Patents by Inventor Hitoshi Maruyama

Hitoshi Maruyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260161083
    Abstract: A multilayer-structure-type photosensitive dry film including: a support film; a photosensitive resin film layer (A) having a transmittance of 2% or less in at least part of wavelengths of 450 to 470 nm, a transmittance of 80% or more in at least part of wavelengths of 515 to 535 nm, and a transmittance of 80% or more in at least part of wavelengths of 620 to 640 nm, and having a film thickness of 1 to 10 ?m on the support film; and a photosensitive resin film layer (B) containing quantum dots and having a film thickness of 1 to 100 ?m on the layer (A). This can provide: a material making it possible to perform processes for a photoresist containing quantum dots and for a resist material that absorbs blue LED light at once and not separately; a patterning process using the material; and a display including the material.
    Type: Application
    Filed: April 17, 2025
    Publication date: June 11, 2026
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hitoshi Maruyama, Kumiko Kumazawa
  • Publication number: 20260161080
    Abstract: The present invention is a photosensitive resin composition containing: (A) an acrylic resin having a (meth)acryloyl group in a side chain; (B1) quantum dots; (B2) a thiol ligand coordinated to a surface of the component (B1), the thiol ligand having a polymer structure including at least one repeating unit selected from ethylene oxide and propylene oxide; (C) an oxime-based photo-radical generator; (D) a surfactant; and (E) a solvent. This can provide: a photosensitive resin composition capable of easily forming a film having high lithography resolution and favorable luminous properties; a photosensitive resin film and a photosensitive dry film obtained by using the photosensitive resin composition; patterning processes using these; and displays obtained by using the photosensitive resin composition.
    Type: Application
    Filed: April 17, 2025
    Publication date: June 11, 2026
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hitoshi MARUYAMA, Kumiko KUMAZAWA
  • Publication number: 20260140446
    Abstract: A photosensitive resin composition including: (A) a (meth)acryloyl group-containing resin; (B) a photo-radical generator; and (C) a quantum dot, wherein the quantum dot has a surface coating layer containing siloxane. This can provide: a photosensitive resin composition capable of easily forming a film having high lithography resolution and favorable luminous properties; a photosensitive resin film obtained by using the photosensitive resin composition; patterning processes using these; and a light emitting device obtained by using the photosensitive resin composition.
    Type: Application
    Filed: September 26, 2023
    Publication date: May 21, 2026
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hitoshi MARUYAMA, Shinji AOKI, Yoshihiro NOJIMA, Kazuya TOBISHIMA
  • Publication number: 20260125594
    Abstract: A quantum dot-containing composition including quantum dots dispersed in a resin composition, the quantum dots emitting fluorescence by excitation light. The quantum dots include a ligand coordinated to the surface thereof and a surface coating layer bonded to the ligand and containing a siloxane bond, and the surface coating layer contains at least one of substituents of a polymer contained in the resin composition, substituents polymerizable with a polymer contained in the resin composition, and compounds having the same skeleton structure as the polymer. This provides a quantum dot-containing composition that has an enhanced stability and improved compatibility with highly polar solvents and photosensitive resin compositions while maintaining the properties of quantum dots, as well as a method for producing such a quantum dot-containing composition.
    Type: Application
    Filed: September 26, 2023
    Publication date: May 7, 2026
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shinji AOKI, Hitoshi MARUYAMA, Yoshihiro NOJIMA, Kazuya TOBISHIMA
  • Publication number: 20250328074
    Abstract: The present invention is a photosensitive resin composition for absorbing blue LED light that has been transmitted through a cured photoresist film containing quantum dots capable of emitting red or green fluorescence, the composition containing: (A) an acrylic resin having a (meth)acryloyl group in a side chain; (B) a dye having a maximum absorption wavelength at any wavelength of 490 to 430 nm; (C) an oxime-based photo-radical generator; (D) a surfactant; and (E) a solvent. This can provide: a photosensitive resin composition capable of easily forming a film having high lithography resolution and favorable blue light absorption property; a photosensitive resin film and a photosensitive dry film obtained by using the photosensitive resin composition; patterning processes using these; and displays obtained by using the photosensitive resin composition.
