Patents by Inventor Hisashi Muramatsu

Hisashi Muramatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190341255
    Abstract: A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.
    Type: Application
    Filed: July 19, 2019
    Publication date: November 7, 2019
    Inventors: Makoto MURAMATSU, Tadatoshi TOMITA, Hisashi GENJIMA, Gen YOU, Takahiro KITANO
  • Patent number: 10418242
    Abstract: A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: September 17, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Tadatoshi Tomita, Hisashi Genjima, Gen You, Takahiro Kitano
  • Patent number: 10329144
    Abstract: A substrate treatment method using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer includes a polymer separating step, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to a hexagonal close-packed structure in a plan view after the polymer separating step, and at the polymer separating step, a columnar first hydrophilic polymer is phase-separated on each of circular patterns of hydrophobic coating films and a columnar second hydrophilic polymer is phase-separated between the first hydrophilic polymers, and a diameter of the circular pattern is set so that the first hydrophilic polymers and the second hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in a plan view.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: June 25, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Tadatoshi Tomita, Hisashi Genjima, Gen You, Takahiro Kitano, Takanori Nishi
  • Publication number: 20190016932
    Abstract: A laminate includes a resin substrate, an intermediate layer disposed on a surface of the resin substrate, and a silicon oxide layer disposed on a surface of the intermediate layer. The intermediate layer is formed by curing a composition containing a Si-free compound containing a (meth)acrylic group and a siloxane compound containing a (meth)acrylic group. A concentration of Si is higher on a silicon oxide layer side than a concentration of Si on a resin substrate side in the intermediate layer.
    Type: Application
    Filed: July 10, 2018
    Publication date: January 17, 2019
    Applicant: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Hidenori MUNEKATA, Yuya MARUYAMA, Hisashi MURAMATSU, Tetsuya MITSUOKA
  • Patent number: 9428667
    Abstract: A member for vehicle according to the present invention includes a resinous substrate, and a protective film being formed on a surface of the resinous substrate partially at least. The protective film is made by curing a curing-type coating-agent composition containing: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuric ring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C) (e.g., a reaction product) between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.
    Type: Grant
    Filed: August 27, 2012
    Date of Patent: August 30, 2016
    Assignee: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Hiroaki Takashima, Kyoko Kumagai, Hidetaka Hayashi, Tetsuya Mitsuoka, Naoharu Ueda, Hisashi Muramatsu, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Satoshi Yoneda
  • Patent number: 9403990
    Abstract: A curing-type coating-agent composition according to the present invention contains: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuric ring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C-1) (e.g., a reaction compound between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass, or Component (C-2) (e.g., a specific organosilicon compound) in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.
    Type: Grant
    Filed: August 27, 2012
    Date of Patent: August 2, 2016
    Assignees: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI, TOAGOSEI CO., LTD.
    Inventors: Hiroaki Takashima, Kyoko Kumagai, Hidetaka Hayashi, Tetsuya Mitsuoka, Naoharu Ueda, Hisashi Muramatsu, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Satoshi Yoneda, Naomasa Furuta
  • Patent number: 9359521
    Abstract: A member for vehicle according to the present invention includes a resinous substrate, and a protective film being formed on a surface of the resinous substrate partially at least. The protective film is made by curing a curing-type coating-agent composition containing: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuric ring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C) including a specific organosilicon compound in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.
    Type: Grant
    Filed: August 27, 2012
    Date of Patent: June 7, 2016
    Assignee: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Hiroaki Takashima, Kyoko Kumagai, Hidetaka Hayashi, Tetsuya Mitsuoka, Naoharu Ueda, Hisashi Muramatsu, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Satoshi Yoneda, Naomasa Furuta
  • Publication number: 20150044477
    Abstract: A member for vehicle according to the present invention includes a resinous substrate, and a protective film being formed on a surface of the resinous substrate partially at least. The protective film is made by curing a curing-type coating-agent composition containing: Component (A) (e.g., an isocyanuric ring-containing urethane(meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., anisocyanuricring-containing urethane(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C) including a specific organosilicon compound in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.
