Patents by Inventor Hisato Sinohara

Hisato Sinohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4865686
    Abstract: A laser scribing system and method is described. In the system, a film formed on a substrate is irradiated with laser beam which is focused on a limited portion of the film in order to remove the portion and produce a groove. Laser beam used for eliminating the portion of film formed on a substrate is deprived of its border portion in advance of the focusing. Sperical aberration is suppressed due to this elimination.
    Type: Grant
    Filed: May 3, 1988
    Date of Patent: September 12, 1989
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Hisato Sinohara
  • Patent number: 4861964
    Abstract: A laser scribing system and method is described. In the system, a film formed on a substrate is irradiated with laser beam which is focused on a limited portion of the film in order to remove the portion and produce a groove. Laser beam used for eliminating the portion of film formed on a substrate is deprived of its border portion in advance of the focusing. Spherical aberration is suppressed due to this elimination.
    Type: Grant
    Filed: September 16, 1987
    Date of Patent: August 29, 1989
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Hisato Sinohara