Patents by Inventor Ho Chan Ji

Ho Chan Ji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9733563
    Abstract: The present invention relates to a photosensitive resin composition and a photosensitive material comprising the same. The photosensitive resin composition according to an exemplary embodiment of the present invention may comprise two multi-functional monomers where structures of side chains comprising unsaturated double bonds are different from each other while a composition ratio is changed. Accordingly, in the exemplary embodiment of the present invention, processability is excellent, and it is possible to decrease defects by a rupture when a LCD substrate is sealed and substrate separation defects due to an impact to the LCD products by improving an adhesion property to a lower substrate after a hard baking process.
    Type: Grant
    Filed: January 18, 2012
    Date of Patent: August 15, 2017
    Assignee: LG CHEM, LTD.
    Inventors: Ho Chan Ji, Sunghyun Kim, Dongchang Choi, Kyung Soo Choi, Geun Young Cha, Sang Chul Lee
  • Patent number: 8829068
    Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: September 9, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Sunhwa Kim, Ho Chan Ji, Dongchang Choi, Han Soo Kim, Yoon Hee Heo, Changho Cho, Won Jin Chung
  • Patent number: 8822127
    Abstract: A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: September 2, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Geun Young Cha, Sung-Hyun Kim
  • Patent number: 8822132
    Abstract: A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin. Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: September 2, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Dong-Chang Choi, Kyung-Soo Choi, Ho-Chan Ji, Geun-Young Cha, Min-Young Lim, Sung-Hyun Kim, Han-Soo Kim, Yoon-Hee Heo, Ji-Heum Yoo
  • Patent number: 8597861
    Abstract: The present invention relates to a method for manufacturing a color filter and a color filter manufactured by using the same. More particularly, the present invention pertains to a method for manufacturing a color filter, which includes performing plasma treatment of a black matrix (BM) pattern formed on a substrate to increase a difference in ink repellency of the black matrix pattern and a pixel unit, and a color filter manufactured by using the same. When the production method of the present invention is used, it is possible to provide the color filter in which color mixing does not occur in a pixel unit or between pixel units during discharging of ink by using an inkjet printing process, discoloration due to unfilling does not occur, a surface is uniform, and there is an insignificant step in the pixel unit or between the pixel units.
    Type: Grant
    Filed: March 6, 2008
    Date of Patent: December 3, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Dae-Hyun Kim, Dong-Chang Choi, Kyung-Soo Choi, Ho-Chan Ji, Hyun-Sik Kim, Geun-Young Cha, Sung-Hyun Kim, Jae-Joon Kim, Min-A Yu, Mi-Ae Kim, Mi-Kyoung Kim
  • Patent number: 8535874
    Abstract: Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: September 17, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Han Soo Kim, Sung Hyun Kim, Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Min Young Lim, Geun Young Cha, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Publication number: 20130030077
    Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
    Type: Application
    Filed: April 20, 2012
    Publication date: January 31, 2013
    Applicant: LG CHEM, LTD.
    Inventors: Sunhwa Kim, Ho Chan JI, Dongchang Choi, Han Soo Kim, Yoon Hee Heo, Changho Cho, Won Jin Chung
  • Publication number: 20120189961
    Abstract: The present invention relates to a photosensitive resin composition and a photosensitive material comprising the same. The photosensitive resin composition according to an exemplary embodiment of the present invention may comprise two multi-functional monomers where structures of side chains comprising unsaturated double bonds are different from each other while a composition ratio is changed. Accordingly, in the exemplary embodiment of the present invention, processability is excellent, and it is possible to decrease defects by a rupture when a LCD substrate is sealed and substrate separation defects due to an impact to the LCD products by improving an adhesion property to a lower substrate after a hard baking process.
    Type: Application
    Filed: January 18, 2012
    Publication date: July 26, 2012
    Applicant: LG CHEM, LTD.
