Patents by Inventor Hisao Hojoh
Hisao Hojoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230304883Abstract: A diaphragm pressure gauge includes: a structure disposed under pressure to be measured; two diaphragms attached to the structure so as to oppose each other; and a detection element that is fixed to the two diaphragms to detect displacements of the two diaphragms. In each of the two diaphragms, when one of two surfaces is designated an opposing surface and the other surface is designated a non-opposing surface, the structure and the two diaphragms set a space faced by one of the opposing surface and the non-opposing surface as an airtight space to be kept in a reference vacuum, and the other of the opposing surface and the non-opposing surface is subjected to the pressure to be measured.Type: ApplicationFiled: December 15, 2022Publication date: September 28, 2023Applicant: VACUUM PRODUCTS CORPORATIONInventor: Hisao HOJOH
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Patent number: 11181430Abstract: A pressure gauge includes: an outer container defining an outer chamber set to a reference pressure (Pr); an inner container disposed in the outer container; and a tube setting the inside of a first inner chamber of the inner container to a measurement pressure (Px). The inner container includes: a cylindrical rigid wall portion; first and second pressure receiving plates that displace due to a differential pressure between the reference pressure and the measurement pressure; a bellows partitioning the inner container into the first inner chamber and a second inner chamber; and a pressure detection element disposed in the second inner chamber and detecting the measurement pressure based on the displacements of the first and the second pressure receiving plates. The outer chamber and the second inner chamber are set to the reference pressure of a high vacuum that is lower than a lower limit of the measurement pressure.Type: GrantFiled: February 28, 2020Date of Patent: November 23, 2021Assignee: Q'z CorporationInventor: Hisao Hojoh
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Patent number: 10852207Abstract: A vacuum gauge includes an introduction tube, a diaphragm displaced by a gas to be measured that is introduced from the introduction tube, a piezoelectric element that has one end coupled to the diaphragm and is displaced along with the diaphragm, an inner structure to which a circumferential edge of the diaphragm and the other end of the piezoelectric element are secured and that is coupled to the introduction tube, and an airtight container to airtightly enclose the introduction tube and the inner structure. The inner structure, the introduction tube, and the diaphragm airtightly partition a space in the airtight container into a pressure introduction chamber to which the gas to be measured is introduced on one surface side of the diaphragm, and a reference pressure chamber on the other surface side of the diaphragm. the reference pressure chamber being set at a high vacuum that is lower than the pressure lower limit of the measurement gas.Type: GrantFiled: December 6, 2018Date of Patent: December 1, 2020Assignee: Q'z CorporationInventor: Hisao Hojoh
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Publication number: 20200232861Abstract: A pressure gauge includes: an outer container defining an outer chamber set to a reference pressure (Pr); an inner container disposed in the outer container; and a tube setting the inside of a first inner chamber of the inner container to a measurement pressure (Px). The inner container includes: a cylindrical rigid wall portion; first and second pressure receiving plates that displace due to a differential pressure between the reference pressure and the measurement pressure; a bellows partitioning the inner container into the first inner chamber and a second inner chamber; and a pressure detection element disposed in the second inner chamber and detecting the measurement pressure based on the displacements of the first and the second pressure receiving plates. The outer chamber and the second inner chamber are set to the reference pressure of a high vacuum that is lower than a lower limit of the measurement pressure.Type: ApplicationFiled: February 28, 2020Publication date: July 23, 2020Applicant: Q'z CorporationInventor: Hisao HOJOH
