Abstract: [Problem] To provide a rotor unit that may effectively prevent detachment of a magnet with a holder while absorbing dimensional errors of a rotor main body and the magnet. [Solution] In the rotor unit according to the present invention, the holder mountable on the rotor main body prevents the magnet from being detached from the rotor main body. The holder includes an elastically deformable insertion arm extending from a flat-plate like holder main body, a hook portion provided on a free end side of the insertion arm, an elastically deformable magnet pressing arm extending from the holder main body, and a magnet pressing portion provided on a free end side of the magnet pressing arm. The rotor main body includes a hook hole into which the insertion arm is inserted, and the hook hole is provided with a locking portion in which the hook portion is lockable.

Abstract: A compressor includes a casing having an upper half casing and a lower half casing and a tubular shape with both ends open, a bundle including annular heads respectively fixed on both sides in an axial direction with respect to a plurality of diaphragms and closing openings of the casing, a communication clearance seal portion sealing a communication clearance extending in the axial direction between the outer peripheral surface of the diaphragm and the inner peripheral surface of the casing such that a suction opening and a discharge opening communicate with each other, and a regulating portion regulating the position of the head in the axial direction with respect to the casing.

Abstract: An impeller is formed of two parts, i.e., an inner peripheral side part and an outer peripheral side part. The inner peripheral side part is molded in a cylindrical shape. The outer peripheral side part is formed by integrally molding an annular disc externally fitted to an outer peripheral surface of the inner peripheral side part, a plurality of blades provided at an interval in a circumferential direction on a surface that faces the other side in the axis line direction of the annular disc and forming a flow path extending in a radial direction, and a cover covering the plurality of blades from the other side in the axis line direction and having an insertion hole to which the inner peripheral side part is inserted in the axis line direction at an interval in a radial direction.

Abstract: A compressor is provided with a substantially tubular compressor casing, a substantially circular lid that is provided inside an inner periphery of the compressor casing so as to close off an end surface of the compressor casing, a space that is enclosed by the lid and an inner circumferential surface of the compressor casing so as to accommodate a blade, and seal member that is provided in a circumferential direction on the space side of an outer circumferential surface of the lid, wherein a slit part is provided on the lid, radially inside the outer circumferential surface, where the seal member is provided, so as to extend in the axial direction from the space side of the lid.

Abstract: A semiconductor device includes a semiconductor substrate having a first surface and a second surface opposite to the first surface, a first region of a first conductivity type provided along the first surface selectively on a second region of a second conductivity type formed along the first surface, and a third region of a first conductivity type between the second region and the second surface. The semiconductor device also includes a gate electrode adjacent to the second region. First, second, and third electrode pads are formed along the second surface. The first pad is electrically connected by a first via through the substrate to first region. The third electrode pad is electrically connected by a second via through the substrate to the gate electrode.

Abstract: A rotary machine includes: a shaft that rotates; a disc that has a substantially cylindrical hub fitted into the shaft and is provided so as to widen outward in a radial direction from a front end to a rear end of the substantially cylindrical hub; and an impeller having a plurality of blades provided on a surface of the disc. The substantially cylindrical hub has a tight fit section having an internal radius that is smaller than a radius of the shaft, and a loose fit section having an internal radius that is greater than the internal radius of the tight fit section. The loose fit section is provided on a front end side of the substantially cylindrical hub with respect to the tight fit section.

Abstract: A fixture used in a rotary machine which includes a rotary unit which has a rotary shaft, and a stationary unit which rotatably supports the rotary shaft, includes: a plate which comes into contact with an end portion of the rotary shaft; a fastening member which fixes the plate to the end portion of the rotary shaft; and a constraining member which connects the plate and the stationary unit, and constrains the plate from moving with respect to the stationary unit in an axial direction and a rotation direction.

Abstract: Provided is a rotary machine including: a shaft that rotates; a disc that has a substantially cylindrical hub fitted into the shaft and is provided so as to widen outward in a radial direction from a front end to a rear end of the hub; and an impeller having a plurality of blades provided on a surface of the disc. The hub has a tight fit section having an internal radius that is smaller than a radius of the shaft, and a loose fit section having an internal radius that is greater than the internal radius of the tight fit section. The loose fit section is provided on the front end side of the hub with respect to the tight fit section.

Abstract: Provided is a rotary machine including: a shaft that rotates; a disc that has a substantially cylindrical hub fitted into the shaft and is provided so as to widen outward in a radial direction from a front end to a rear end of the hub; and an impeller having a plurality of blades provided on a surface of the disc. The hub has a tight fit section having an internal radius that is smaller than a radius of the shaft, and a loose fit section having an internal radius that is greater than the internal radius of the tight fit section. The loose fit section is provided on the front end side of the hub with respect to the tight fit section.

Abstract: Provided is a rotary machine including: a shaft that rotates; a disc that has a substantially cylindrical hub fitted into the shaft and is provided so as to widen outward in a radial direction from a front end to a rear end of the hub; and an impeller having a plurality of blades provided on a surface of the disc. The hub has a tight fit section having an internal radius that is smaller than a radius of the shaft, and a loose fit section having an internal radius that is greater than the internal radius of the tight fit section. The loose fit section is provided on the front end side of the hub with respect to the tight fit section.

Abstract: A fixture used in a rotary machine which includes a rotary unit which has a rotary shaft, and a stationary unit which rotatably supports the rotary shaft, includes: a plate which comes into contact with an end portion of the rotary shaft; a fastening member which fixes the plate to the end portion of the rotary shaft; and a constraining member which connects the plate and the stationary unit, and constrains the plate from moving with respect to the stationary unit in an axial direction and a rotation direction.

