Patents by Inventor Hitoshi Nagano
Hitoshi Nagano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230080501Abstract: Laser processing device (100) includes laser oscillator (10) that generates laser light beam (LB), optical fiber (30) that transmits laser light beam (LB), laser head (40) that emits laser light beam (LB) to workpiece (W), and chiller (50) that passes and circulates cooling water through laser oscillator (10) to cool laser oscillator (10). Laser oscillator (10) includes: a plurality of laser diodes; and a base having a cooling water channel therein and having the laser diodes mounted on a surface thereof. Laser processing device (100) is configured to change the incident angle of laser light beam (LB) entering optical fiber (30) by changing the water pressure of the cooling water flowing through the cooling water channel.Type: ApplicationFiled: November 1, 2022Publication date: March 16, 2023Inventors: TOMOYUKI KAGEYAMA, HITOSHI NAGANO, SHINICHI ARITA
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Patent number: 11477877Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.Type: GrantFiled: October 28, 2019Date of Patent: October 18, 2022Assignee: Gigaphoton Inc.Inventors: Hitoshi Nagano, Yasunori Wada, Tatsuya Yanagida, Osamu Wakabayashi
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Patent number: 10764986Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: GrantFiled: November 9, 2016Date of Patent: September 1, 2020Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Publication number: 20200068695Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.Type: ApplicationFiled: October 28, 2019Publication date: February 27, 2020Applicant: Gigaphoton Inc.Inventors: Hitoshi NAGANO, Yasunori WADA, Tatsuya YANAGIDA, Osamu WAKABAYASHI
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Patent number: 10512148Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.Type: GrantFiled: March 1, 2017Date of Patent: December 17, 2019Assignee: Gigaphoton Inc.Inventors: Hitoshi Nagano, Yasunori Wada, Tatsuya Yanagida, Osamu Wakabayashi
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Patent number: 10314152Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: GrantFiled: November 9, 2016Date of Patent: June 4, 2019Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Publication number: 20170196072Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.Type: ApplicationFiled: March 1, 2017Publication date: July 6, 2017Applicant: GIGAPHOTON INC.Inventors: Hitoshi NAGANO, Yasunori WADA, Tatsuya YANAGIDA, Osamu WAKABAYASHI
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Publication number: 20170064800Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: ApplicationFiled: November 9, 2016Publication date: March 2, 2017Applicant: GIGAPHOTON INC.Inventors: Shinji NAGAI, Tamotsu ABE, Hitoshi NAGANO, Osamu WAKABAYASHI
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Publication number: 20170055336Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: ApplicationFiled: November 9, 2016Publication date: February 23, 2017Applicant: GIGAPHOTON INC.Inventors: Shinji NAGAI, Tamotsu ABE, Hitoshi NAGANO, Osamu WAKABAYASHI
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Patent number: 9510433Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: GrantFiled: September 9, 2014Date of Patent: November 29, 2016Assignee: GIGAPHOTON INC.Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Publication number: 20150008345Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: ApplicationFiled: September 9, 2014Publication date: January 8, 2015Inventors: Shinji NAGAI, Tamotsu ABE, Hitoshi NAGANO, Osamu WAKABAYASHI
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Patent number: 8872142Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: GrantFiled: May 17, 2012Date of Patent: October 28, 2014Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Publication number: 20140203194Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.Type: ApplicationFiled: September 5, 2012Publication date: July 24, 2014Applicant: GIGAPHOTON INC.Inventors: Hitoshi Nagano, Yasunori Wada, Tatsuya Yanagida, Osamu Wakabayashi
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Patent number: 8624208Abstract: An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical elemeType: GrantFiled: March 15, 2011Date of Patent: January 7, 2014Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Patent number: 8604451Abstract: A target supply apparatus controls a gas pressure inside a tank storing a liquid target material to be outputted from a nozzle by a pressure of gas supplied from a gas supply having a pressure regulator. The target supply apparatus comprises a gas passage introducing gas supplied from the gas supply into the tank, and a high-precision pressure regulator arranged on the gas passage and regulating a pressure of gas flowing the gas passage. The high-precision pressure regulator is able to regulate pressure with accuracy higher than the pressure regulator.Type: GrantFiled: December 18, 2009Date of Patent: December 10, 2013Assignee: Gigaphoton Inc.Inventors: Takayuki Yabu, Masaki Nakano, Hitoshi Nagano, Takanobu Ishihara
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Publication number: 20120223257Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: ApplicationFiled: May 17, 2012Publication date: September 6, 2012Inventors: Shinji NAGAI, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Publication number: 20110226745Abstract: An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical elemeType: ApplicationFiled: March 15, 2011Publication date: September 22, 2011Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Publication number: 20100213272Abstract: A target supply apparatus controls a gas pressure inside a tank storing a liquid target material to be outputted from a nozzle by a pressure of gas supplied from a gas supply having a pressure regulator. The target supply apparatus comprises a gas passage introducing gas supplied from the gas supply into the tank, and a high-precision pressure regulator arranged on the gas passage and regulating a pressure of gas flowing the gas passage. The high-precision pressure regulator is able to regulate pressure with accuracy higher than the pressure regulator.Type: ApplicationFiled: December 18, 2009Publication date: August 26, 2010Inventors: Takayuki YABU, Masaki Nakano, Hitoshi Nagano, Takanobu Ishihara