Patents by Inventor Hisayuki TODA

Hisayuki TODA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10533022
    Abstract: An object of the present invention is to provide a silicon oligomer having a novel function that has not been achieved by a conventional condensation product of water and a tetraalkoxysilane. Provided are a silicon oligomer represented by the following formula (I) and a production method therefor: wherein R1 to R10 each independently is an alkyl group or a hydroxyalkyl group, each having 1 to 4 carbon atoms; X1 to X3 each independently is a group represented by the following formula (II); n is 0 or 1; and m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1: wherein A is an alkylene group having 2 to 4 carbon atoms which may be branched, and 1 is an integer of 1 to 3.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: January 14, 2020
    Assignee: JCU CORPORATION
    Inventors: Daisuke Sadohara, Kenichi Nishikawa, Yasutake Nemichi, Hisayuki Toda, Hiroki Yasuda, Shinsuke Takagi, Christopher Ernest John Cordonier
  • Publication number: 20180298515
    Abstract: Instead of the renewal or purification of copper sulfate plating solutions performed based on the increase of defective products as an ex post facto measure or the empirical determination, a technique capable of managing copper sulfate plating solutions by assessing the aging of the copper sulfate plating solutions in an objective manner is provided. A method for managing a copper sulfate plating solution used for performing copper sulfate plating for a material to be plated, the method containing: measuring a concentration of impurities in the copper sulfate plating solution; and assessing aging of the copper sulfate plating solution from the concentration of the impurities.
    Type: Application
    Filed: April 27, 2015
    Publication date: October 18, 2018
    Applicant: JCU CORPORATION
    Inventors: Tetsuro EDA, Hisayuki TODA, Kazuki KISHIMOTO, Yasuko TAKAYA, Ryoichi KIMIZUKA
  • Publication number: 20170369513
    Abstract: An object of the present invention is to provide a silicon oligomer having a novel function that has not been achieved by a conventional condensation product of water and a tetraalkoxysilane. Provided are a silicon oligomer represented by the following formula (I) and a production method therefor: wherein R1 to R10 each independently is an alkyl group or a hydroxyalkyl group, each having 1 to 4 carbon atoms; X1 to X3 each independently is a group represented by the following formula (II); n is 0 or 1; and m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1: wherein A is an alkylene group having 2 to 4 carbon atoms which may be branched, and 1 is an integer of 1 to 3.
    Type: Application
    Filed: September 8, 2017
    Publication date: December 28, 2017
    Applicant: JCU CORPORATION
    Inventors: Daisuke Sadohara, Kenichi Nishikawa, Yasutake Nemichi, Hisayuki Toda, Hiroki Yasuda, Shinsuke Takagi, Christopher Ernest John Cordonier
  • Publication number: 20160137673
    Abstract: An object of the present invention is to provide a silicon oligomer having a novel function that has not been achieved by a conventional condensation product of water and a tetraalkoxysilane. Provided are a silicon oligomer represented by the following formula (I) and a production method therefor: wherein R1 to R10 each independently is an alkyl group or a hydroxyalkyl group, each having 1 to 4 carbon atoms; X1 to X3 each independently is a group represented by the following formula (II); n is 0 or 1; and m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1: wherein A is an alkylene group having 2 to 4 carbon atoms which may be branched, and l is an integer of 1 to 3.
    Type: Application
    Filed: June 28, 2013
    Publication date: May 19, 2016
    Applicant: JCU CORPORATION
    Inventors: Daisuke SADOHARA, Kenichi NISHIKAWA, Yasutake NEMICHI, Hisayuki TODA, Hiroki YASUDA, Shinsuke TAKAGI, Christopher Eenest John CORDONIER