Patents by Inventor Hitomi Sakai

Hitomi Sakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11487480
    Abstract: A method of displaying preset information according to an embodiment may include: storing plural pieces of preset information including first preset information and second preset information; obtaining, from a target file that is to be processed and includes first association information associated with the first preset information, the first association information; and displaying one or more pieces of preset information out of the plural pieces of preset information that are stored, while preferentially displaying, based on the obtained first association information, the first preset information associated with the first association information with respect to the second preset information.
    Type: Grant
    Filed: August 19, 2020
    Date of Patent: November 1, 2022
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Kenji Sawaguchi, Hitomi Sakai
  • Patent number: 11276548
    Abstract: Provided are a charged particle beam device and a charged particle beam adjustment method capable of observing or inspecting a change in observation conditions in a more appropriate beam state while preventing an increase in a time required for each measurement point. The charged particle beam device includes a condenser lens 3 and an objective lens 14 configured to focus an electron beam 4 emitted from an electron source 2, a primary beam scanning deflector 5 or a secondary electron deflector 15, an adjusting element 13 configured to adjust an axis of the electron beam 4, and a control device 9 configured to supply a signal representing a control amount to the adjusting element 13 for control.
    Type: Grant
    Filed: November 23, 2020
    Date of Patent: March 15, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hitomi Sakai, Daisuke Sato, Keiichiro Hitomi, Hiroyuki Saito, Kazuma Tanii
  • Publication number: 20210233735
    Abstract: Provided are a charged particle beam device and a charged particle beam adjustment method capable of observing or inspecting a change in observation conditions in a more appropriate beam state while preventing an increase in a time required for each measurement point. The charged particle beam device includes a condenser lens 3 and an objective lens 14 configured to focus an electron beam 4 emitted from an electron source 2, a primary beam scanning deflector 5 or a secondary electron deflector 15, an adjusting element 13 configured to adjust an axis of the electron beam 4, and a control device 9 configured to supply a signal representing a control amount to the adjusting element 13 for control.
    Type: Application
    Filed: November 23, 2020
    Publication date: July 29, 2021
    Inventors: Hitomi SAKAI, Daisuke SATO, Keiichiro HITOMI, Hiroyuki SAITO, Kazuma TANII
  • Publication number: 20210089244
    Abstract: A method of displaying preset information according to an embodiment may include: storing plural pieces of preset information including first preset information and second preset information; obtaining, from a target file that is to be processed and includes first association information associated with the first preset information, the first association information; and displaying one or more pieces of preset information out of the plural pieces of preset information that are stored, while preferentially displaying, based on the obtained first association information, the first preset information associated with the first association information with respect to the second preset information.
    Type: Application
    Filed: August 19, 2020
    Publication date: March 25, 2021
    Applicant: Oki Data Corporation
    Inventors: Kenji SAWAGUCHI, Hitomi SAKAI
  • Patent number: 8383409
    Abstract: The invention is directed to methods for the propagation or cultivation of cells including preparing a cell culture substrate, wherein the cell culture substrate includes a substrate and a layer formed by surface modification. The layer includes a polymer containing an amino group. The polymer is produced by reacting a polymer represented by formula (II): with a polymer having at least one amino group, —NH2, capable of forming a Schiff base in a monomer of formula (II), thereby forming a polymer layer constituting the layer formed by surface modification. “n” in Formula (II) is 0 or a positive integer, and m is a positive integer. n and m represent the degree of polymerization. Formula (II) is formed by chemical vapor deposition of formyl[2.2]paracyclophane. The methods further include providing cells in a medium; inoculating the cells onto the cell culture substrate; and culturing the cells, wherein the cells adhere to the cell culture substrate.
    Type: Grant
    Filed: February 3, 2011
    Date of Patent: February 26, 2013
    Assignees: Kisco Ltd., Daisan Kasei Co., Ltd., The University of Tokyo
    Inventors: Shin Ohya, Takashi Inoue, Takatoki Yamamoto, Teruo Fujii, Yasuyuki Sakai, Masaki Nishikawa, Hitomi Sakai, Hirosuke Naruto
  • Publication number: 20110136234
    Abstract: A cell culture substrate which is durable and which can be readily produced in commercial scale at a low cost, and its production method are provided. The cell culture substrate comprises a substrate and a layer formed by surface modification, which comprises a polymer containing amino group produced by reacting a polymer represented by the following formula (II): (wherein n is 0 or a positive integer, and m is a positive integer, the n and m representing degree of polymerization) formed by chemical vapor deposition of formyl[2.2]paracyclophane represented by the following formula (I): (wherein k is 0 or 1) with a polymer having at least one amino group (—NH2) capable of forming Schiff base in its monomer. The production method of the cell culture substrate comprises the step of synthesizing such polymer on the substrate.
    Type: Application
    Filed: February 3, 2011
    Publication date: June 9, 2011
    Inventors: Shin OHYA, Takashi Inoue, Takatoki Yamamoto, Teruo Fujii, Yasuyuki Sakai, Masaki Nishikawa, Hitomi Sakai, Hirosuke Naruto
  • Publication number: 20090042295
    Abstract: A cell culture substrate which is durable and which can be readily produced in commercial scale at a low cost, and its production method are provided. The cell culture substrate comprises a substrate and a layer formed by surface modification, which comprises a polymer containing amino group produced by reacting a polymer represented by the following formula (II): (wherein n is 0 or a positive integer, and m is a positive integer, the n and m representing degree of polymerization) formed by chemical vapor deposition of formyl[2.2]paracyclophane represented by the following formula (I): (wherein k is 0 or 1) with a polymer having at least one amino group (—NH2) capable of forming Schiff base in its monomer. The production method of the cell culture substrate comprises the step of synthesizing such polymer on the substrate.
    Type: Application
    Filed: August 8, 2007
    Publication date: February 12, 2009
    Applicants: KISHIMOTO SANGYO CO., LTD., DAISANKASEI CO., LTD., THE UNIVERSITY OF TOKYO
    Inventors: Shin Ohya, Takashi Inoue, Takatoki Yamamoto, Teruo Fujii, Yasuyuki Sakai, Masaki Nishikawa, Hitomi Sakai, Hirosuke Naruto