Patents by Inventor Hitoshi NAMAI
Hitoshi NAMAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230230886Abstract: To provide a technique capable of quantitatively grasping a change in three-dimensional shape including a cross-sectional shape of a pattern within a surface of a wafer or between wafers in a non-destructive manner before cross-sectional observation.Type: ApplicationFiled: December 14, 2022Publication date: July 20, 2023Applicant: Hitachi High-Tech CorporationInventors: Kenji YASUI, Mayuka OSAKI, Hitoshi NAMAI, Yuki OJIMA, Wataru NAGATOMO, Masami IKOTA, Maki KIMURA
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Patent number: 10724856Abstract: To provide an image analysis apparatus capable of easily extracting an edge of an upper layer pattern formed intersecting with a lower layer pattern so as not to be affected by the lower layer pattern, the image analysis apparatus includes a calculation unit that calculates an analysis range including a region where the lower layer pattern intersects with the upper layer pattern and a region where the lower pattern is not formed, a calculation unit that averages a plurality of signal profiles, a calculation unit that calculates a maximum value and a minimum value of a signal intensity, a calculation unit that calculates a threshold level difference using the maximum value and the minimum value, and a calculation unit that calculates the edge of the upper layer pattern on the signal profile.Type: GrantFiled: September 1, 2016Date of Patent: July 28, 2020Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Atsuko Yamaguchi, Kazuhisa Hasumi, Hitoshi Namai
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Publication number: 20190204247Abstract: To provide an image analysis apparatus capable of easily extracting an edge of an upper layer pattern formed intersecting with a lower layer pattern so as not to be affected by the lower layer pattern, the image analysis apparatus includes a calculation unit that calculates an analysis range including a region where the lower layer pattern intersects with the upper layer pattern and a region where the lower pattern is not formed, a calculation unit that averages a plurality of signal profiles, a calculation unit that calculates a maximum value and a minimum value of a signal intensity, a calculation unit that calculates a threshold level difference using the maximum value and the minimum value, and a calculation unit that calculates the edge of the upper layer pattern on the signal profile.Type: ApplicationFiled: September 1, 2016Publication date: July 4, 2019Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Atsuko YAMAGUCHI, Kazuhisa HASUMI, Hitoshi NAMAI
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Patent number: 10186399Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.Type: GrantFiled: February 28, 2017Date of Patent: January 22, 2019Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Mayuka Osaki, Chie Shishido, Maki Tanaka, Hitoshi Namai, Fumihiro Sasajima, Makoto Suzuki, Yoshinori Momonoi
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Patent number: 10096451Abstract: The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs measurement on the basis of edge identification or pattern or edge judgment; and a computer program. The pattern measurement device classifies pattern sites (G1, G2, G3, G4), which are repeatedly arrayed at a specific interval, in accordance with the position of the pattern sites, and executes a pattern edge type identification, a pattern type identification, or a measurement of the dimensions between predetermined pattern sites on the basis of an association between the classified pattern sites and information pertaining to the pattern edge type or information pertaining to the pattern type. The computer program causes a computer to execute the abovementioned process.Type: GrantFiled: December 1, 2014Date of Patent: October 9, 2018Assignee: Hitachi High-Technologies CorporationInventors: Hitoshi Namai, Tomoaki Yamazaki
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Publication number: 20170301513Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.Type: ApplicationFiled: February 28, 2017Publication date: October 19, 2017Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Mayuka OSAKI, Chie SHISHIDO, Maki TANAKA, Hitoshi NAMAI, Fumihiro SASAJIMA, Makoto SUZUKI, Yoshinori MOMONOI
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Publication number: 20160307730Abstract: The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs measurement on the basis of edge identification or pattern or edge judgment; and a computer program. The pattern measurement device classifies pattern sites (G1, G2, G3, G4), which are repeatedly arrayed at a specific interval, in accordance with the position of the pattern sites, and executes a pattern edge type identification, a pattern type identification, or a measurement of the dimensions between predetermined pattern sites on the basis of an association between the classified pattern sites and information pertaining to the pattern edge type or information pertaining to the pattern type. The computer program causes a computer to execute the abovementioned process.Type: ApplicationFiled: December 1, 2014Publication date: October 20, 2016Inventors: Hitoshi NAMAI, Tomoaki YAMAZAKI
