract: An imprint apparatus forms a pattern on a substrate by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck having a substrate holding region for holding the substrate, a peripheral member arranged to surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.

Abstract: An imprint apparatus according to an embodiment of the present invention includes a supply unit configured to supply an imprint material on a substrate, a pattern formation unit including a holder holding a mold, the pattern formation unit being configured to bring the mold in contact with the imprint material supplied by the supply unit to form a pattern, a prevention unit configured to supply a gas in a direction intersecting a direction along the substrate to prevent a foreign matter from attaching to the substrate, and a removal unit configured to locally supply a fluid to the substrate to remove a foreign matter on the substrate.

Abstract: In an image display apparatus, each sub-pixel includes a phosphor configured to emit light of a predetermined color when the phosphor is irradiated with electrons, an electron emission device configured to irradiate the phosphor with the electrons, and a resistor connected in series to the electron emission device and having a negative temperature characteristic of resistance. In three or more sub-pixels with different luminescent colors included in each pixel, the resistor is configured such that a sub-pixel having a phosphor with a smaller temperature dependency of luminescent brightness has a resistor with a greater activation energy, or the resistor is configured such that the resistor is made of the same material for the three or more sub-pixel and such that a sub-pixel having a phosphor with a smaller temperature dependency of luminescent brightness has a resistor with a greater resistance.

Abstract: Deformation of a gate by Coulomb force generated when operating an electron-emitting device is inhibited by appropriately maintaining relationship between film thickness h of the gate and distance L from an outer surface of an insulating member to an inner surface of a concave portion. According to this, in an electron beam apparatus provided with a laminate-type electron-emitting device, the deformation of the gate is prevented to reduce variation in electron emission characteristics, thereby preventing the element from being broken.

Abstract: An image display apparatus of this invention includes a neighborhood data integration section 20 which integrates image data on respective colors corresponding to electron emitting devices proximate to an electron emitting device to be driven, and corresponding to a phosphor contributing to a halation, an adder 6 adds the integrated image data R22, G22, and B22 on the respective colors, a coefficient operation section 7 which multiplies an addition result by a predetermined coefficient according to a luminous intensity of the halation, an adder 8 which adds outputs R23, G23, and B23 obtained by inverting a sign of multiplication results to image data R14, G14, and B14 corresponding to the electron emitting device to be driven, respectively, and a comparator 11 which compares an addition result with zero in magnitude, and which outputs a driving signal R25 for the respective colors.

Abstract: A convex portion 2 having a specific sectional shape is formed on a substrate 1 between electrodes 3 and 4, and a gap 6 is formed on a conductive film 5, connecting the electrodes 3 and 4, on the convex portion 2, whereby the distance from the center of the gap 6 serving as a electron-emitting portion to the stagnation point is reduced so as to enhance an electron emission efficiency.

Abstract: In an electron beam apparatus including an electron emission element and an anode, the electron emission element includes a gate 5 and a cathode 6 having a projection portion. The gate 5 and the cathode 6 are located in a surface of an insulating member 3 including a recess 7. The projection portion of the cathode 6 has a height distribution, and an average value dav (m) of a shortest distance between the gate 5 and the projection portion of the cathode 6 and a difference h (m) between the average value dav and a shortest distance dmin (m) from the gate 5 to a maximum convex portion of the projection portion of the cathode 6 satisfy a relationship of h/dav<0.39.

Abstract: In an electron beam apparatus including a lamination electron emitting device, it is an object to enhance electron emission efficiency by controlling an electron emission point at which electrons are emitted. In the device, an insulating member and a gate are formed on a substrate, a recess portion is formed in the insulating member, a protruding portion protruding from an edge of the recess portion toward the gate is provided at an end in opposition to the gate, of a cathode 6 arranged on a side surface of the insulating member, and convex portions at a distance of not less than 1 nm and not more than 5 nm from the gate in a width direction of the protruding portion are included in a density of 10% or less in a width direction of the cathode.

Abstract: A manufacturing method of an electron-emitting device according to the present invention includes the steps of: preparing a substrate having a first electrode and a second electrode, and a conductive film for connecting the first electrode and the second electrode; and forming a gap on the conductive film by applying a voltage between the first electrode and the second electrode; wherein a planar shape of the conductive film has a V-shape portion between the first electrode and the second electrode.

Abstract: Deformation of a gate by Coulomb force generated when operating an electron-emitting device is inhibited by appropriately maintaining relationship between film thickness h of the gate and distance L from an outer surface of an insulating member to an inner surface of a concave portion. According to this, in an electron beam apparatus provided with a laminate-type electron-emitting device, the deformation of the gate is prevented to reduce variation in electron emission characteristics, thereby preventing the element from being broken.

Abstract: In an electron beam apparatus including an electron emission element and an anode, the electron emission element includes a gate 5 and a cathode 6 having a projection portion. The gate 5 and the cathode 6 are located in a surface of an insulating member 3 including a recess 7. The projection portion of the cathode 6 has a height distribution, and an average value day (m) of a shortest distance between the gate 5 and the projection portion of the cathode 6 and a difference h (m) between the average value day and a shortest distance dmin (m) from the gate 5 to a maximum convex portion of the projection portion of the cathode 6 satisfy a relationship of h/day<0.39.

Abstract: The invention provides an electron beam apparatus having: a rear plate having a plurality of electron-emitting devices each provided with a device electrode, and a plurality of wirings connected to the device electrodes; and a face plate being provided with an anode electrode, and being arranged in opposition to the rear plate so as to be irradiated with an electron emitted from the electron-emitting device, wherein the device electrode is electrically connected to the wiring through an additional electrode, and the additional electrode is formed from an electroconductive material of which phase transition from a solid phase directly into a vapor phase is caused at a temperature not lower than a melting point of the device electrode within an evacuated atmosphere.

Abstract: An image forming apparatus in which a first substrate provided with an electron-emitting device and an image displaying member which electrons emitted from the electron-emitting device irradiate are arranged to be opposed is provided with a deflecting means deflecting the electrons emitted from the electron-emitting device and a trapping unit trapping an inert gas ionized by the electrons. Thereby, the damages of the electron-emitting device by the inert gas are prevented, and the life of an image display apparatus is aimed to be elongated.

Abstract: In an image display apparatus, each sub-pixel includes a phosphor configured to emit light of a predetermined color when the phosphor is irradiated with electrons, an electron emission device configured to irradiate the phosphor with the electrons, and a resistor connected in series to the electron emission device and having a negative temperature characteristic of resistance. In three or more sub-pixels with different luminescent colors included in each pixel, the resistor is configured such that a sub-pixel having a phosphor with a smaller temperature dependency of luminescent brightness has a resistor with a greater activation energy, or the resistor is configured such that the resistor is made of the same material for the three or more sub-pixel and such that a sub-pixel having a phosphor with a smaller temperature dependency of luminescent brightness has a resistor with a greater resistance.

Abstract: A three-dimensional structure forming a space in which a wiring-side portion of a device electrode is located is arranged on a rear plate. A surface potential of the three-dimensional structure is defined so that an electric field intensity of the space becomes weaker than an average electric field intensity expressed below, average electric field intensity=Va/d, where Va is application voltage of an anode electrode, and d is an interval between a rear plate and the face plate. The device electrode includes a high-temperature portion where temperature locally rises when current flows through the device electrode. The high-temperature portion is positioned in the space or at a distance of less than or equal to 20 ?m from the space.