    Type: Application
    Filed: August 27, 2012
    Publication date: February 12, 2015
    Applicant: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Hiroaki Takashima, Kyoko Kumagai, Hidetaka Hayashi, Tetsuya Mitsuoka, Naoharu Ueda, Hisashi Muramatsu, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Satoshi Yoneda, Naomasa Furuta
  • Publication number: 20140242395
    Abstract: A member for vehicle according to the present invention includes a resinous substrate, and a protective film being formed on a surface of the resinous substrate partially at least. The protective film is made by curing a curing-type coating-agent composition containing: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuric ring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C) (e.g., a reaction product) between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.
    Type: Application
    Filed: August 27, 2012
    Publication date: August 28, 2014
    Applicant: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Hiroaki Takashima, Kyoko Kumagai, Hidetaka Hayashi, Tetsuya Mitsuoka, Naoharu Ueda, Hisashi Muramatsu, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Satoshi Yoneda
  • Publication number: 20140228468
    Abstract: A curing-type coating-agent composition according to the present invention contains: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuricring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C-1) (e.g., a reaction compound between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass, or Component (C-2) (e.g., a specific organosilicon compound) in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.
    Type: Application
    Filed: August 27, 2012
    Publication date: August 14, 2014
    Applicants: TOAGOSEI CO., LTD., KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Hiroaki Takashima, Kyoko Kumagai, Hidetaka Hayashi, Tetsuya Mitsuoka, Naoharu Ueda, Hisashi Muramatsu, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Satoshi Yoneda, Naomasa Furuta
  • Patent number: 7851547
    Abstract: A curable composition comprises (A) an organic/inorganic composite in which a hydrolyzable silyl group and/or SiOH group-containing polysiloxane is bonded to a vinyl polymer through a Si—C bond, and (B) an organic UV absorber having a molecular weight of at least 500 and a weight retentivity of at least 95% when held at 150° C. for 24 hours in an open state. The curable composition is coated and cured to an article, whereby the article is endowed with satisfactory weathering resistance while minimizing coloration or degradation.
    Type: Grant
    Filed: February 27, 2007
    Date of Patent: December 14, 2010
    Assignees: Shin-Etsu Chemical Co., Ltd., Kabushiki Kaisha Toyota Jidoshokki, Toyota Jidosha Kabushiki Kaisha
    Inventors: Koichi Higuchi, Masaaki Yamaya, Hisashi Muramatsu, Koichi Chigita, Toshio Watanabe, Takayuki Nagai, Toshiro Kondo
  • Publication number: 20100047582
    Abstract: A laminated body for resin glass comprising a polymer substrate for resin glass, an inorganic layer formed by causing fine particles of at least one substance selected from the group consisting of aluminum, silicon, titanium, an aluminum compound, a silicon compound and a titanium compound to adhere onto the polymer substrate for resin glass, and an alkoxysilane-containing hard coating layer laminated to the polymer substrate for resin glass having the inorganic layer interposed therebetween.
    Type: Application
    Filed: May 17, 2007
    Publication date: February 25, 2010
    Inventors: Toshihisa Shimo, Hisashi Muramatsu, Hiroyasu Hiramatsu, Toshiro Kondo, Makoto Kato, Kenzo Fukumori, Yosihide Katagiri, Takayuki Nagai, Toshio Watanabe
  • Patent number: 7662699
    Abstract: An object is to provide a technology capable of improving a manufacturing yield of semiconductor devices by preventing scattering of irregular-shaped scraps formed at the time of dicing. To achieve the above object, for dicing lines, by which an irregular-shaped outer periphery may possibly be cut off, among a plurality of dicing lines, formation of the dicing lines starts from an outside of a semiconductor wafer, and after the semiconductor wafer is cut off partway, formation of the dicing lines is ended before reaching the irregular-shaped outer periphery formed on a outer periphery of the semiconductor wafer. For other dicing lines, formation of the dicing lines starts from the outside of the semiconductor wafer, and after the semiconductor wafer is cut off, is ended outside the semiconductor wafer.
