Patents by Inventor Hitoshi Tsuru

Hitoshi Tsuru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus
    Patent number: 8178283
    Abstract: An object of the present invention is to provide a simple method for treatment of a washing waste liquid, which enhances the flocculation effect and also enhances filtration characteristics of a flocculated washing waste liquid in a flocculation treatment of a washing waste liquid generated in processing a photosensitive lithographic printing plate. Disclosed is a method for treatment of a washing waste liquid generated in a processing apparatus of a photosensitive lithographic printing plate, which comprises (1) adding a cationic polymer flocculant to the washing waste liquid, then (2) adding an anionic polymer flocculent, followed by (3) filtration.
    Type: Grant
    Filed: December 5, 2007
    Date of Patent: May 15, 2012
    Assignee: Eastman Kodak Company
    Inventors: Jun Takeuchi, Hitoshi Tsuru, Yukihiro Yamakoshi
  • Surfactant-based composition
    Patent number: 7691283
    Abstract: A water-addition-type surfactant-based composition, containing: at least one of a fatty acid sodium salt and/or potassium salt, as a surfactant component; and at least one of N,N-bis(carboxymethyl)-L-glutamic acid tetrasodium salt, L-aspartate-(N,N)-diacetic acid tetrasodium salt, N-2-hydroxyethyliminodiacetic acid disodium salt, (S,S)-ethylenediaminesuccinic acid trisodium salt, methylglycinediacetic acid trisodium salt, ethylenediaminetetraacetic acid, nitorilotriacetic acid, diethylenetriaminepentaacetic acid, hydroxyethylethylenediaminetriacetic acid, triethylenetetraminehexaacetic acid, 1,3-propanediaminetetraacetic acid, 1,3-diamino-2-hydroxypropanetetraacetic acid, dihydroxyethylglycine, glycol ether diamine tetraacetic acid, hydroxyethanediphosphonic acid, aminotrimethylenephosphonic acid, 1,2,4-butanetricarboxylic acid, dihydroxyethylethylenediaminediacetic acid, sodium gluconate, sodium glucoheptonate, inositol hexaphosphate, hydroxyethanoic acid, 2-hydroxypropanoic acid, 2-hydroxysuccinic acid, 2,3
    Type: Grant
    Filed: March 5, 2007
    Date of Patent: April 6, 2010
    Assignees: Furukawa Techno Materical Co., Ltd., Shabondama Soap Co., Ltd., Kitakyushu Foundation for the Advancement of Industry Science and Technology
    Inventors: Yoshihiko Ohba, Shinji Iwamoto, Shota Mitsumune, Masataka Kobayashi, Hitoshi Tsuru, Shuuichi Hatae, Kazuya Uezu, Keiichi Yamaga, Yoshio Nagatomo, Hisao Umeki
  • METHOD OF TREATING RINSING WASTEWATER FROM DEVELOPING APPARATUS FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE, METHOD OF DEVELOPMENT, AND DEVELOPING APPARATUS
    Publication number: 20100047718
    Abstract: An object of the present invention is to provide a simple method for treatment of a washing waste liquid, which enhances the flocculation effect and also enhances filtration characteristics of a flocculated washing waste liquid in a flocculation treatment of a washing waste liquid generated in processing a photosensitive lithographic printing plate. Disclosed is a method for treatment of a washing waste liquid generated in a processing apparatus of a photosensitive lithographic printing plate, which comprises (1) adding a cationic polymer flocculant to the washing waste liquid, then (2) adding an anionic polymer flocculent, followed by (3) filtration.
    Type: Application
    Filed: December 5, 2007
    Publication date: February 25, 2010
    Applicant: EASTMAN KODAK COMPANY
    Inventors: Jun Takeuchi, Hitoshi Tsuru, Yukihiro Yamakoshi
  • Surfactant-based composition
    Publication number: 20070213248
    Abstract: A water-addition-type surfactant-based composition, containing: at least one of a fatty acid sodium salt and/or potassium salt, as a surfactant component; and at least one of N,N-bis(carboxymethyl)-L-glutamic acid tetrasodium salt, L -aspartate-(N,N)-diacetic acid tetrasodium salt, N-2-hydroxyethyliminodiacetic acid disodium salt, (S,S)-ethylenediaminesuccinic acid trisodium salt, methylglycinediacetic acid trisodium salt, ethylenediaminetetraacetic acid, nitorilotriacetic acid, diethylenetriaminepentaacetic acid, hydroxyethylethylenediaminetriacetic acid, triethylenetetraminehexaacetic acid, 1,3-propanediaminetetraacetic acid, 1,3-diamino-2-hydroxypropanetetraacetic acid, dihydroxyethylglycine, glycol ether diamine tetraacetic acid, hydroxyethanediphosphonic acid, aminotrimethylenephosphonic acid, 1,2,4-butanetricarboxylic acid, dihydroxyethylethylenediaminediacetic acid, sodium gluconate, sodium glucoheptonate, inositol hexaphosphate, hydroxyethanoic acid, 2-hydroxypropanoic acid, 2-hydroxysuccinic acid, 2,
    Type: Application
    Filed: March 5, 2007
    Publication date: September 13, 2007
    Applicants: Furukawa Techno Material Co., Ltd., Shabondama Soap Co., Ltd., Kitakyushu Foundation for the Advancement of Industry Science and Technology
    Inventors: Yoshihiko Ohba, Shinji Iwamoto, Shota Mitsumune, Masataka Kobayashi, Hitoshi Tsuru, Shuuichi Hatae, Kazuya Uezu, Keiichi Yamaga, Yoshio Nagatomo, Hisao Umeki
  • Circular saw
    Patent number: D281663
    Type: Grant
    Filed: May 20, 1983
    Date of Patent: December 10, 1985
    Inventors: Hitoshi Tsuru, Tetsuyuki Doi
  • Portable electric drill
    Patent number: D326598
    Type: Grant
    Filed: September 19, 1989
    Date of Patent: June 2, 1992
    Assignee: Ryobi Ltd.
    Inventors: Masakazu Sakamoto, Hitoshi Tsuru
  • Nailing machine
    Patent number: D337252
    Type: Grant
    Filed: July 9, 1991
    Date of Patent: July 13, 1993
    Assignee: Ryobi Ltd.
    Inventors: Hitoshi Tsuru, Toshiaki Saito