Patents by Inventor Hitoshi Fujii

Hitoshi Fujii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4292397
    Abstract: The invention provides a novel planographic printing plate suitable for dry planographic printing without supply of dampening water and a method for the preparation thereof. The inventive printing plate has, on one surface of a base plate, a layer of an organopolysiloxane composed of the areas where fresh surface of the organopolysiloxane is exposed bare as the ink-repellent non-image areas and the areas where the surface of the organopolysiloxane layer has been subjected to the treatment with low temperature plasma to be oleophilic or ink-receptive as the image areas of the printing plate. According to the inventive method, the pattern-wise exposure of the organopolysiloxane layer to the plasma atmosphere is performed by first providing a pattern-wise layer of a plasma resistant protective resist layer on the organopolysiloxane layer followed by the plasma treatment and removal of the resist layer.
    Type: Grant
    Filed: April 17, 1980
    Date of Patent: September 29, 1981
    Assignees: Dai Nippon Printing Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoshi Takeuchi, Masanori Akada, Hitoshi Fujii, Takashi Toida, Minoru Takamizawa, Yoshio Inoue
  • Patent number: 4174186
    Abstract: A floating type anti-oil anti-impact anti-wave barrier includes structure for intercepting oil floating on the water, for mitigating an impact force exerted by a ship or the like, and for intercepting waves. The barrier can collect oil which has flowed out onto the sea to prevent the oil from dispersing, and the barrier can be protected from damage caused by a ship, by drift, by waves, etc.
    Type: Grant
    Filed: November 17, 1977
    Date of Patent: November 13, 1979
    Assignee: Mitsubishi Jukogyo Kabushiki Kaisha
    Inventors: Hironao Kasai, Hitoshi Fujii, Naoji Toki
  • Patent number: 4145140
    Abstract: A method and apparatus for measuring surface roughness, waviness, cracks or any irregularities or flatnesses in a surface utilizing statistical properties of dichromatic speckle patterns. In practice surface roughness is normally measured utilizing standard profile measuring devices. However, these instruments are not efficient in practice in view of their slowness for effecting measurements. The present invention provides an improved method of measuring surface roughness including the following steps; generating a spatially coherent polychromatic light having at least two wavelengths and directing the light at an optically rough surface in order to illuminate the same; analyzing intensity variations in two speckle patterns formed at a plane due to two wavelengths of the polychromatic light; and defining and evaluating a difference between intensities of the two speckle patterns as a function of surface roughness of the optically rough surface.
    Type: Grant
    Filed: June 15, 1977
    Date of Patent: March 20, 1979
    Inventor: Hitoshi Fujii
  • Patent number: 4075167
    Abstract: Novel organosilicon compounds having in a molecule at least one maleimido group bonded to a silicon atom through a Si-C linkage, synthesized by reaction of a derivative of maleic anhydride with an organosilicon compound having an amino-substituted hydrocarbon group bonded to the silicon atom. The reaction proceeds in two steps, the first step being addition of the amino group to the maleic anhydride derivative to form an amide structure and the second step being dehydration of the amide structure to form a maleimido ring. The organosilicon compounds having remarkable photosensitivity can be polymerized and cured on exposure to ultraviolet light, and the cured films are insoluble in organic solvents.
    Type: Grant
    Filed: December 24, 1975
    Date of Patent: February 21, 1978
    Assignees: Dai Nippon Printing Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Minoru Takamizawa, Yasushi Yamamoto, Yoshio Inoue, Atsumi Noshiro, Hitoshi Fujii
  • Patent number: 4042613
    Abstract: Novel benzophenone derivatives represented by the general formula R.sub.m.sup.1 --C.sub.6 H.sub.5-m --CO--C.sub.6 H.sub.5-n --R.sub.n.sup.2 where R.sup.1 is a halogen atom, a monovalent C.sub.1-10 hydrocarbon, alkoxy, thioalkoxy, amino, or dialkylamino group, R.sup.2 is an unsubstituted or organosiloxy-substituted organosilyl group, and m and n are each integers from 1 to 5. The benzophenone derivatives are useful as photosensitizers for making photo-curable compositions by blending with photo polymerizable resins, especially photopolymerizable organosilicon resins. Such photo-curable organosilicon resin compositions are further useful for making dry-planographic printing plates comprising non-image areas formed from the polymerized and cured layers of the composition.
    Type: Grant
    Filed: April 21, 1975
    Date of Patent: August 16, 1977
    Assignees: Dai Nippon Printing Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Minoru Takamizawa, Yasushi Yamamoto, Yoshio Inoue, Atsumi Noshiro, Hitoshi Fujii
  • Patent number: 4019904
    Abstract: The planographic printing plate has ink-receptive and ink-repellent areas provided on its base, the ink-repellent areas being covered with a layer formed by polymerizing and curing a composition which comprise a photopolymerizable organopolysiloxane with maleimido groups. The photopolymerizable organopolysiloxane has easily synthesized. The ink-repellency of the cured organopolysiloxane is excellent. The planographic printing plates can be used without dampening water and have a superior press life.
    Type: Grant
    Filed: March 30, 1976
    Date of Patent: April 26, 1977
    Assignees: Dai Nippon Printing Company Limited, Shin-Etsu Chemical Company Limited
    Inventors: Atsumi Noshiro, Minoru Takamizawa, Yasushi Yamamoto, Yoshio Inoue, Hitoshi Fujii