Patents by Inventor Hitoshi Hatada

Hitoshi Hatada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260063883
    Abstract: An objective lens (OL) is constituted by a first lens group (G1), a second lens group (G2) having a positive refractive power, a third lens group (G3) having a concave surface facing the image side, and a fourth lens group (G4) having a concave surface facing the object side. The first lens group satisfies conditional expressions 1.8<H1/H2<3.5 and 1.3<DLe/H2<3.5, where: H1 is the distance between the optical axis and the light ray most separated from the optical axis in the second lens group (G2), from among light rays emitted from an object (OB) on the optical axis; H2 is the distance between the optical axis and the light ray most separated from the optical axis at a lens surface on the image side of a final lens (Le); and DLe is the length of the final lens (Le) on the optical axis.
    Type: Application
    Filed: November 4, 2025
    Publication date: March 5, 2026
    Applicant: NIKON CORPORATION
    Inventors: Hidetsugu TAKAGI, Hitoshi HATADA
  • Patent number: 12498553
    Abstract: A microscope objective lens (OL) is constituted by a first lens group (G1), a second lens group (G2) having a positive refractive power, a third lens group (G3) having a concave surface facing the image side, and a fourth lens group (G4) having a concave surface facing the object side. The first lens group (G1) is constituted by a plano-convex positive lens (L101) having a flat surface facing the object side, and a negative lens (L102) and satisfies the following conditional: 1.8<H1/H2<3.5 and 1.3<DLe/H2<3.5, where: H1 is the distance between the optical axis and the light ray most separated from the optical axis in the second lens group (G2), from among light rays emitted from an object (OB) on the optical axis; H2 is the distance between the optical axis and the light ray most separated from the optical axis at a lens surface on the image side of a final lens (Le); and DLe is the length of the final lens (Le) on the optical axis.
    Type: Grant
    Filed: December 15, 2021
    Date of Patent: December 16, 2025
    Assignee: NIKON CORPORATION
    Inventors: Hidetsugu Takagi, Hitoshi Hatada
  • Publication number: 20240045192
    Abstract: This microscope objective lens (OL) is constituted by a first lens group (G1), a second lens group (G2) having a positive refractive power, a third lens group (G3) having a concave surface facing the image side, and a fourth lens group (G4) having a concave surface facing the object side. The first lens group (G1) is constituted by a plano-convex positive lens (L101) having a flat surface facing the object side, and a negative lens (L102). The first lens group satisfies the following conditional expressions. Conditional expressions 1.8<H1/H2<3.5 and 1.3<DLe/H2<3.
    Type: Application
    Filed: December 15, 2021
    Publication date: February 8, 2024
    Applicant: NIKON CORPORATION
    Inventors: Hidetsugu TAKAGI, Hitoshi HATADA
  • Patent number: 8427628
    Abstract: An exposure method for exposing a plate with an image of a pattern of a mask comprises: reciprocating the mask along X direction, synchronizing a movement of the mask and a movement of the plate to +X direction, projecting an image of a first pattern of the mask onto the plate as an erected image with respect to +X direction during a first period in which the mask that is reciprocating is moved in +X direction, and projecting an image of a second pattern of the mask onto the plate as an inverted image with respect to +X direction during a second period in which the mask that is reciprocating is moved in ?X direction.
    Type: Grant
    Filed: April 2, 2010
    Date of Patent: April 23, 2013
    Assignee: Nikon Corporation
    Inventor: Hitoshi Hatada
  • Patent number: 8130364
    Abstract: When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a?, which orthogonally projects point a on the plate, and a second line segment linking point B and point b?, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
    Type: Grant
    Filed: December 7, 2007
    Date of Patent: March 6, 2012
    Assignee: Nikon Corporation
    Inventors: Masato Kumazawa, Hitoshi Hatada
  • Publication number: 20100290019
    Abstract: An exposure method for exposing a plate with an image of a pattern of a mask comprises: reciprocating the mask along X direction, synchronizing a movement of the mask and a movement of the plate to +X direction, projecting an image of a first pattern of the mask onto the plate as an erected image with respect to +X direction during a first period in which the mask that is reciprocating is moved in +X direction, and projecting an image of a second pattern of the mask onto the plate as an inverted image with respect to +X direction during a second period in which the mask that is reciprocating is moved in ?X direction.
    Type: Application
    Filed: April 2, 2010
    Publication date: November 18, 2010
    Inventor: Hitoshi HATADA
  • Publication number: 20080165334
    Abstract: When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a?, which orthogonally projects point a on the plate, and a second line segment linking point B and point b?, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
    Type: Application
    Filed: December 7, 2007
    Publication date: July 10, 2008
    Applicant: NIKON CORPORATION
    Inventors: Masato Kumazawa, Hitoshi Hatada
  • Patent number: 6811953
    Abstract: The memory unit stores the correlation of the positional change in the image planes of the projection optical modules in the focusing direction and the light quantity change. The image plane position determination unit finds the positional change value of the image planes of the projection optical modules based on the correlation information that is stored in the memory unit and the information on changes in the amount of light that is emitted to the projection optical modules. The compensation value calculating unit calculates the compensation value corresponding to the change in the amount of curvature in the image planes of the projection optical modules. The compensating unit compensates the change value in conformity with the compensation value. The focus compensation optical system is driven based on the change value that is compensated.
    Type: Grant
    Filed: May 22, 2001
    Date of Patent: November 2, 2004
    Assignee: Nikon Corporation
    Inventors: Hitoshi Hatada, Masaki Kato, Motoo Koyama, Hiroshi Shirasu, Masahiro Iguchi
  • Publication number: 20020005940
    Abstract: The memory unit stores the correlation of the positional change in the image planes of the projection optical modules in the focusing direction and the light quantity change. The image plane position determination unit finds the positional change value of the image planes of the projection optical modules based on the correlation information that is stored in the memory unit and the information on changes in the amount of light that is emitted to the projection optical modules. The compensation value calculating unit calculates the compensation value corresponding to the change in the amount of curvature in the image planes of the projection optical modules. The compensating unit compensates the change value in conformity with the compensation value. The focus compensation optical system is driven based on the change value that is compensated.
    Type: Application
    Filed: May 22, 2001
    Publication date: January 17, 2002
    Applicant: NIKON CORPORATION
    Inventors: Hitoshi Hatada, Masaki Kato, Motoo Koyama, Hiroshi Shirasu, Masahiro Iguchi