Patents by Inventor Hisayuki Higuchi

Hisayuki Higuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4986666
    Abstract: A semiconductor memory device capable of operating at high speeds, and a sense circuit and a decoder circuit that can be suitably used for the memory device. A latch function is imparted to at least either one of the decoder circuit or the sense circuit in the semiconductor memory device.
    Type: Grant
    Filed: November 29, 1988
    Date of Patent: January 22, 1991
    Assignees: Hitachi Device Engineering Co., Ltd., Hitachi Ltd.
    Inventors: Noriyuki Homma, Hisayuki Higuchi, Yoji Idei, Hiroaki Nambu, Yoshiaki Sakurai
  • Patent number: 4984058
    Abstract: In a semiconductor integrated circuit device having memory cell arrays, power source wirings are provided on the memory cell array in parallel with the long side of the memory cell array, thereby strengthening the power source wirings without increasing a chip size and planning reduction in power source impedances.
    Type: Grant
    Filed: July 28, 1988
    Date of Patent: January 8, 1991
    Assignees: Hitachi Microcomputer Engineering, Ltd., Hitachi, Ltd., Akita Electronics Co., Ltd.
    Inventors: Shuuichi Miyaoka, Nobuo Tamba, Toshikazu Arai, Hiroshi Higuchi, Hisayuki Higuchi
  • Patent number: 4942555
    Abstract: A semiconductor memory is provided having high reliability, and which particularly prevents data destruction by rays, and the like. In a semiconductor memory for detecting memory data from the conduction ratio between a transistor of a flip-flop type memory cell connected to selected word line and data line pairs and a load device of the data line, an arrangement is provided for setting the word line voltage to a voltage lower than the sum of the data line voltage and the threshold voltage of a data transfer MOS transistor of the memory cell. The signal read out from the memory cell is then applied through the data line to a differential amplifier using the base or gate of a junction type transistor as its input. Particularly to set the word line voltage to a voltage lower than the sum of the data line voltage and the threshold voltage of the data transfer MOS transistor of the memory cell, a device having high driving capability such as a bipolar transistor is used as the load of the data line.
    Type: Grant
    Filed: July 7, 1989
    Date of Patent: July 17, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Hisayuki Higuchi, Makoto Suzuki, Noriyuki Homma, Kiyoo Itoh
  • Patent number: 4937480
    Abstract: A semiconductor integrated circuit includes an input buffer circuit, a decoder circuit and a plurality of memory cells. Each of the input buffer circuit and the decoder circuit consists of a combination of bipolar transistors and MOS transistors. In this combination various measures are taken to increase the operation speed and to reduce the electric power consumption. In an example thereof the data line load for the memory cells is constituted by Schottky barrier type diodes. In another example the load used for the respective emitter follower transistors is constituted by an MOS transistor operating as a variable resistance. In still another example, in a CMOS NOR ciruit of the decoder circuit the number of P channel MOS transistors are fewer than the number of N channel MOS transistors.
    Type: Grant
    Filed: June 27, 1989
    Date of Patent: June 26, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Hisayuki Higuchi, Makoto Suzuki, Noriyuki Homma
  • Patent number: 4928265
    Abstract: Considering the dispersion in the access time of semiconductor memories, at least a first and a second memory circuit are connected to the output of a sense amplifier. The output of the sense amplifier is an input to these two memory circuits alternatively at different timings. The data stored in these memory circuits are alternately transferred to a data output circuit. Even when the access time becomes long, the desired sense data can be successively read out from the output of the data output circuit at a short time interval determined by the clock cycle. When the access time becomes short and even when a second data is generated from the output of the sense amplifier at the timing of transferring a first data in the first memory circuit to the data output circuit, the first data held in the first memory circuit is prevented from being renewed by the second data.
    Type: Grant
    Filed: November 2, 1988
    Date of Patent: May 22, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Hisayuki Higuchi, Noriyuki Homma, Makoto Suzuki, Suguru Tachibana
  • Patent number: 4866673
    Abstract: A semiconductor memory is provided having high reliability, and which particularly prevents data destruction by .alpha. rays, and the like. In a semiconductor memory for detecting memory data from the conduction ratio between a transistor of a flip-flop type memory cell connected to selected word line and data line pairs and a load device of the data line, an arrangement is provided for setting the word line voltage to a voltage lower than the sum of the data line voltage and the threshold voltage of a data transfer MOS transistor of the memory cell. The signal read out from the memory cell is then applied through the data line to a differential amplifier using the base or gate of a junction type transistor as its input. Particularly to set the word line voltage to a voltage lower than the sum of the data line voltage and the threshold voltage of the data transfer MOS transistor of the memory cell, a device having high driving capability such as a bipolar transistor is used as the load of the data line.
