Patents by Inventor Hitomi Sano

Hitomi Sano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230050380
    Abstract: The present invention is intended to provide: an anti-hCDCP1 antibody, which can be used as an active ingredient of anticancer agents having few side effects, etc.; and the aforementioned anti-hCDCP1 antibody that is formulated into ADC. Specifically, the present invention relates to an antibody that binds to human CDCP1 (CUB domain-containing protein 1), which has low binding property to human CD34-positive cells, or an antigen-binding fragment thereof.
    Type: Application
    Filed: December 24, 2020
    Publication date: February 16, 2023
    Applicant: CHIOME BIOSCIENCE INC.
    Inventors: Shuichi HASHIMOTO, Koji NAKAMURA, Hitomi SANO, Akiko YOSHIOKA, Aki TAKESUE
  • Publication number: 20210332129
    Abstract: A chicken B cell that expresses a variety of human antibodies.
    Type: Application
    Filed: May 7, 2021
    Publication date: October 28, 2021
    Inventors: Shuichi Hashimoto, Tomoaki Uchiki, Shigehisa Kawata, Kenjiro Asagoshi, Takashi Yabuki, Hitomi Sano, Shunsuke Miyai, Naoki Takahashi, Aki Takesue, Atsushi Sawada
  • Publication number: 20170058029
    Abstract: It is an object of the present invention to provide a chicken B cell that expresses a variety of human antibodies.
    Type: Application
    Filed: May 1, 2015
    Publication date: March 2, 2017
    Inventors: Shuichi Hashimoto, Tomoaki Uchiki, Shigeshisa Kawata, Kenjiro Asagoshi, Takashi Yabuki, Hitomi Sano, Shunsuke Miyai, Naoki Takahashi, Aki Takesue, Atsushi Sawada
  • Patent number: 7442358
    Abstract: A carbonaceous particle is provided which comprises a hexagonal flake formed of an aggregate of a plurality of nanocarbons and having a side length of 0.1 to 100 mm and a thickness of 10 nm to 1 mm. Thereby, a carbonaceous particle is provided which has an excellent electron emission performance, has a high electron conductivity, shows excellent characteristics particularly when used for a secondary battery, and can suitably be applied to various devices other than a secondary battery as well.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: October 28, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hitomi Sano, Soichiro Kawakami, Tomoya Yamamoto, Katsuhiko Inoue
  • Patent number: 7270795
    Abstract: A method for producing nano-carbon materials, having a step wherein a starting material comprising one or more kinds of compounds selected from the group consisting saturated hydrocarbons, unsaturated hydrocarbons, saturated cyclic hydrocarbons, and alcohols whose atomic ratio of the component carbon to the component oxygen is more than 2.0 and a catalyst are together treated at a temperature in a range of from 100 to 800° C. while being compressed at a pressure in a range of from 0.2 to 60 MPa.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: September 18, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Soichiro Kawakami, Katsuhiko Inoue, Hitomi Sano, Nobuyuki Suzuki
  • Publication number: 20060062713
    Abstract: A carbonaceous particle is provided which comprises a hexagonal flake formed of an aggregate of a plurality of nanocarbons and having a side length of 0.1 to 100 mm and a thickness of 10 nm to 1 mm. Thereby, a carbonaceous particle is provided which has an excellent electron emission performance, has a high electron conductivity, shows excellent characteristics particularly when used for a secondary battery, and can suitably be applied to various devices other than a secondary battery as well.
    Type: Application
    Filed: April 2, 2004
    Publication date: March 23, 2006
    Applicant: CANNON KABUSHIKI KAISHA
    Inventors: Hitomi Sano, Soichiro Kawakami, Tomoya Yamamoto, Katsuhiko Inoue
  • Patent number: 7001581
    Abstract: A method for producing fullerenes, characterized in that said method includes a step (a) of contacting an aromatic compound-containing starting material with a supercritical fluid or a subcritical fluid in the presence of a transition metal element-containing catalyst at a temperature in a range of from 350 to 800° C. and at a pressure in a range of from 3 to 50 MPa. Said supercritical fluid or said subcritical fluid is formed from one or more kinds of materials selected from the group consisting of an aromatic compound as said starting material, a solvent for said aromatic compound, a solvent for said catalyst, water, dinitrogen monoxide, and ammonia.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: February 21, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Soichiro Kawakami, Tomoya Yamamoto, Hitomi Sano, Atsushi Tani
  • Patent number: 6953564
    Abstract: A method for producing fullerenes, characterized in that said method includes a step (a) of contacting an aromatic compound-containing starting material with a supercritical fluid or a subcritical fluid at a temperature in a range of from 31° C. to 500° C. and at a pressure in a range of from 3.8 MPa to 60 MPa. Said supercritical fluid or said subcritical fluid is formed from one or more kinds of materials selected from the group consisting of an aromatic compound as said starting material, a solvent capable of dissolving said aromatic compound, water, dinitrogen monoxide, and ammonia.
