Patents by Inventor Hitomitsu Kambara

Hitomitsu Kambara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for treating a substrate
    Patent number: 7268084
    Abstract: A method of treating a substrate includes disposing the substrate in a processing chamber having a first chamber portion configured to define a plasma space and a second chamber portion configured to define a process space, introducing a first gas to the plasma space and introducing a second gas to the process space. A plasma is formed in the plasma space from the first gas using a plasma source coupled to the upper chamber portion, and a process chemistry for treating the substrate is formed in the process space by providing a grid positioned between the first chamber portion and the second chamber portion such that the plasma can diffuse from the plasma space to the process space.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: September 11, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Lee Chen, Hitomitsu Kambara, Caiz Hong Tian, Tetsuya Nishizuka, Toshihisa Nozawa
  • Method for treating a substrate
    Publication number: 20060065629
    Abstract: A method of treating a substrate includes disposing the substrate in a processing chamber having a first chamber portion configured to define a plasma space and a second chamber portion configured to define a process space, introducing a first gas to the plasma space and introducing a second gas to the process space. A plasma is formed in the plasma space from the first gas using a plasma source coupled to the upper chamber portion, and a process chemistry for treating the substrate is formed in the process space by providing a grid positioned between the first chamber portion and the second chamber portion such that the plasma can diffuse from the plasma space to the process space.
    Type: Application
    Filed: September 30, 2004
    Publication date: March 30, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Lee Chen, Hitomitsu Kambara, Caiz Tian, Tetsuya Nishizuka, Toshihisa Nozawa