Patents by Inventor Hisashi Hirose

Hisashi Hirose has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220403518
    Abstract: There is a shower head through which a processing gas is supplied into an inside of a processing chamber, comprising: a cooling plate having a gas diffusion chamber, and a plurality of first through holes passing through from the gas diffusion chamber to a first surface on a processing chamber side; an upper electrode having a second surface in contact with the first surface of the cooling plate, a third surface configured to form an inner surface of the processing chamber, and a plurality of second through holes passing through from the second surface to the third surface; and a plurality of recesses formed in the first surface or the second surface and provided apart from each other, wherein one of the plurality of first through holes is connected to at least two of the plurality of second through holes via one of the plurality of recesses.
    Type: Application
    Filed: June 21, 2022
    Publication date: December 22, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hisashi HIROSE, Hiroshi TSUJIMOTO, Tomoya UJIIE
  • Publication number: 20200294773
    Abstract: A target object processed by performing a plasma processing method includes a first layer made of silicon oxide and a second layer containing carbon. A processing sequence performed repeatedly includes: etching the target object with the second layer as a mask by forming plasma from a first gas; and etching, after the etching by forming the plasma from the first gas, the target object by forming plasma from a second gas. The first gas includes a gas containing a carbon atom and a fluorine atom. The second gas includes a gas containing a carbon atom, a fluorine atom and a hydrogen atom. High-order fluorocarbon is generated by the plasma from the first gas in the etching by forming the plasma from the first gas. Low-order fluorocarbon or low-order hydrofluorocarbon is generated by the plasma from the second gas in the etching by forming the plasma from the second gas.
    Type: Application
    Filed: March 5, 2020
    Publication date: September 17, 2020
    Inventors: Hayato Hishinuma, Hisashi Hirose
  • Patent number: 10714355
    Abstract: A shape of a hole can be improved. The plasma etching method includes a recess forming of forming a recess having a depth smaller than a thickness of a silicon oxide film by etching the silicon oxide film by plasma; a removing process of removing a reaction product adhering to the recess by plasma generated from a fluorocarbon gas; and a penetrating process of forming a hole penetrating the silicon oxide film by etching the recess, from which the reaction product is removed, by plasma.
    Type: Grant
    Filed: June 26, 2018
    Date of Patent: July 14, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroki Sato, Hisashi Hirose
  • Patent number: 10438774
    Abstract: An etching method is provided for processing a substrate that includes a first region having an insulating film arranged on a silicon layer and a second region having the insulating film arranged on a metal layer. The etching method includes a first step of etching the insulating film into a predetermined pattern using a plasma generated from a first gas until the silicon layer and the metal layer are exposed, and a second step of further etching the silicon layer after the first step using a plasma generated from a second gas including a bromide-containing gas.
    Type: Grant
    Filed: November 20, 2017
    Date of Patent: October 8, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Hayato Hishinuma, Hisashi Hirose
  • Publication number: 20190006186
    Abstract: A shape of a hole can be improved. The plasma etching method includes a recess forming of forming a recess having a depth smaller than a thickness of a silicon oxide film by etching the silicon oxide film by plasma; a removing process of removing a reaction product adhering to the recess by plasma generated from a fluorocarbon gas; and a penetrating process of forming a hole penetrating the silicon oxide film by etching the recess, from which the reaction product is removed, by plasma.
    Type: Application
    Filed: June 26, 2018
    Publication date: January 3, 2019
    Inventors: Hiroki Sato, Hisashi Hirose
  • Publication number: 20180158654
    Abstract: An etching method is provided for processing a substrate that includes a first region having an insulating film arranged on a silicon layer and a second region having the insulating film arranged on a metal layer. The etching method includes a first step of etching the insulating film into a predetermined pattern using a plasma generated from a first gas until the silicon layer and the metal layer are exposed, and a second step of further etching the silicon layer after the first step using a plasma generated from a second gas including a bromide-containing gas.
    Type: Application
    Filed: November 20, 2017
    Publication date: June 7, 2018
    Inventors: Hayato HISHINUMA, Hisashi HIROSE
  • Patent number: 7456111
    Abstract: At a surface of a semiconductor wafer W as a processing object, a SiOC layer, a SiC layer and a Cu layer are formed in the order from an upper side. In the SiOC layer, a first opening for forming a via is formed. Using the SiOC layer as a mask, a plasma etching of the SiC layer is selectively carried out by using an etching gas containing a gas mixture of NF3/He/Ar, thereby a second opening continuously following from the first opening being formed. Therefore, it is possible to carry out the etching of the SiC layer with a high selectivity with respect to the SiOC layer.
