Abstract: A coating weight control apparatus includes: a strip passing position movement amount estimate part configured to estimate an movement amount of a strip passing position, in response to any of activation factors for movement of a strip passing position, that is, a welding point passing, a change in tension, and an operation of a correcting roll; and a nozzle position control part configured to shift each of positions of a front side nozzle and a back side nozzle by an amount corresponding to the movement amount of the strip passing position estimated by the strip passing position movement amount estimate part.

Abstract: A coating weight control apparatus includes: a strip passing position movement amount estimate part configured to estimate an movement amount of a strip passing position, in response to any of activation factors for movement of a strip passing position, that is, a welding point passing, a change in tension, and an operation of a correcting roll; and a nozzle position control part configured to shift each of positions of a front side nozzle and a back side nozzle by an amount corresponding to the movement amount of the strip passing position estimated by the strip passing position movement amount estimate part.

Abstract: A coating weight control apparatus includes: a strip passing position movement amount estimate part configured to estimate an movement amount of a strip passing position, in response to any of activation factors for movement of a strip passing position, that is, a welding point passing, a change in tension, and an operation of a correcting roll; and a nozzle position control part configured to shift each of positions of a front side nozzle and a back side nozzle by an amount corresponding to the movement amount of the strip passing position estimated by the strip passing position movement amount estimate part.

Abstract: A coating weight control apparatus includes: a strip passing position movement amount estimate part configured to estimate an movement amount of a strip passing position, in response to any of activation factors for movement of a strip passing position, that is, a welding point passing, a change in tension, and an operation of a correcting roll; and a nozzle position control part configured to shift each of positions of a front side nozzle and a back side nozzle by an amount corresponding to the movement amount of the strip passing position estimated by the strip passing position movement amount estimate part.

Abstract: The present invention is provided with: a duct of which one end interconnects to a wiping nozzle (22, 23) and the other end is open; a first valve (17) that controls the actual gas pressure (P1?) of the wiping nozzle (22, 23); a second valve (18) that controls the gas flow rate (Q2) dissipating to outside the system from another branched duct; a wiping pressure setting unit (11) that sets the set gas pressure (P1) of the wiping nozzle (22, 23); a first valve aperture setter (13) that sets the valve aperture of the first valve (17); a second valve aperture setter (14) that sets the valve aperture of the second valve (18); and a computation processing unit (12) that presents to the first valve aperture setter (13) the valve aperture at which the gas pressure (P1?) matches a set gas pressure (P1), and presents to the second valve aperture setter (14) the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device (15) becomes uniform.

Abstract: The present invention is provided with: a duct of which one end interconnects to a wiping nozzle (22, 23) and the other end is open; a first valve (17) that controls the actual gas pressure (P1?) of the wiping nozzle (22, 23); a second valve (18) that controls the gas flow rate (Q2) dissipating to outside the system from another branched duct; a wiping pressure setting unit (11) that sets the set gas pressure (P1) of the wiping nozzle (22, 23); a first valve aperture setter (13) that sets the valve aperture of the first valve (17); a second valve aperture setter (14) that sets the valve aperture of the second valve (18); and a computation processing unit (12) that presents to the first valve aperture setter (13) the valve aperture at which the gas pressure (P1?) matches a set gas pressure (P1), and presents to the second valve aperture setter (14) the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device (15) becomes uniform.