    Type: Grant
    Filed: October 1, 2002
    Date of Patent: October 11, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Soichiro Kawakami, Tomoya Yamamoto, Hitomi Sano
  • Publication number: 20050079119
    Abstract: A method for producing nano-carbon materials, having a step wherein a starting material comprising one or more kinds of compounds selected from the group consisting saturated hydrocarbons, unsaturated hydrocarbons, saturated cyclic hydrocarbons, and alcohols whose atomic ratio of the component carbon to the component oxygen is more than 2.0 and a catalyst are together treated at a temperature in a range of from 100 to 800° C. while being compressed at a pressure in a range of from 0.2 to 60 MPa, where said starting material is converted into a supercritical fluid or a subcritical fluid while said supercritical fluid or said subcritical fluid being contacted with said catalyst, or a step wherein said starting material, said catalyst and a supplementary material capable of functioning as a reaction promotion medium are together treated at a temperature in a range of from 100 to 800° C. while being compressed at a pressure in a range of from 0.
    Type: Application
    Filed: January 23, 2004
    Publication date: April 14, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Soichiro Kawakami, Katsuhiko Inoue, Hitomi Sano, Nobuyuki Suzuki
  • Publication number: 20030086859
    Abstract: A method for producing fullerenes, characterized in that said method includes a step (a) of contacting an aromatic compound-containing starting material with a supercritical fluid or a subcritical fluid in the presence of a transition metal element-containing catalyst at a temperature in a range of from 350 to 800° C. and at a pressure in a range of from 3 to 50 MPa. Said supercritical fluid or said subcritical fluid is formed from one or more kinds of materials selected from the group consisting of an aromatic compound as said starting material, a solvent for said aromatic compound, a solvent for said catalyst, water, dinitrogen monoxide, and ammonia.
    Type: Application
    Filed: October 4, 2002
    Publication date: May 8, 2003
    Inventors: Soichiro Kawakami, Tomoya Yamamoto, Hitomi Sano, Atsushi Tani
  • Publication number: 20030072706
    Abstract: A method for producing fullerenes, characterized in that said method includes a step (a) of contacting an aromatic compound-containing starting material with a supercritical fluid or a subcritical fluid at a temperature in a range of from 31° C. to 500° C. and at a pressure in a range of from 3.8 MPa to 60 MPa. Said supercritical fluid or said subcritical fluid is formed from one or more kinds of materials selected from the group consisting of an aromatic compound as said starting material, a solvent capable of dissolving said aromatic compound, water, dinitrogen monoxide, and ammonia.
    Type: Application
    Filed: October 1, 2002
    Publication date: April 17, 2003
    Applicant: Canon Kabushiki Kaisha
    Inventors: Soichiro Kawakami, Tomoya Yamamoto, Hitomi Sano
  • Patent number: 6413794
    Abstract: A method of forming a photovoltaic element according to the present invention comprises at least the steps of depositing a metal layer on a supporting member, depositing a metal oxide layer on the above metal layer, and arranging at least one or more pin structures, each of which is formed by stacking the predetermined n-type, i-type and p-type semiconductor layers, on a substrate formed by stacking on the above supporting member, the above metal layer and the above metal oxide layer in this order, wherein a step of subjecting the supporting member having the metal layer formed thereon to heat treatment is carried out between the two steps of depositing the above metal layer and depositing the above metal oxide layer.
    Type: Grant
    Filed: August 29, 2000
    Date of Patent: July 2, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hitomi Sano, Masahiro Kanai, Hideo Tamura
  • Patent number: 6397775
    Abstract: In a deposited film forming system having at least a vacuum vessel, means for feeding a film-forming material gas into the vacuum vessel, a discharge electrode provided inside the vacuum vessel, used to make the material gas into a plasma, and a power supply conductor for applying a high-frequency power to the discharge electrode, the system comprises an earth shield so disposed as to surround the power supply conductor inside the vacuum vessel, and a plurality of dielectric materials at least part of which is disposed between the power supply conductor and the earth shield. A process carried out using the deposited film forming system is also disclosed. The system and process can maintain large-area and uniform discharge for a long time and can form deposited films having a high quality and a superior uniformity, on a beltlike substrate that moves continuously.
    Type: Grant
    Filed: October 15, 1999
    Date of Patent: June 4, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hitomi Sano, Masahiro Kanai, Atsushi Koike, Hiroshi Sugai