    Inventors: Ho Chan JI, Sunghyun KIM, Dongchang CHOI, Kyung Soo CHOI, Geun Young CHA, Sang Chul LEE
  • Patent number: 8153751
    Abstract: Disclosed is a multifunctional urethane monomer prepared by reacting (a) an epoxy compound having two or more epoxy groups, (b) a diol compound having an acidic group and (c) a compound having an ethylenically unsaturated group and an isocyanate group with one another. The photosensitive resin composition comprising the multifunctional urethane monomer has low viscosity, superior sensitivity, excellent chemical resistance and heat-resistance and high development margin.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: April 10, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Yoon Hee Heo, Min Young Lim, Ho Chan Ji, Sung-Hyun Kim, Han Soo Kim, Sun Hwa Kim
  • Publication number: 20110151379
    Abstract: The present invention relates to a black matrix photosensitive resin composition having high light-shielding and improved adhesion properties and a black matrix for a liquid crystal display including the same. The black matrix photosensitive resin composition comprises an alkali-soluble binder resin, a multi-functional monomer having an ethylenic unsaturated double bond, a photopolymerization initiator, an adhesion accelerator, a solvent, and a colorant comprising black pigments. A Cardo type binder is mixed in an amount of 10 to 90 wt % and an acryl type binder is mixed in an amount of 10 to 90 wt % based on a total weight of the alkali-soluble binder resin including the Cardo type binder and the acryl type binder.
    Type: Application
    Filed: December 10, 2010
    Publication date: June 23, 2011
    Applicant: LG CHEM, LTD.
    Inventors: Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Geun Young Cha, Sang Chul Lee
  • Publication number: 20110101268
    Abstract: A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.
    Type: Application
    Filed: September 28, 2009
    Publication date: May 5, 2011
    Applicant: LG CHEM, LTD.
    Inventors: Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Geun Young Cha, Sung-Hyun Kim
  • Publication number: 20100331439
    Abstract: Disclosed is a multifunctional urethane monomer prepared by reacting (a) an epoxy compound having two or more epoxy groups, (b) a diol compound having an acidic group and (c) a compound having an ethylenically unsaturated group and an isocyanate group with one another. The photosensitive resin composition comprising the multifunctional urethane monomer has low viscosity, superior sensitivity, excellent chemical resistance and heat-resistance and high development margin.
    Type: Application
    Filed: June 30, 2009
    Publication date: December 30, 2010
    Inventors: Yoon Hee Heo, Min Young Lim, Ho Chan Ji, Sung-Hyun Kim, Han Soo Kim, Sun Hwa Kim
  • Publication number: 20100201925
    Abstract: Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
    Type: Application
    Filed: September 26, 2008
    Publication date: August 12, 2010
    Applicant: LG CHEM LTD.
    Inventors: Han Soo Kim, Sung Hyun Kim, Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Min Young Lim, Geun Young Cha, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Publication number: 20100104981
    Abstract: A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin. Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.
    Type: Application
    Filed: November 10, 2008
    Publication date: April 29, 2010
    Inventors: Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Geun Young Cha, Min Young Lim, Sung Hyun Kim, Han soo Kim, Yoon Hee Heo, Ji Heum Yoo
  • Publication number: 20100085518
    Abstract: The present invention relates to a photosensitive resin composition for a black matrix, a black matrix produced by the composition and a liquid crystal display including the black matrix. The resin composition for a black matrix comprising a fluorene-based resin polymer as a resin binder has high sensitivity and optical density, and excellent development adherence.
    Type: Application
    Filed: February 21, 2008
    Publication date: April 8, 2010
    Inventors: Kyung-Soo Choi, Yoon-Hee Heo, Dong-Chang Choi, Ho-Chan Ji, Geun-Young Cha, Dae-Hyun Kim
  • Publication number: 20100062377
    Abstract: The present invention relates to a method for manufacturing a color filter and a color filter manufactured by using the same. More particularly, the present invention pertains to a method for manufacturing a color filter, which includes performing plasma treatment of a black matrix (BM) pattern formed on a substrate to increase a difference in ink repellency of the black matrix pattern and a pixel unit, and a color filter manufactured by using the same. When the production method of the present invention is used, it is possible to provide the color filter in which color mixing does not occur in a pixel unit or between pixel units during discharging of ink by using an inkjet printing process, discoloration due to unfilling does not occur, a surface is uniform, and there is an insignificant step in the pixel unit or between the pixel units.
    Type: Application
    Filed: March 6, 2008
    Publication date: March 11, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Dae-Hyun Kim, Dong-Chang Choi, Kyung-Soo Choi, Ho-Chan Ji, Hyun-Sik Kim, Geun-Young Cha, Sung-Hyun Kim, Jae-Joon Kim, Min-A Yu, Mi-Ae Kim, Mi-Kyoung Kim