Abstract: A method for manufacturing a vibrator includes a preparation step of preparing a quartz crystal substrate having a first surface and a second surface that are in a front and back relationship, a first protective film formation step of forming a first protective film in an element formation region of the first surface, the first protective film having a first opening overlapping a first groove formation region and a second opening overlapping a second groove formation region, in which a region of the quartz crystal substrate where the vibrator is formed is referred to as the element formation region, a region where the first groove is formed is referred to as the first groove formation region, and a region where the second groove is formed is referred to as the second groove formation region, and a first dry etching step of dry etching the quartz crystal substrate from the first surface through the first protective film.

Abstract: A manufacturing method for a vibrator element includes a preparation step of preparing a quartz crystal substrate having a first substrate surface and a second substrate surface, a first protective film formation step of forming a first protective film in first groove formation areas of the first substrate surface, a second protective film formation step of forming a second protective film in an area except the first groove formation areas of a first vibrating arm formation area and a second vibrating arm formation area of the first substrate surface, and a first dry etching step of dry etching the quartz crystal substrate from the first substrate surface side via the first protective film and the second protective film and forming a first surface, first grooves, and outer shapes of the first vibrating arm and the second vibrating arm, wherein r1>r2, where an etching rate of the first protective film is r1 and an etching rate of the second protective film is r2.

Abstract: Provided is a method for manufacturing a vibrator element including a first vibration arm and a second vibration arm that each have a first surface and a second surface. The manufacturing method includes a preparation step of preparing a quartz crystal substrate, a first protective film forming step of forming a first protective film on a first substrate surface of the quartz crystal substrate, a first dry etching step of dry etching the quartz crystal substrate via the first protective film, a second protective film forming step of forming a second protective film on a second substrate surface of the quartz crystal substrate, and a second dry etching step of dry etching the quartz crystal substrate via the second protective film. Outer shapes of the first vibration arm and the second vibration arm are formed from the first surface to the second surface in the first dry etching step, and the outer shapes of the first vibration arm and the second vibration arm are not formed in the second dry etching step.

Abstract: A method for manufacturing a vibrator element includes a first protective film forming step of forming a first protective film on a first substrate surface of a quartz crystal substrate, a first dry etching step of dry etching the quartz crystal substrate from a first substrate surface side to form a first groove and outer shapes of a first and second vibration arms, a second protective film forming step of forming a second protective film on a second substrate surface of the quartz crystal substrate, and a second dry etching step of dry etching the quartz crystal substrate from a second substrate surface side to form a second groove and outer shapes of the first and second vibration arms. In the first dry etching step, the outer shapes of the first and second vibration arms are formed to be closer to the second substrate surface than is a position where a bottom surface of the second groove is formed.

Abstract: A vibration element manufacturing method includes a first dry etching step of dry-etching a quartz crystal substrate from the first surface side to form first grooves and the outer shapes of first and second vibrating arms, a second dry etching step of dry-etching the quartz crystal substrate from the second surface side to form second grooves and the outer shapes, and a wet etching step of wet-etching the side surfaces of the first and second vibrating arms, the first grooves, and the second grooves to form inclining surfaces that couple bottom surfaces to in-groove side surfaces of the first and second grooves, and the first and second grooves satisfy the relationship of D1/D ? 0.80, where D represents the depth of each of the first and second grooves, and D1 represents the result of subtraction of the length of the inclining surfaces in a direction Z from the depth in each of the first and second grooves.

Abstract: A method for manufacturing a vibration element including a first protective film formation step of forming a first protective film, a first dry etching step of performing dry etching via the first protective film to form first grooves and the outer shapes of vibrating arms, a second protective film formation step of forming a second protective film in the first grooves, a second dry etching step of performing dry etching via the second protective film, a third protective film formation step of forming a third protective film, a third dry etching step of performing dry etching via the third protective film to form second grooves and the outer shapes of the vibrating arms, a fourth protective film formation step of forming a fourth protective film in the second grooves, and a fourth dry etching step of performing dry etching via the fourth protective film.

Abstract: A method for manufacturing a vibration element including first and second vibrating arms each having a first surface and a second surface that are front and rear sides with respect to each other and a bottomed groove that opens via the first surface, the method including a first protective film formation step of forming a first protective film, a first dry etching step of performing dry etching via the first protective film to form grooves and the outer shapes of the first and second vibrating arms, a second protective film formation step of forming a second protective film in the grooves, and a second dry etching step of performing dry etching via the second protective film to form the first surface and the outer shapes of the first and second vibrating arms.