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: November 25, 2008
    Assignee: Tokyo Electron Limited
    Inventor: Hisashi Hirose
  • Publication number: 20060102589
    Abstract: At a surface of a semiconductor wafer W as a processing object, a SiOC layer, a SiC layer and a Cu layer are formed in the order from an upper side. In the SiOC layer, a first opening for forming a via is formed. Using the SiOC layer as a mask, a plasma etching of the SiC layer is selectively carried out by using an etching gas containing a gas mixture of NF3/He/Ar, thereby a second opening continuously following from the first opening being formed. Therefore, it is possible to carry out the etching of the SiC layer with a high selectivity with respect to the SiOC layer.
    Type: Application
    Filed: November 16, 2005
    Publication date: May 18, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Hisashi Hirose
  • Patent number: 5351387
    Abstract: This invention relates to a rotation sensor which detects the magnetic field which changes with the rotation of a rotary shaft, thereby to detect the amount of rotation of the rotary shaft. The rotation sensor of the present invention has the boundaries between magnetized regions set with high precision. The boundaries forms magnetic fields stably, whereby the detection of rotation is performed with high accuracy.
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: October 4, 1994
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Hitoshi Iwata, Katsuhiro Minami, Hisahiro Ando, Hisashi Hirose, Shigeru Iguchi
  • Patent number: 5239263
    Abstract: This invention relates to a rotation sensor which detects the magnetic field which changes with the rotation of a rotary shaft, thereby to detect the amount of rotation of the rotary shaft. The rotation sensor of the present invention has the boundaries between magnetized regions set with high precision. The boundaries forms magnetic fields stably, whereby the detection of rotation is performed with high accuracy.
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: August 24, 1993
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Hitoshi Iwata, Katsuhiro Minami, Hisahiro Ando, Hisashi Hirose, Shigeru Iguchi
  • Patent number: 5088319
    Abstract: A steering angle sensor including a case body having a through hole for a steering shaft. The case body is adapted to be fixed to a vehicle body. A cover is attached to an end portion of the case body and a printed board having a flat resistor element is provided at the end portion of the case body. A hollow rotor for passing the steering shaft therethrough is rotatably supported by the case body and the cover, and the hollow rotor has a positioning portion for positioning the steering shaft. A contactor is mounted on the rotor within the cover and disposed in sliding contact with the resistor element of the printed board. A spring is interposed between the steering shaft and the rotor to apply a resilient force thereto. The resistor element has a degree of variation of a sensor output voltage in a first range of steering angles, in straight running of a vehicle, larger than that in a range of steering angles exceeding the first range.
    Type: Grant
    Filed: December 28, 1990
    Date of Patent: February 18, 1992
    Assignee: Kabushiki Kaisha Tokai-Rika-Denki-Seisakusho
    Inventors: Hisashi Hirose, Kazuo Kouno
  • Patent number: 5004915
    Abstract: Steering angle sensor apparatus includes a disc, a circuit substrate and a sensor contained within a single cover. The disc has indications such as slits or lines and is mounted on one of a steering shaft that rotates during a steering operation and a stationary member such as a steering column. The circuit substrate includes circuit parts and is mounted on the other one of the steering shaft and stationary member. A sensor includes at least one element mounted on the circuit substrate and senses the relative movement of the disc caused by the steering operation. The circuit substrate is positioned to confront a surface of the disc.
    Type: Grant
    Filed: August 9, 1989
    Date of Patent: April 2, 1991
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Keiichi Umehara, Hisashi Hirose, Kazuo Kono
  • Patent number: 4955228
    Abstract: A device for detecting rotation of a steeering wheel for motor vehicles is disclosed which comprises an encoding member rotatable together with a steering wheel and having markers at predetermined position, a sensor so disposed as to correspond to a locus of rotation of the markers; and a signal generating circuit for generating pulse signals representative of information on the rotation of the encoding member whenever the sensor is caused to correspond to the markers. A first casing housing and rotatably holding the encoding member and a second casing housing and holding the signal generating circuit are formed integrally with each other.
