Patents by Inventor Hisayuki Hamajima

Hisayuki Hamajima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma-etching electrode plate
    Patent number: 5853523
    Abstract: A plasma-etching electrode plate in the form of flat glassy carbon plate is characterized by a flatness with a warp smaller than 0.3 mm. This flatness permits the electrode plate to have a uniform surface temperature distribution which contributes to uniform etching on semiconductor wafers. The electrode plate is a glassy carbon plate obtained from one or more thermosetting resins having a carbon yield higher than 20%.
    Type: Grant
    Filed: February 14, 1997
    Date of Patent: December 29, 1998
    Assignee: Tokai Carbon Company, Ltd.
    Inventors: Osamu Machida, Hisayuki Hamajima