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Publication number: 20190107458Abstract: A vacuum gauge includes an introduction tube, a diaphragm displaced by a gas to be measured that is introduced from the introduction tube, a piezoelectric element that has one end coupled to the diaphragm and is displaced along with the diaphragm, an inner structure to which a circumferential edge of the diaphragm and the other end of the piezoelectric element are secured and that is coupled to the introduction tube, and an airtight container to airtightly enclose the introduction tube and the inner structure. The inner structure, the introduction tube, and the diaphragm airtightly partition a space in the airtight container into a pressure introduction chamber to which the gas to be measured is introduced on one surface side of the diaphragm, and a reference pressure chamber on the other surface side of the diaphragm. the reference pressure chamber being set at a high vacuum that is lower than the pressure lower limit of the measurement gas.Type: ApplicationFiled: December 6, 2018Publication date: April 11, 2019Applicant: Q'z CorporationInventor: Hisao Hojoh
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Patent number: 6869574Abstract: A charged particle generating method in which mode is changeable between an ion generation mode and an electron generation mode. In the ion generation mode, a raw material is supplied to a tip end of a charged particle generating electrode through a raw-material passage formed in the charged particle generating electrode. A first electric field, in which the charged particle generating electrode is positive and the charged particle extract electrode is negative, is generated to emit ions from the raw material at the charged particle generating electrode. In the electron generation mode, supplying the raw material from the raw-material supply section is stopped. A second electric field, in which the charged particle generating electrode is negative and the charged particle extract electrode is positive, is generated to emit electrons from the raw material at the charged particle generating electrode.Type: GrantFiled: March 7, 2002Date of Patent: March 22, 2005Assignee: Vacuum Products CorporationInventors: Hisao Hojoh, Masatoshi Ono, Morinobu Endo, Tetsuo Uchiyama
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Publication number: 20020130039Abstract: A charged particle generating method in which mode is changeable between an ion generation mode and an electron generation mode. In the ion generation mode, a raw material is supplied to a tip end of a charged particle generating electrode through a raw-material passage formed in the charged particle generating electrode. A first electric field, in which the charged particle generating electrode is positive and the charged particle extract electrode is negative, is generated to emit ions from the raw material at the charged particle generating electrode. In the electron generation mode, supplying the raw material from the raw-material supply section is stopped. A second electric field, in which the charged particle generating electrode is negative and the charged particle extract electrode is positive, is generated to emit electrons from the raw material at the charged particle generating electrode.Type: ApplicationFiled: March 7, 2002Publication date: September 19, 2002Applicant: VACUUM PRODUCTS CORPORATIONInventors: Hisao Hojoh, Masatoshi Ono, Morinobu Endo, Tetsuo Uchiyama
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Patent number: 5228344Abstract: A pressure is measured by obtaining a difference between an actual resonance resistance of a tuning fork oscillator subjected to the pressure and a natural resonance resistance of the tuning fork oscillator, and then applying the difference to a predetermined relation to obtain a measurement of the pressure. Variations in the natural resonance resistance of the tuning fork oscillator due to temperature variations of the tuning fork oscillator are compensated for by measuring a resonance frequency of the tuning fork oscillator and then determining the natural resonance resistance of the tuning fork oscillator from the resonance frequency based on a predetermined relation between the resonance frequency and the natural resonance resistance of the tuning fork oscillator. The resonance frequency of the tuning fork oscillator is indicative of the temperature of the tuning fork oscillator.Type: GrantFiled: August 9, 1991Date of Patent: July 20, 1993Assignee: Vacuum Products Kabushiki KaishaInventor: Hisao Hojoh
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Patent number: 4747311Abstract: Regarding a gas pressure gage for measuring a gas pressure in a vacuum chamber of a semiconductor element manufacturing apparatus, or the like, the present invention has made it possible to attain a small-sized and unitary gas pressure gage and to implement a thorough measurement of gas pressure from the atmospheric pressure to a high vacuum of about 10.sup.-10 Torr, by mounting both a mechanical vibrator type pressure gage and an ionization type pressure gage on a flange provided for fitting a chamber and by providing a control circuit for making the former gage operate in a low-vacuum region and the latter in a high-vacuum region.Type: GrantFiled: March 10, 1987Date of Patent: May 31, 1988Assignee: Seiko Instruments Inc.Inventor: Hisao Hojoh