    Type: Grant
    Filed: April 16, 1987
    Date of Patent: September 12, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Hisayuki Higuchi, Makoto Suzuki, Noriyuki Homma, Kiyoo Itoh
  • Patent number: 4858191
    Abstract: A semiconductor integrated circuit includes an input buffer circuit, a decoder circuit and a plurality of memory cells. Each of the input buffer circuit and the decoder circuit consists of a combination of bipolar transistors and MOS transistors. In this combination various measures are taken to increase the operation speed and to reduce the electric power consumption. In an example thereof the data line load for the memory cells is constituted by Schottky barrier type diodes. In another example the load used for the respective emitter follower transistors is constituted by an MOS transistor operating as a variable resistance.In still another example, in a CMOS NOR circuit of the decoder circuit the number of P channel MOS transistors are fewer than the number of N channel MOS transistors.
    Type: Grant
    Filed: December 11, 1987
    Date of Patent: August 15, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Hisayuki Higuchi, Makoto Suzuki, Noriyuki Homma
  • Patent number: 4825274
    Abstract: A circuit including a Bi-CMOS semiconductor device of a structure capable of preventing the latch-up phenomenon from occurring when operated as an inverter or the like. The semiconductor device includes a MOS FET and a bipolar transistor merged with each other and having a PNPN or NPNP structure in a region to which minority carriers can migrate through diffusion and in which a same potential is applied to at least a pair of P-type and N-type regions or a backward voltage is applied across PN junctions in operation. The semiconductor device comprises electrodes provided in both P-type and N-type regions, respectively, which form one of the PN junctions, wherein a backward voltage not lower than 0.5 V is applied across the electrodes upon operating the device.
    Type: Grant
    Filed: November 13, 1986
    Date of Patent: April 25, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Hisayuki Higuchi, Makoto Suzuki
  • Patent number: 4642486
    Abstract: This invention is effective in the speeding up of a decoder circuit and maintenance of output amplitude. The invention is characterized in that, in a decoder circuit composed of a multi-emitter transistor or at least one diode group in which the anodes of a plurality of diodes are connected, and a charge circuit having an output emitter follower transistor, the multi-emitter transistor or the forward voltage of the diodes are larger than the voltage between the base and the emitter of the output emitter follower transistor.
    Type: Grant
    Filed: December 27, 1984
    Date of Patent: February 10, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Noriyuki Honma, Hiroaki Nambu, Isao Yoshida, Hisayuki Higuchi, Kunihiko Yamaguchi
  • Patent number: 4640721
    Abstract: After an end part of a polycrystalline silicon film has been oxidized from an exposed side surface thereof, a silicon dioxide film formed is removed, and an opening thus provided is used for diffusing an impurity into a semiconductor substrate so as to form a graft base region.This measure is effective for fabricating a semiconductor device of small required area at high precision.
    Type: Grant
    Filed: June 5, 1985
    Date of Patent: February 3, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Keijiro Uehara, Hisayuki Higuchi, Akio Hayasaka
  • Patent number: 4635090
    Abstract: A semiconductor device and the method of manufacturing the same are disclosed, the semiconductor device having a plurality of elements isolated by a groove having a gentle slope at the upper side wall, and a steep slope at the lower side wall. This groove provides low steps on its mouth and occupies a small area on the substrate, thus enabling an extremely high-density integrated circuit to be formed.
    Type: Grant
    Filed: May 13, 1985
    Date of Patent: January 6, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Yoichi Tamaki, Tokuo Kure, Akira Sato, Hisayuki Higuchi
  • Patent number: 4396460
    Abstract: After filling grooves with a filling material, this filling material is etched by the use of a double-layer film which is made of substances different from each other.The side etching of the lower film of the double-layer film and the etching of the filling material are alternately performed in such a manner that each etching is carried out a plurality of number of times. Thus, the upper surface of the filling material contained in each groove can be flattened.
    Type: Grant
    Filed: May 21, 1982
    Date of Patent: August 2, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Yoichi Tamaki, Tokuo Kure, Takeo Shiba, Hisayuki Higuchi