Abstract: Provided are a photon up-conversion film, which is capable, of high-efficiency up-conversion even in air and even when low-intensity light is used, and a simple method of producing the film. The photon up-conversion film according to one embodiment of the present invention includes: a matrix including a resin; and a pore portion, wherein the photon up-conversion film includes at least a sensitizing component capable of absorbing light in a first wavelength region ?1, and a light-emitting component capable of radiating light in a second wavelength region ?2 including wavelengths shorter than those of the first wavelength region ?1, and wherein the sensitizing component and the light-emitting component are present at an interface between the matrix and the pore portion.

Abstract: Provided are a photon up-conversion film, which is capable of high-efficiency up-conversion even in air and even when low-intensity light is used, and a simple method of producing the film. The photon up-conversion film according to one embodiment of the present invention includes: a matrix including a resin; and a pore portion, wherein the photon up-conversion film includes at least a sensitizing component capable of absorbing light in a first wavelength region ?1, and a light-emitting component capable of radiating light in a second wavelength region ?2 including wavelengths shorter than those of the first wavelength region ?1, and wherein the sensitizing component and the light-emitting component are present at an interface between the matrix and the pore portion.

Abstract: Provided are a novel solid-based upconversion film having high emission efficiency and a method for producing the upconversion film. An upconversion film according to the present invention is a stretched film formed of a composition at least including an acceptor, a donor, and a matrix resin, wherein the matrix resin is a poly(vinyl alcohol)-based resin, and the matrix resin is oriented by stretching. A method for producing an upconversion film according to the present invention is a method for producing a photon upconversion film including a step of stretching a composition at least including an acceptor, a donor, and a matrix resin, wherein the matrix resin is a poly(vinyl alcohol)-based resin, and the stretching is wet-stretching in an aqueous solution of boric acid.

Abstract: Provided are a novel solid-based upconversion film having high emission efficiency and a method for producing the upconversion film. An upconversion film according to the present invention is a stretched film formed of a composition at least including an acceptor, a donor, and a matrix resin, wherein the matrix resin is a poly(vinyl alcohol)-based resin, and the matrix resin is oriented by stretching. A method for producing an upconversion film according to the present invention is a method for producing a photon upconversion film including a step of stretching a composition at least including an acceptor, a donor, and a matrix resin, wherein the matrix resin is a poly(vinyl alcohol)-based resin, and the stretching is wet-stretching in an aqueous solution of boric acid.

Abstract: In an element wherein a plurality of ridges (16, 36) are arranged in parallel, supports (17, 37) are formed to sandwich each of the ridges (16, 36). More specifically, on an outer side of the ridge (16) in the element, the first support (17a) is formed, and on an inner side in the element, the second support (17b) is formed. On an outer side of the ridge (36) in the element, the first support (37a) is formed, and on an inner side in the element, the second support (37b) is formed. Thus, even when a resist is applied on an element surface and spin-coating is performed at the time of manufacturing the element, the resist on the inner side than the ridges (16, 36) in the element can be prevented from flowing into a groove between the ridges to a certain extent by means of the second supports (17b, 37b), and a resist film thickness on the inner sides of the ridges (16, 36) in the element can be prevented from being considerably small compared with that on the outer sides in the element.

Abstract: In an element wherein a plurality of ridges (16, 36) are arranged in parallel, supports (17, 37) are formed to sandwich each of the ridges (16, 36). More specifically, on an outer side of the ridge (16) in the element, the first support (17a) is formed, and on an inner side in the element, the second support (17b) is formed. On an outer side of the ridge (36) in the element, the first support (37a) is formed, and on an inner side in the element, the second support (37b) is formed. Thus, even when a resist is applied on an element surface and spin-coating is performed at the time of manufacturing the element, the resist on the inner side than the ridges (16, 36) in the element can be prevented from flowing into a groove between the ridges to a certain extent by means of the second supports (17b, 37b), and a resist film thickness on the inner sides of the ridges (16, 36) in the element can be prevented from being considerably small compared with that on the outer sides in the element.