Patents by Inventor Hisatoshi Ohtsuka

Hisatoshi Ohtsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Synthetic fused silica member, method for producing the same and optical member for excimer laser
    Patent number: 6351972
    Abstract: There is disclosed a method for producing a synthetic fused silica member comprising vaporizing a raw material silane compound, hydrolyzing or oxidizing by combustion the vaporized silane compound in oxyhydrogen flame to form silica microparticles so that the silica microparticles should deposit on a rotating refractory carrier, and melting the silica microparticles during the deposition to form the synthetic fused silica member, wherein sulfur impurities are preliminarily removed from the raw material.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: March 5, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Hisatoshi Ohtsuka