    Type: Grant
    Filed: November 24, 2005
    Date of Patent: February 16, 2010
    Assignee: Renesas Technology Corp.
    Inventors: Hajime Yui, Hisashi Muramatsu
  • Publication number: 20090162993
    Abstract: An object is to provide a technology capable of improving a manufacturing yield of semiconductor devices by preventing scattering of irregular-shaped scraps formed at the time of dicing. To achieve the above object, for dicing lines, by which an irregular-shaped outer periphery may possibly be cut off, among a plurality of dicing lines, formation of the dicing lines starts from an outside of a semiconductor wafer, and after the semiconductor wafer is cut off partway, formation of the dicing lines is ended before reaching the irregular-shaped outer periphery formed on a outer periphery of the semiconductor wafer. For other dicing lines, formation of the dicing lines starts from the outside of the semiconductor wafer, and after the semiconductor wafer is cut off, is ended outside the semiconductor wafer.
    Type: Application
    Filed: November 24, 2005
    Publication date: June 25, 2009
    Inventors: Hajime Yui, Hisashi Muramatsu
  • Publication number: 20070219298
    Abstract: A curable composition comprises (A) a vinyl polymer having hydrolyzable silyl groups and/or SiOH groups and organic UV absorbing groups bonded to side chains, (B) an organic UV absorber having a molecular weight of at least 500 and a weight retentivity of at least 95% when held at 150° C. for 24 hours in an open state, and (C) an organosilicon compound containing a nitrogen atom and an alkoxysilyl group in the molecule. The curable composition is coated and cured to an article, whereby the article is endowed with satisfactory weathering resistance while minimizing coloration or degradation.
    Type: Application
    Filed: February 27, 2007
    Publication date: September 20, 2007
    Applicants: Shin-Etsu Chemical Co., Ltd., KABUSHIKI KAISHA TOYOTA JIDOSHOKKI, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Koichi Higuchi, Masaaki Yamaya, Hisashi Muramatsu, Koichi Chigita, Toshio Watanabe, Takayuki Nagai, Toshiro Kondo
  • Publication number: 20070212557
    Abstract: A curable composition comprises (A) an organic/inorganic composite in which a hydrolyzable silyl group and/or SiOH group-containing polysiloxane is bonded to a vinyl polymer through a Si—C bond, and (B) an organic UV absorber having a molecular weight of at least 500 and a weight retentivity of at least 95% when held at 150° C. for 24 hours in an open state. The curable composition is coated and cured to an article, whereby the article is endowed with satisfactory weathering resistance while minimizing coloration or degradation.
    Type: Application
    Filed: February 27, 2007
    Publication date: September 13, 2007
    Applicants: Shin-Etsu Chemical Co., Ltd., KABUSHIKI KAISHA TOYOTA JIDOSHOKKI, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Koichi Higuchi, Masaaki Yamaya, Hisashi Muramatsu, Koichi Chigita, Toshio Watanabe, Takayuki Nagai, Toshiro Kondo
  • Publication number: 20060172136
    Abstract: A coated member includes a resinous substrate, a primer layer, and a hard coat layer. The primer layer is formed on a surface of the resinous substrate, and is composed of a resinous primer. The hard coat layer is formed on the primer layer, and contains a flexibility-imparting agent. At least one of the primer layer and the hard coat layer further contains an ultraviolet ray-absorbing agent. The coated member exhibits good weatherability, adhesiveness and crack resistance.
    Type: Application
    Filed: January 31, 2006
    Publication date: August 3, 2006
    Inventors: Takashi Komori, Hisashi Muramatsu, Osamu Hidaka, Kenichi Yasunaga, Takayuki Nagai, Masaaki Yamaya, Koichi Higuchi