Abstract: A learning device calculates an estimation target item reference value according to a fixed value of each estimation target object. The learning device acquires learning data that includes the fixed value of each estimation target object, a variable item value, and an estimation target item value according to the fixed value and the variable item value. The learning device trains, using the learning data and an evaluation function, a model that outputs an estimated value of the estimation target item value in response to input of the fixed value of each estimation target object and the variable item value.

Abstract: There is provided a curable composition for imprinting containing a polymerizable compound, in which (a) the concentration of a polymerizable group in the polymerizable compound is in the range of 4.3 mmol/g to 7.5 mmol/g, (b) a polymerizable compound X whose Ohnishi parameter is 3.5 or less and ring parameter is 0.35 or greater is contained in the range of 40% by mass to 95% by mass with respect to all the polymerizable compounds, (c) a polymerizable compound C having three or more polymerizable groups is further contained in the range of 5% by mass to 20% by mass with respect to all the polymerizable compounds, and (d) the viscosity of the composition being at 25° C. and in a state of not containing a solvent is in the range of 3 mPa·s to 8,000 mPa·s.

Abstract: A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

Abstract: A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

Abstract: There is provided a curable composition for imprinting containing a polymerizable compound, in which (a) the concentration of a polymerizable group in the polymerizable compound is in the range of 4.3 mmol/g to 7.5 mmol/g, (b) a polymerizable compound X whose Ohnishi parameter is 3.5 or less and ring parameter is 0.35 or greater is contained in the range of 40% by mass to 95% by mass with respect to all the polymerizable compounds, (c) a polymerizable compound C having three or more polymerizable groups is further contained in the range of 5% by mass to 20% by mass with respect to all the polymerizable compounds, and (d) the viscosity of the composition being at 25° C. and in a state of not containing a solvent is in the range of 3 mPa·s to 8,000 mPa·s.

Abstract: The present invention provides a nanoimprint curable composition to be used in “nanoimprint lithography” in which a nanoimprint mold is pressed to transfer a fine concave-convex pattern, the nanoimprint curable composition containing a composite resin which has a polysiloxane segment and a polymer segment other than the polysiloxane segment, the polysiloxane segment containing a silanol group and/or hydrolyzable silyl group and having a polymerizable double bond. In addition, the present invention provides a nanoimprint-lithographic molded product, resist film, resin mold, and method for forming a pattern, which each involves use of the nanoimprint composition.

Abstract: Provided is a shaped article having surface irregularities, including a fine structure including projections and a recess formed between the projections, the fine structure formed by curing a curable resin composition, wherein the curable resin composition contains a composite resin (A) in which a polysiloxane segment (a1) having a structural unit represented by a general formula (1) and/or a general formula (2) and a silanol group and/or a hydrolyzable silyl group is bonded to a vinyl-based polymer segment (a2) having an alcoholic hydroxy group through a bond represented by a general formula (3), and polyisocyanate (B); a content of the polysiloxane segment (a1) with respect to total solids weight of the curable resin composition is 10% to 60% by weight; and a content of the polyisocyanate (B) with respect to total solids weight of the curable resin composition is 5% to 50% by weight.

Abstract: There is provided a sealing material including a composite resin (A) including a polysiloxane segment (a1) having a structural unit represented by general formula (1) and/or general formula (2) and a silanol group and/or a hydrolyzable silyl group and a vinyl-based polymer segment (a2) having an alcoholic hydroxyl group, the vinyl-based polymer segment (a2) being bonded to the polysiloxane segment (a1) through a bond represented by general formula (3), and a polyisocyanate (B), wherein the content of the polysiloxane segment (a1) is 10% to 50% by weight relative to the total solid content of a curable resin composition, and the content of the polyisocyanate (B) is 5% to 50% by weight relative to the total solid content of the curable resin composition. There are also provided a solar cell module and a light-emitting diode that each use the sealing material.