Patents by Inventor Hisanori AKIMARU

Hisanori AKIMARU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210311391
    Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3) and a photoacid generator (B). In the formulae (a1) to (a3), R11, R21, and R31 each independently represent a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atom or a halogen atom; R12 and R32 each independently represent a divalent organic group; R22 represents a substituted or non-substituted alkanediyl group having 2 to 10 carbon atoms; R13 represents an acid dissociable group having an alicyclic structure; R23 represents an alkyl group having 1 to 10 carbon atoms; R33 represents a hydroxyaryl group; and 1, m and n each independently represent an integer from 0 to 10.
    Type: Application
    Filed: July 1, 2019
    Publication date: October 7, 2021
    Applicant: JSR CORPORATION
    Inventors: Takuhiro TANIGUCHI, Naoki NISHIGUCHI, Tomoyuki MATSUMOTO, Hirokazu SAKAKIBARA, Akito HIRO, Hisanori AKIMARU
  • Patent number: 10095110
    Abstract: The present invention provides a photosensitive resin composition including: an alkali-soluble resin (A) having more than 30% by mass and less than 70% by mass of a structural unit represented by the Formula (1) below; a compound (B) having at least one ethylenically unsaturated double bond per molecule; and a photo radical polymerization initiator (C) having an oxime ester structure; wherein a content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the alkali-soluble resin (A) is 3 to 20 parts by mass. In Formula (1), R1 represents a hydrogen atom or a C1-4 alkyl group. R2 represents a single bond or a divalent organic group. R3 each independently represent a hydrogen atom, a hydroxyl group, or an optionally substituted alkyl group.
    Type: Grant
    Filed: November 24, 2016
    Date of Patent: October 9, 2018
    Assignee: JSR CORPORATION
    Inventors: Hisanori Akimaru, Kenji Okamoto, Hirokazu Sakakibara, Makoto Katsurayama
  • Publication number: 20170153543
    Abstract: The present invention provides a photosensitive resin composition including: an alkali-soluble resin (A) having more than 30% by mass and less than 70% by mass of a structural unit represented by the Formula (1) below; a compound (B) having at least one ethylenically unsaturated double bond per molecule; and a photo radical polymerization initiator (C) having an oxime ester structure; wherein a content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the alkali-soluble resin (A) is 3 to 20 parts by mass. In Formula (1), R1 represents a hydrogen atom or a C1-4 alkyl group. R2 represents a single bond or a divalent organic group. R3 each independently represent a hydrogen atom, a hydroxyl group, or an optionally substituted alkyl group.
    Type: Application
    Filed: November 24, 2016
    Publication date: June 1, 2017
    Applicant: JSR CORPORATION
    Inventors: Hisanori AKIMARU, Kenji OKAMOTO, Hirokazu SAKAKIBARA, Makoto KATSURAYAMA
  • Patent number: 9417522
    Abstract: The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound having at least one ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator having a keto oxime ester structure (C); and a compound represented by the Formula (1) or (2) below (D); wherein the content of the photo radical polymerization initiator (C) is 0.5 to 5 times the content of the compound (D), and the content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass. In Formula (1), the six R1s each independently represent a hydrogen atom or an electron-donating group, and n represents 0 or 1. In Formula (2), the six R2s each independently represent a hydrogen atom or an electron-donating group, and m represents 0 or 1.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: August 16, 2016
    Assignee: JSR CORPORATION
    Inventors: Hisanori Akimaru, Hirokazu Sakakibara, Hidefumi Ishikawa, Shingo Naruse
  • Publication number: 20150185604
    Abstract: The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound having at least one ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator having a keto oxime ester structure (C); and a compound represented by the Formula (1) or (2) below (D); wherein the content of the photo radical polymerization initiator (C) is 0.5 to 5 times the content of the compound (D), and the content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass. In Formula (1), the six R1s each independently represent a hydrogen atom or an electron-donating group, and n represents 0 or 1. In Formula (2), the six R2s each independently represent a hydrogen atom or an electron-donating group, and m represents 0 or 1.
    Type: Application
    Filed: December 23, 2014
    Publication date: July 2, 2015
    Applicant: JSR Corporation
    Inventors: Hisanori AKIMARU, Hirokazu Sakakibara, Hidefumi Ishikawa, Shingo Naruse