Patents by Inventor Hitoshi Shirato

Hitoshi Shirato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10007029
    Abstract: [1] A ?-phellandrene polymer which is a polymerization product of ?-phellandrene. [2] The ?-phellandrene polymer comprising ?-phellandrene units represented by chemical formulae (I-1), (I-2), (II-1) and (II-2), a total amount of the ?-phellandrene units being 50% by mass or more. [3] The ?-phellandrene polymer, which has a number average molecular weight Mn of 40,000 or more. [4] The ?-phellandrene polymer, wherein at least a part of olefinic carbon-carbon double bonds thereof are hydrogenated. [5] The ?-phellandrene polymer, which has a glass transition temperature of 80° C. or more.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: June 26, 2018
    Assignees: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, SEKISUI CHEMICAL CO., LTD.
    Inventors: Masami Kamigaito, Kotaro Satoh, Shinya Suzuki, Yasuyuki Kori, Yuji Eguchi, Koichiro Iwasa, Hitoshi Shirato
  • Publication number: 20160223715
    Abstract: [1] A ?-phellandrene polymer which is a polymerization product of ?-phellandrene. [2] The ?-phellandrene polymer comprising ?-phellandrene units represented by chemical formulae (I-1), (I-2), (II-1) and (II-2), a total amount of the ?-phellandrene units being 50% by mass or more. [3] The ?-phellandrene polymer, which has a number average molecular weight Mn of 40,000 or more. [4] The ?-phellandrene polymer, wherein at least a part of olefinic carbon-carbon double bonds thereof are hydrogenated. [5] The ?-phellandrene polymer, which has a glass transition temperature of 80° C. or more.
    Type: Application
    Filed: October 21, 2014
    Publication date: August 4, 2016
    Applicants: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, SEKISUI CHEMICAL CO., LTD.
    Inventors: Masami KAMIGAITO, Kotaro SATOH, Shinya SUZUKI, Yasuyuki KORI, Yuji EGUCHI, Koichiro IWASA, Hitoshi SHIRATO
  • Patent number: 7407712
    Abstract: It is an object of the present invention to provide a release film which is superior in the flexibility at high temperature, the conformability to circuit patterns, the heat resistance, the releasing property and the non-contaminative property, and easily discarded after use. The present invention relates to a release film, which is used in a manufacturing process of a printed-circuit board, a flexible printed-circuit board or a multilayer printed-circuit board, having a layer comprising a resin composition comprising a resin having a polar group in a main chain as a matrix and having a halogen content of 5% by weight or less on at least one surface.
    Type: Grant
    Filed: December 26, 2003
    Date of Patent: August 5, 2008
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Hirotake Matsumoto, Hitoshi Shirato, Hidekazu Inoue
  • Publication number: 20060154095
    Abstract: It is an object of the present invention to provide a release film which is superior in the flexibility at high temperature, the conformability to circuit patterns, the heat resistance, the releasing property and the non-contaminative property, and easily discarded after use. The present invention relates to a release film, which is used in a manufacturing process of a printed-circuit board, a flexible printed-circuit board or a multilayer printed-circuit board, having a layer comprising a resin composition comprising a resin having a polar group in a main chain as a matrix and having a halogen content of 5% by weight or less on at least one surface.
    Type: Application
    Filed: December 26, 2003
    Publication date: July 13, 2006
    Inventors: Hirotake Matsumoto, Hitoshi Shirato, Hidekazu Inoue
  • Patent number: 6090479
    Abstract: A resin foamed product is formed of a resin, and closed cells dispersed in the resin. The resin with the closed cells therein has a shape-recoverable property at an ambient temperature, a closed cell rate higher than 30% and a compression permanent set lower than 10%. Thus, when contraction takes place in the resin with the closed cells, after a predetermined time has passed without providing an outer stimulation to the resin, a shape of the resin foamed product formed of the resin with the closed cells is automatically recovered at least in one direction without equally expanding in all directions.
    Type: Grant
    Filed: March 24, 1998
    Date of Patent: July 18, 2000
    Assignee: Sekisui Kagaku Kogyo Kabushiki Kaisha
    Inventors: Hitoshi Shirato, Eiji Okada, Takashi Oguchi, Hiroshi Abe, Masaru Koike, Michitaka Tsujimoto