Patents by Inventor Hitoshi Namikawa

Hitoshi Namikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10578915
    Abstract: A liquid crystal display device has a liquid crystal panel including a liquid crystal cell and a polarizing plate; and a backlight unit including a light source. An outermost surface of the liquid crystal panel on the backlight unit side is a surface of a protective film included in the polarizing plate, an outermost surface of the backlight unit on the liquid crystal panel side is a surface of a diffusion member, and where an arithmetic mean roughness measured on an outermost surface of the liquid crystal panel on the backlight unit side is Ra1, a pencil hardness is P1, an arithmetic mean roughness measured on an outermost surface of the backlight unit on the liquid crystal panel side is Ra2, and a pencil hardness is P2, Expression 1: 33 nm<Ra1<135 nm, Expression 2: Ra2<15 nm, and Expression 3: P1<P2 are satisfied.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: March 3, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Ryuji Saneto, Yuuichi Fukushige, Masato Nagura, Hitoshi Namikawa, Takashi Tamada
  • Publication number: 20180246376
    Abstract: A liquid crystal display device has a liquid crystal panel including a liquid crystal cell and a polarizing plate; and a backlight unit including a light source. An outermost surface of the liquid crystal panel on the backlight unit side is a surface of a protective film included in the polarizing plate, an outermost surface of the backlight unit on the liquid crystal panel side is a surface of a diffusion member, and where an arithmetic mean roughness measured on an outermost surface of the liquid crystal panel on the backlight unit side is Ra1, a pencil hardness is P1, an arithmetic mean roughness measured on an outermost surface of the backlight unit on the liquid crystal panel side is Ra2, and a pencil hardness is P2, Expression 1: 33 nm<Ra1<135 nm, Expression 2: Ra2<15 nm, and Expression 3: P1<P2 are satisfied.
    Type: Application
    Filed: April 20, 2018
    Publication date: August 30, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Ryuji SANETO, Yuuichi FUKUSHIGE, Masato NAGURA, Hitoshi NAMIKAWA, Takashi TAMADA
  • Patent number: 9760219
    Abstract: A black resin film is produced by applying a photosensitive resin composition containing a black pigment, an alkali-soluble polymer compound, an ethylenic unsaturated bond-containing compound and ?-aminoalkylphenone or ?-hydroxyalkylphenone as a photopolymerization initiator, to a substrate; and subjecting the composition to exposure, development and post-exposure. The post-exposure is performed from both side with 1,300 mJ/cm2 or more in terms of i line.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: September 12, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Shinichi Yoshinari, Hitoshi Namikawa
  • Publication number: 20160039188
    Abstract: The transfer material includes a temporary support, a release layer, a transfer layer, and a protective film in this order. When the protective film is peeled off from the transfer material, the protective film is peeled off from the transfer layer, and the transfer layer remains on the release layer side. In addition, when the temporary support is peeled off after the transfer layer is transferred to a transfer target substrate which is formed of glass or a film selected from TAC, PET, PC, or COP, the release layer is present on the peeled temporary support side.
    Type: Application
    Filed: October 21, 2015
    Publication date: February 11, 2016
    Applicant: FUJIFILM CORPORATION
    Inventor: Hitoshi NAMIKAWA
  • Publication number: 20150015813
    Abstract: A black resin film is produced by applying a photosensitive resin composition containing a black pigment, an alkali-soluble polymer compound, an ethylenic unsaturated bond-containing compound and ?-aminoalkylphenone or ?-hydroxyalkylphenone as a photopolymerization initiator, to a substrate; and subjecting the composition to exposure, development and post-exposure. The post-exposure is performed from both side with 1,300 mJ/cm2 or more in terms of i line.
    Type: Application
    Filed: September 29, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Shinichi YOSHINARI, Hitoshi NAMIKAWA
  • Patent number: 7208592
    Abstract: A process for alkali saponification of polymer film is disclosed. The process comprises the steps of applying solution of an alkali onto a polymer film having a temperature of not lower than room temperature, and washing away the alkaline solution from the film.
    Type: Grant
    Filed: February 20, 2003
    Date of Patent: April 24, 2007
    Assignee: FujiFilm Corporation
    Inventors: Naoyuki Kawanishi, Kazuhiko Fujiwara, Hitoshi Namikawa, Takahiro Moto, Yutaka Tamura
  • Publication number: 20030194668
    Abstract: A process for alkali saponification of polymer film is disclosed. The process comprises the steps of applying solution of an alkali onto a polymer film having a temperature of not lower than room temperature, and washing away the alkaline solution from the film.
    Type: Application
    Filed: February 20, 2003
    Publication date: October 16, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Naoyuki Kawanishi, Kazuhiko Fujiwara, Hitoshi Namikawa, Takahiro Moto, Yutaka Tamura