    Type: Grant
    Filed: November 14, 1989
    Date of Patent: September 11, 1990
    Assignee: Kabushiki Kaisha Tokai-Rika-Denki Seisakusho
    Inventors: Hisashi Hirose, Kazuo Kouno
  • Patent number: 4831349
    Abstract: A switching device suitable for use on vehicles as a window regulator switch or a sunroof regulator switch. The switching device comprises a solenoid unit including a yoke, a core and a coil, a first card attached to the core so as to be pressed against a contact for supplying current to the coil of the solenoid unit and to an external load such as a motor, to keep the contact closed while the core is attracted to the yoke, a second card disposed for movement in parallel to the direction of movement of the first card, a pivotally supported operating knob having an operating arm connected to the second card, and a returning mechanism for biasing the operating knob toward the neutral position to return the operating knob to the neutral position when released. When the operating knob is turned to a manual operating position the contact is closed temporarily and is opened when the operating knob is released.
    Type: Grant
    Filed: June 20, 1988
    Date of Patent: May 16, 1989
    Assignees: Toyota Jidosha Kabushiki Kaisha, Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Hisashi Hirose, Takanori Ohta, Shigeo Hara, Kazuo Iwata
  • Patent number: 4806809
    Abstract: A device for coupling two rotary shafts, wherein a guide member is used on the coupling end of a first shaft to guide a coupling protrusion on the coupling end of a second shaft into a V-shaped coupling recess on the first shaft. The guide member can be made of a resilient plastic, to provide a flexible and detachable coupling member and reduce abnormal wear of the rotary shaft.
    Type: Grant
    Filed: June 8, 1987
    Date of Patent: February 21, 1989
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Kazuhisa Kubota, Hisashi Hirose, Takao Sakakibara, Yasuo Miyake, Sinzi Mizutani
  • Patent number: 4426788
    Abstract: An inclinometer of the type wherein a weight rotatable in accordance with the inclination of a vehicle is provided for a drive unit, and a torque of the drive unit is transmitted to a driven unit so as to display the inclination angle of the vehicle with an inclination indicator, there are provided a zero point adjusting spiral spring, the inner end thereof being affixed to a shaft of the driven unit, while an outer end is affixed to a rotary drive member, and a zero point adjusting knob for rotating the rotary drive member. According to this invention, after the zero point has been adjusted, the zero point display line of the indicators and the zero point scale line of the scale board can be aligned horizontally, thus improving the appearance of the zero point display.
    Type: Grant
    Filed: February 24, 1983
    Date of Patent: January 24, 1984
    Assignees: Toyota Jidosha Kabushiki Kaisha, Jeco Co., Ltd.
    Inventors: Hisashi Hirose, Hiroshi Arai, Hiroshi Iiyama, Hirokazu Komiya
  • Patent number: 4321509
    Abstract: A dimmer suitable for use to control the intensity of illumination of a lamp or lamps for illuminating an instrument panel provided in a compartment of a vehicle such as a motor car, comprises: a dimming transistor connected to a lamp or lamps to be dimmed for controlling an electric current supplied to said lamp or lamps, a switching circuit connected to said dimming transistor for generating pulses having a controllable duty ratio to cause said dimming transistor to turn `ON` on `OFF`, surge voltage sensing means for sensing a surge voltage applied to an electric source line, and transistor shutoff means for shutting off said dimming transistor in response to a signal from said surge voltage sensing means.
    Type: Grant
    Filed: May 16, 1980
    Date of Patent: March 23, 1982
    Assignee: Toyota Jidosha Kogyo Kabushiki Kaisha
    Inventors: Masahiro Miyaji, Hisashi Hirose
  • Patent number: 4089157
    Abstract: A motor vehicle digital display clock including a digital time display performed by fluorescent type display tubes provided in the passenger compartment of the motor vehicle, a driving means for generating time signals to be displayed on the display means, a selection switch means provided in the passenger compartment which generates a brightness signal and a brightness control circuit electrically coupled to the grid of the fluorescent type display tubes which controls the brightness of the fluorescent type display tubes by controlling the grid voltage in response to the brightness signal.
    Type: Grant
    Filed: January 7, 1977
    Date of Patent: May 16, 1978
    Assignee: Toyota Jidosha Kogyo K.K.
    Inventors: Toshinobu Kuroyama, Hisashi Hirose