    Type: Application
    Filed: April 17, 2025
    Publication date: October 23, 2025
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hitoshi MARUYAMA, Kumiko Kumazawa
  • Patent number: 12448485
    Abstract: Provided is a photosensitive resin composition that includes: a silicone resin (A) having an epoxy group and/or a phenolic hydroxyl group; an alkyl phenol novolac resin (B) indicated by formula (B); and a photoacid generator (C). (In the formula, R51 is a C1-9 saturated hydrocarbyl group. R52 is a C10-25 saturated hydrocarbyl group. n1 and n2 are numbers that fulfil 0?n1<1, 0<n2?1, and n1+n2=1. m1 represents an integer from 0 to 3 and m2 represents an integer from 1 to 3.
    Type: Grant
    Filed: January 13, 2021
    Date of Patent: October 21, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hitoshi Maruyama
  • Publication number: 20250313664
    Abstract: A siloxane-modified polyester resin having a carboxyl group and a (meth)acryloyl group in a side chain thereof. The siloxane-modified polyester resin is capable of imparting sufficient flexibility to a cured product thereof in addition to heat resistance. The siloxane-modified polyester resin having the carboxyl group and the (meth)acryloyl group in a side chain thereof can provide a cured product having high heat resistance and flexibility.
    Type: Application
    Filed: March 27, 2025
    Publication date: October 9, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Hitoshi Maruyama
  • Publication number: 20250298315
    Abstract: The photosensitive resin composition includes (A) a polymer having a silphenylene skeleton, a polysiloxane skeleton, and a fluorene skeleton in a main chain, and containing a polyhydric alcohol structure in a side chain, (B) a crosslinker of specific structure, and (C) a photoacid generator. The photosensitive resin composition gives a resin coating or resin layer that can be simply processed in thick film form to define a fine size perpendicular pattern.
    Type: Application
    Filed: March 19, 2025
    Publication date: September 25, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Yugo Kawaguchi
  • Patent number: 12420668
    Abstract: A power supply control system includes: a vehicle control device including a reception unit, an electrical connector, and a communication connector; connection determination units; and supply control units. The supply control units determine that the battery is the first battery and permits the power supply to the reception unit in a case where it is determined that the communication connector is connected and there is no power supply to the reception unit, determine that the battery is unknown and prohibits the power supply to the reception unit in a case where it is determined that the communication connector is not connected and there is no power supply to the reception unit, and determine that the battery is the second battery in a case where it is determined that the communication connector is not connected and there is power supply to the reception unit.
    Type: Grant
    Filed: March 23, 2022
    Date of Patent: September 23, 2025
    Assignee: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Takuya Sato, Hitoshi Maruyama
  • Publication number: 20250251665
    Abstract: The present invention is a photosensitive resin composition including a silicone skeleton-containing polymer (A), an anthraquinone-based dye (B), and a photoacid generator (C). The inventive photosensitive resin composition can provide: a photosensitive resin composition which can provide a photosensitive resin film that has a shielding function, has dispersion stability in varnish, can reduce aggregates in a film, and can form a fine pattern; a photosensitive resin film; a photosensitive dry film; and a pattern forming process by using the compositions.
    Type: Application
    Filed: January 23, 2025
    Publication date: August 7, 2025
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Kumiko KUMAZAWA, Hitoshi Maruyama
  • Publication number: 20250237952
    Abstract: Provided is a photosensitive resin composition that contains: (A) a silicone resin containing an acid-crosslinkable group; (B) an epoxy compound represented by formula (B); and (C) a photoacid generator. (In the formula, R51-R55 each independently represent a hydrogen atom or a saturated hydrocarbyl group having 1-6 carbon atoms.
    Type: Application
    Filed: October 14, 2022
    Publication date: July 24, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Hitoshi Maruyama
  • Publication number: 20250155812
    Abstract: The present invention is a photosensitive resin composition including, (A) an acid-crosslinkable group-containing silicone resin, (B) an oxazoline compound or a derivative thereof, and (C) a photo-acid generator. This provides: a photosensitive resin composition that can easily form a thick and fine pattern without causing discoloration of copper and can form a resin film that is excellent in copper migration resistance, adhesiveness to a base material, and reliability; a photosensitive resin film; a photosensitive dry film; and a pattern-forming process by using these.