Abstract: A compressor is provided with a substantially tubular compressor casing, a substantially circular lid that is provided inside an inner periphery of the compressor casing so as to close off an end surface of the compressor casing, a space that is enclosed by the lid and an inner circumferential surface of the compressor casing so as to accommodate a blade, and seal member that is provided in a circumferential direction on the space side of an outer circumferential surface of the lid, wherein a slit part is provided on the lid, radially inside the outer circumferential surface, where the seal member is provided, so as to extend in the axial direction from the space side of the lid.

Abstract: An impeller is formed of two parts, i.e., an inner peripheral side part and an outer peripheral side part. The inner peripheral side part is molded in a cylindrical shape. The outer peripheral side part is formed by integrally molding an annular disc externally fitted to an outer peripheral surface of the inner peripheral side part, a plurality of blades provided at an interval in a circumferential direction on a surface that faces the other side in the axis line direction of the annular disc and forming al flow path extending in a radial direction, and a cover covering the plurality of blades from the other side in the axis line direction and having an insertion hole to which the inner peripheral side part is inserted in the axis line direction at an interval in a radial direction.

Abstract: Provided is a rotary machine including: a shaft that rotates; a disc that has a substantially cylindrical hub fitted into the shaft and is provided so as to widen outward in a radial direction from a front end to a rear end of the hub; and an impeller having a plurality of blades provided on a surface of the disc. The hub has a tight fit section having an internal radius that is smaller than a radius of the shaft, and a loose fit section having an internal radius that is greater than the internal radius of the tight fit section. The loose fit section is provided on the front end side of the hub with respect to the tight fit section.

Abstract: According to one embodiment, a semiconductor device includes a drift region of a first conductivity type, a base region of a second conductivity type, a source region of the first conductivity type, a gate electrode in a trench shape, a contact region of the second conductivity type, a drain electrode, and a source electrode. The drift region is selectively provided in a drain layer of the first conductivity type from a surface of the drain layer to an inside of the drain layer. The base region is selectively provided in the drift region from a surface of the drift region to an inside of the drift region. The source region is selectively provided in the base region from a surface of the base region to an inside of the base region. The gate electrode penetrates from a part of the source region through the base region adjacent to the part of the source region to reach a part of the drift region in a direction substantially parallel to a major surface of the drain layer.

Abstract: A tapered coupling structure allows a tapered shaft to be coupled to and decoupled from a hub without the use of an 0-ring. The tapered shaft is provided with a taper part on the side that is coupled to the hub, and the hub is provided with a high-rigidity part having a thickness in the radial direction larger than that of other regions and having a high rigidity in the radial direction. An oil groove formed in the outer peripheral surface of the taper part to feed oil to the coupling surfaces of the taper part and the hub is provided in a region corresponding to the high-rigidity part in the axial direction.

Abstract: According to one embodiment, a semiconductor device includes a drift region of a first conductivity type, a base region of a second conductivity type, a source region of the first conductivity type, a gate electrode in a trench shape, a contact region of the second conductivity type, a drain electrode, and a source electrode. The drift region is selectively provided in a drain layer of the first conductivity type from a surface of the drain layer to an inside of the drain layer. The base region is selectively provided in the drift region from a surface of the drift region to an inside of the drift region. The source region is selectively provided in the base region from a surface of the base region to an inside of the base region. The gate electrode penetrates from a part of the source region through the base region adjacent to the part of the source region to reach a part of the drift region in a direction substantially parallel to a major surface of the drain layer.

Abstract: According to one embodiment, a semiconductor device includes a first semiconductor region, a second semiconductor region, a third semiconductor region, a fourth semiconductor region, a gate region, a gate insulating film, and an electric field relaxation region. The first semiconductor region includes a first portion and a second portion. The second semiconductor region includes a third portion and a fourth portion. The third semiconductor region includes a fifth portion and a sixth portion. The fourth semiconductor region is adjacent to the sixth portion. The gate region is provided inside a trench made in a second direction orthogonal to the first direction. The gate insulating film is provided between the gate region and an inner wall of the trench. The electric field relaxation region is provided between the third portion and the fifth portion and has an impurity concentration lower than an impurity concentration of the third semiconductor region.

Abstract: There is provided a tapered coupling structure in which a tapered shaft can be coupled to and decoupled from a hub without the use of an O-ring. In a tapered coupling structure 10 in which a tapered shaft 20 and a hub 30 are coupled to each other, the tapered shaft 20 is provided with a taper part 21 on the side of being coupled to the hub 30, and the hub 30 is provided with a high-rigidity part 32 having a thickness in the radial direction larger than that of other regions and having a high rigidity in the radial direction. An oil groove 24 formed in the outer peripheral surface of the taper part 21 to feed oil to the coupling surfaces of the taper part 21 and the hub 3 is provided in a region corresponding to the high-rigidity part 32 in the axial direction.

Abstract: A method of fabricating a semiconductor device includes: forming an insulating film on a semiconductor body to cover a termination area surrounding a cell area; forming a mask material film to cover the cell area and the insulating film; forming a resist film to cover the mask material film; patterning the resist film to have an opening serving as a gate-use resist pattern above the cell area and another opening serving as a dummy resist pattern above the insulating film; selectively etching the mask material film by use of the patterned resist film as a mask so that the insulating film is remained under the dummy resist pattern; selectively etching the semiconductor body by use of the patterned mask material film as another mask to form a trench in the cell area as corresponding to the gate-use resist pattern; and burying gate material in the trench to form the trench gate.