Abstract: A method for manufacturing a vibration element includes, a base film forming step of forming a first base film at a first substrate surface of a quartz crystal substrate in first and second vibrating arm forming regions, a protective film forming step of forming a first protective film in a bank portion forming region of the first base film, and a dry-etching step of dry-etching the quartz crystal substrate through the first base film and the first protective film.

Abstract: A method for manufacturing a vibration element includes, a first base film forming step of forming a first base film at a first substrate surface of a quartz crystal substrate in first and second vibrating arm forming regions, a first protective film forming step of forming a first protective film in a first bank portion forming region of the first base film, a first dry-etching step of dry-etching the quartz crystal substrate through the first base film and the first protective film, a second base film forming step of forming a second base film at a second substrate surface of the quartz crystal substrate in the first and second vibrating arm forming regions, a second protective film forming step of forming a second protective film in a second bank portion forming region of the second base film, and a second dry-etching step of dry-etching the quartz crystal substrate through the second base film and the second protective film.

Abstract: A method of manufacturing a vibration element includes: a protective film forming step of forming a protective film on a first substrate surface of a crystal substrate; and a dry etching step of dry-etching the crystal substrate via the protective film. The protective film satisfies a relationship of T1<T2<T3, in which T1 is a thickness of the protective film in an inter-arm region positioned between a first vibration arm forming region in which a first vibration arm is formed and a second vibration arm forming region in which a second vibration arm is formed, T2 is a thickness of the protective film in a groove forming region in which a groove is formed, and T3 is a thickness of the protective film in a region of the first vibration arm forming region and the second vibration arm forming region excluding the groove forming region.

Abstract: A method of manufacturing a vibration element includes: a first protective film forming step of forming a first protective film on a first substrate surface of a crystal substrate; a first dry etching step of dry-etching the crystal substrate via the first protective film; a second protective film forming step of forming a second protective film on a second substrate surface of the crystal substrate; and a second dry etching step of dry-etching the crystal substrate via the second protective film. A relationship of T1<T2<T3 or T4<T5<T6 is satisfied, in which T1 and T4 are thicknesses of the first and second protective films in an inter-arm region, respectively, T2 and T5 are thicknesses of the first and second protective films in first and second groove forming regions, respectively, and T3 and T6 are thicknesses of the first and second protective films in first and second bank portion forming regions, respectively.

Abstract: A method for manufacturing a vibrator device includes a first dry etching step of dry-etching a quartz crystal substrate having a first surface and a second surface from the side facing the first surface to form first grooves and part of the outer shapes of a first vibrating arm and a second vibrating arm, a second dry etching step of dry-etching the quartz crystal substrate from the side facing the second surface to form second grooves and part of the outer shapes of the first vibrating arm and the second vibrating arm, and thereafter, a wet etching step of wet-etching the side surfaces of the first vibrating arm and the second vibrating arm.

Abstract: A method for manufacturing a vibration element includes: a preparing step of preparing a quartz crystal substrate having a first surface and a second surface; a protective film forming step of forming a protective film on the first surface of the quartz crystal substrate, excluding groove forming regions where grooves are formed and an inter-arm region located between a first vibrating arm forming region where a first vibrating arm is formed and a second vibrating arm forming region where a second vibrating arm is formed; and a dry etching step of dry etching the quartz crystal substrate from a first surface side via the protective film and forming the grooves and contours of the first vibrating arm and the second vibrating arm. Wa/Aa<1, wherein Wa indicates a depth of the grooves formed in the dry etching step, and Aa indicates a depth of the contours.

Abstract: A method for manufacturing a vibration element includes: a first dry etching step of dry etching the quartz crystal substrate from a first surface and forming first grooves and contours of a first vibrating arm and a second vibrating arm on the first surface; and a second dry etching step of dry etching the quartz crystal substrate from a second surface side and forming second grooves and contours of the first vibrating arm and the second vibrating arm on the second surface, in which Wa/Aa<1 in at least one of the first and second dry etching steps, Wa is a depth of the first and second grooves formed in the first and second dry etching steps, and Aa is a depth of the contours formed in the first and second dry etching steps.

Abstract: A method for manufacturing a vibration element that includes a base portion, a first vibration arm and a second vibration arm that extend from the base portion along a first direction and are arranged along a second direction intersecting the first direction, and bottomed grooves on both main surfaces of the first vibration arm and both main surfaces of the second vibration arm includes: a preparing step of preparing a crystal substrate; a protective film forming step of forming a protective film on the crystal substrate except for groove regions that are regions in which the grooves are formed; and a dry etching step of dry etching the crystal substrate through the protective film to form the grooves. The grooves provided in at least one of the first vibration arm and the second vibration arm include a first groove and a second groove arranged along the second direction.