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Patent number: 9329034Abstract: An object of the invention is to provide: a sample unevenness device that stably identifies unevenness formed on a sample, regardless of a pattern formation state or image acquisition conditions; and a computer program. As an aspect to achieve the above object, a device and computer program are proposed that obtain the area of a plurality of regions formed by a profile waveform of a given threshold or lower for a profile formed based on a detection signal obtained by scanning with a charged particle beam with respect to the sample; and determine either or both of that a site corresponding to a region with a relatively large area is a concave portion or that a space portion and a site corresponding to a space with a relatively small area is a convex portion or a line portion.Type: GrantFiled: October 14, 2011Date of Patent: May 3, 2016Assignee: Hitachi High-Technologies CorporationInventors: Hitoshi Namai, Satoru Yamaguchi, Fumihiro Sasajima
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Patent number: 8953855Abstract: An object of the present invention is to provide an edge detection technique and equipment which are capable of stably detecting an edge by suppressing the influence of noise even in the case where the image is obtained by charged particle radiation equipment, such as a scanning electron microscope and has a low S/N ratio. More specifically, the present invention is to propose a technique and equipment which are configured to determine a peak position (edge) on the basis of the following two edge extraction techniques. That is, the present invention is to propose a technique and equipment wherein at least two peaks are formed by using, as edge detection techniques, for example, one peak detection technique having a relatively high sensitivity and the other peak detection technique which is relatively less susceptible to the influence of noise than the one peak detection technique, and wherein a position where the peaks coincide with each other is determined as a true peak position (edge position).Type: GrantFiled: February 26, 2009Date of Patent: February 10, 2015Assignee: Hitachi High-Technologies CorporationInventors: Hitoshi Namai, Osamu Komuro, Satoru Yamaguchi, Fumihiro Sasajima
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Publication number: 20130270436Abstract: An object of the invention is to provide: a sample unevenness device that stably identifies unevenness formed on a sample, regardless of a pattern formation state or image acquisition conditions; and a computer program. As an aspect to achieve the above object, a device and computer program are proposed that obtain the area of a plurality of regions formed by a profile waveform of a given threshold or lower for a profile formed based on a detection signal obtained by scanning with a charged particle beam with respect to the sample; and determine either or both of that a site corresponding to a region with a relatively large area is a concave portion or that a space portion and a site corresponding to a space with a relatively small area is a convex portion or a line portion.Type: ApplicationFiled: October 14, 2011Publication date: October 17, 2013Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hitoshi Namai, Satoru Yamaguchi, Fumihiro Sasajima
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Publication number: 20090226096Abstract: An object of the present invention is to provide an edge detection technique and equipment which are capable of stably detecting an edge by suppressing the influence of noise even in the case where the image is obtained by charged particle radiation equipment, such as a scanning electron microscope and has a low S/N ratio. More specifically, the present invention is to propose a technique and equipment which are configured to determine a peak position (edge) on the basis of the following two edge extraction techniques. That is, the present invention is to propose a technique and equipment wherein at least two peaks are formed by using, as edge detection techniques, for example, one peak detection technique having a relatively high sensitivity and the other peak detection technique which is relatively less susceptible to the influence of noise than the one peak detection technique, and wherein a position where the peaks coincide with each other is determined as a true peak position (edge position).Type: ApplicationFiled: February 26, 2009Publication date: September 10, 2009Inventors: Hitoshi NAMAI, Osamu Komuro, Satoru Yamaguchi, Fumihiro Sasajima
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Publication number: 20070103463Abstract: To realize high speed simulation a simulation apparatus is provided with a graphics board including a depth buffer that stores a depth value of each polygon represented by three dimensional polygon data. In the graphics board, the depth value of each polygon is calculated on the basis of a camera parameter and the three dimensional polygon data, and the depth value within the depth buffer is sequentially updated with the calculated depth value. According to the depth value, sensor data is generated and outputted.Type: ApplicationFiled: August 30, 2006Publication date: May 10, 2007Inventors: Fumiko Beniyama, Toshio Moriya, Hitoshi Namai