Patents by Inventor Hitoshi Hagiwara

Hitoshi Hagiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11914297
    Abstract: A cover film for dry film resist, includes a polyethylene film including a first mixture of high pressure low density polyethylene (LDPE) and linear low density polyethylene (LLDPE). The first mixture has an LDPE to LLDPE ratio by mass of from 90:10 to 60:40. The polyethylene film is free of a plasticizer, anti-blocking agent, slipping agent, and anti-static agent. The number of fish eyes having a minimum diameter of 0.2 mm or greater present in 100 m2 of the 19 ?m thick cover film in plan view is at most two. The polyethylene film has a thickness of from 10 to 20 ?m and a haze value of from 12 to 25%.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: February 27, 2024
    Assignee: TAMAPOLY CO., LTD.
    Inventors: Shinichi Oya, Toshiaki Hagiwara, Hitoshi Nakamura
  • Patent number: 5496677
    Abstract: A presensitized plate for use in making a lithographic printing plate comprises a substrate; a photosensitive layer and a mat layer whose projections have an average diameter of not more than 100 .mu.m, an average height of not more than 10 .mu.m and whose coated amount ranges from 5 to 200 mg/m.sup.2, the photosensitive layer and the mat layer being applied onto the upper surface of the substrate; and a coating layer of an organic polymeric compound having a glass transition point of not less than 20.degree. C. and a thickness ranging from 0.01 to 8.0 .mu.m, the coating layer being applied onto the back face of the substrate. The presensitized plate makes it possible to solve the problem of the formation of scratches and the adhesion of the photosensitive layer to the back face of the PS plate even when a large number of PS plates are transported and/or stored while putting them in piles without sandwiching the PS plate between interleaves.
    Type: Grant
    Filed: December 15, 1994
    Date of Patent: March 5, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadao Toyama, Hitoshi Hagiwara, Nobuyuki Kita
  • Patent number: 4762771
    Abstract: The present invention provides a method of treating photosensitive printing plate, which comprises subjecting a photosensitive lithographic plate to exposure, development and burning-in treatment, characterized in that an aqueous solution containing phytic acid and aminobenzenesulfonic acid is applied to the lithographic plate after the development but prior to the burning-in treatment and then the burning-in treatment is conducted in the presence of these compounds.According to the invention, there can be prepared a lithographic plate free from background stain and having an excellent ink-receptive property in its image-forming area.
    Type: Grant
    Filed: July 30, 1986
    Date of Patent: August 9, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Matsumoto, Hitoshi Hagiwara
  • Patent number: 4606995
    Abstract: A developing solution for developing a light-sensitive lithographic plate having a o-quinonediazide compound-containing light-sensitive layer is disclosed. The developing solution is comprised of an aqueous solution containing alkali silicate and an alkali aqueous solution-soluble compound of a metal selected from the group consisting of Sn, Pb, Fe, Co and Ni. The developing solution provides excellent resolving power, has excellent development stability, processing capability and adaptability with respect to automatic developing machines.
    Type: Grant
    Filed: December 28, 1983
    Date of Patent: August 19, 1986
    Assignee: Fuji Photo Film Company, Limited
    Inventors: Nobuyuki Kita, Hiroshi Matsumoto, Hitoshi Hagiwara
  • Patent number: 4500625
    Abstract: A developer for a light-sensitive lithographic printing plate having an o-quinonediazide-containing light-sensitive layer is disclosed. The developer is comprised of an aqueous solution of an alkali silicate containing an organic boron compound. The organic boron compound is represented by the formula ##STR1## the substituents are defined within the specification. By utilizing the developer of the invention it is possible to provide excellent developing power, development stability, processability and preferred forming properties during development.
    Type: Grant
    Filed: November 4, 1983
    Date of Patent: February 19, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuyuki Kita, Hiroshi Matsumoto, Hitoshi Hagiwara