    Type: Application
    Filed: November 4, 2024
    Publication date: May 15, 2025
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hitoshi MARUYAMA
  • Publication number: 20250115719
    Abstract: The fluorene skeleton-containing polymer can form a film more excellent in heat resistance than that obtained from a conventional fluorene skeleton-containing polymer containing a siloxane structure. The polymer has a silphenylene skeleton, a polysiloxane skeleton, and a fluorene skeleton in a main chain, and contains a polyhydric alcohol structure in a side chain.
    Type: Application
    Filed: September 27, 2024
    Publication date: April 10, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yugo Kawaguchi, Hitoshi Maruyama, Hiroto Omori
  • Publication number: 20250102915
    Abstract: The photosensitive resin composition can be used to form a fine size pattern. The photosensitive resin composition includes: (A) a silicone resin that has a silphenylene structure, a polysiloxane structure, and a fluorene structure at a main chain and has an acryloyl group or a methacryloyl group at a side chain; and (B) a photoradical generator.
    Type: Application
    Filed: September 13, 2024
    Publication date: March 27, 2025
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Hiroto Omori
  • Patent number: 12216405
    Abstract: A photosensitive resin composition containing (A) an acid-crosslinkable group-containing silicone resin, (B) a photo-acid generator, and (C) quantum dot particles. Thus, a photosensitive resin composition is capable of easily forming a film having favorable heat resistance, lithography resolution, and luminous properties; a photosensitive resin film and a photosensitive dry film are obtained by using the photosensitive resin composition; patterning processes use these; and a light emitting device is obtained by using the photosensitive resin composition.
    Type: Grant
    Filed: November 12, 2020
    Date of Patent: February 4, 2025
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hitoshi Maruyama, Tamotsu Oowada
  • Publication number: 20240409694
    Abstract: There is a polymer which not only has high transparency and light resistance, but can also be manufactured as a protective film-bearing dry film. Provided is a polymer wherein the main chain contains a silphenylene backbone, an epoxy group-containing isocyanuric acid backbone, and a norbornene backbone, and does not contain a siloxane backbone.
    Type: Application
    Filed: October 14, 2022
    Publication date: December 12, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Hiroto Omori
  • Publication number: 20240345481
    Abstract: Provided is a polymer that includes a silphenylene skeleton, an isocyanuric acid skeleton, and a hydroxy-group-substituted alkyl ether skeleton in the main chain, and that includes an epoxy group in a side chain.
    Type: Application
    Filed: June 9, 2022
    Publication date: October 17, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroto Omori, Hitoshi Maruyama
  • Publication number: 20240288772
    Abstract: Provided is a photosensitive resin composition comprising: (A) a silicone resin having an epoxy group and/or a phenolic hydroxyl group; (B) a photoacid generator represented by formula (B); and (C) a benzotriazole compound.
    Type: Application
    Filed: March 31, 2022
    Publication date: August 29, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Kumiko Hayashi
  • Publication number: 20240270117
    Abstract: A power supply control system includes: a vehicle control device including a reception unit, an electrical connector, and a communication connector; connection determination units; and supply control units. The supply control units determine that the battery is the first battery and permits the power supply to the reception unit in a case where it is determined that the communication connector is connected and there is no power supply to the reception unit, determine that the battery is unknown and prohibits the power supply to the reception unit in a case where it is determined that the communication connector is not connected and there is no power supply to the reception unit, and determine that the battery is the second battery in a case where it is determined that the communication connector is not connected and there is power supply to the reception unit.
    Type: Application
    Filed: March 23, 2022
    Publication date: August 15, 2024
    Applicant: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Takuya SATO, Hitoshi MARUYAMA
  • Publication number: 20240210831
    Abstract: Provided is a photosensitive resin composition containing: (A) a silicone resin containing an acid-crosslinkable group; (B) an alicyclic epoxy compound represented by formula (B1) or (B2); med (C) a photo-acid-generating agent. (In the formula, R11 through R46 are each independently a hydrogen atom or a C1-8 saturated hydrocarbyl group.
    Type: Application
    Filed: March 4, 2022
    Publication date: June 27, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Kumiko Hayashi