Hisashi Murozumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: The present invention is to provide glass exhibiting both of a low thermal expansion and a low-temperature melting property and to provide glass which is able to be manufactured under the condition where an average linear thermal expantion coefficient at 0° C. to 50° C. is preferably not more than 40×10?7° C.?1, more preferably 35×10?7° C.?1 and, most preferably, 33×10?7° C.?1 and a fusing temperature is preferably not higher than 1550° C., more preferably not higher than 1540° C. and, most preferably, not higher than 1530° C. The means therefor is the glass, characterized in that, where an average linear thermal expantion coefficient at 0° C. to 50° C. is not more than 40×10?7° C.?1, an Al2O3 component and a B2O3 component on the basis of oxides are contained and the ratio of B2O3/Al2O3 in terms of % by mass is not less than 0.8.
Abstract: The present invention is to provide glass exhibiting both of a low thermal expansion and a low-temperature melting property and to provide glass which is able to be manufactured under the condition where an average linear thermal expantion coefficient at 0° C. to 50° C. is preferably not less than 40×10?7° C.?1, more preferably 35×10?7° C.?1 and, most preferably, 33×10?7° C.?1 and a fusing temperature is preferably not higher than 1550° C., more preferably not higher than 1540° C. and, most preferably, not higher than 1530° C. The means therefor is the glass, characterized in that, where an average linear thermal expantion coefficient at 0° C. to 50° C. is not more than 40×10?7° C.?1, an Al2O3 component and a B2O3 component on the basis of oxides are contained and the ratio of B2O3/Al2O3 in terms of % by mass is not less than 0.8.