Patents by Inventor Ho-cheol Jang

Ho-cheol Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7868384
    Abstract: A high-voltage semiconductor device includes a semiconductor layer having a plurality of pillars of a first conductivity type defined by a plurality of trenches which extend from a top surface of the semiconductor layer toward a bottom surface thereof. A charge compensation layer of a second conductivity type is disposed over at least sidewalls of each trench to a predetermined thickness to form a groove in each trench. A charge compensation plug of the first conductivity type substantially fills each groove.
    Type: Grant
    Filed: November 13, 2007
    Date of Patent: January 11, 2011
    Assignee: Fairchild Korea Semiconductor Ltd.
    Inventors: Jae-gil Lee, Chang-wook Kim, Ho-cheol Jang, Chong-man Yun
  • Patent number: 7655981
    Abstract: In accordance with an embodiment of the invention, a superjunction semiconductor device includes an active region and a termination region surrounding the active region. A central vertical axis of a boundary column of a second conductivity type material defines the boundary between the active region and the termination region. The active and termination regions include columns of first and second conductivity type material alternately arranged along a horizontal direction in a semiconductor region having top and bottom surfaces. At least one of the columns of the first conductivity type material in the termination region has a different width than a width of the columns of the first conductivity type material in the active region.
    Type: Grant
    Filed: October 16, 2007
    Date of Patent: February 2, 2010
    Assignee: Fairchild Korea Semiconductor Ltd.
    Inventors: Jae-gil Lee, Jin-young Jung, Ho-cheol Jang
  • Publication number: 20080211053
    Abstract: In accordance with an embodiment of the invention, a superjunction semiconductor device includes an active region and a termination region surrounding the active region. A central vertical axis of a boundary column of a second conductivity type material defines the boundary between the active region and the termination region. The active and termination regions include columns of first and second conductivity type material alternately arranged along a horizontal direction in a semiconductor region having top and bottom surfaces. At least one of the columns of the first conductivity type material in the termination region has a different width than a width of the columns of the first conductivity type material in the active region.
    Type: Application
    Filed: October 16, 2007
    Publication date: September 4, 2008
    Applicant: Fairchild Korea Semiconductor Ltd.
    Inventors: Jae-gil Lee, Jin-young Jung, Ho-cheol Jang
  • Publication number: 20080111207
    Abstract: A high-voltage semiconductor device includes a semiconductor layer having a plurality of pillars of a first conductivity type defined by a plurality of trenches which extend from a top surface of the semiconductor layer toward a bottom surface thereof. A charge compensation layer of a second conductivity type is disposed over at least sidewalls of each trench to a predetermined thickness to form a groove in each trench. A charge compensation plug of the first conductivity type substantially fills each groove.
    Type: Application
    Filed: November 13, 2007
    Publication date: May 15, 2008
    Inventors: Jae-gil Lee, Chang-wook Kim, Ho-cheol Jang, Chong-man Yun
  • Patent number: 7362038
    Abstract: A surface acoustic wave (SAW) device package and method for packaging a SAW device provide a surface excited device having a small footprint, low cost and streamlined manufacturing process. A substrate including a SAW active area on a first side is interconnected to external circuits and mechanically mounted via a plurality of metal pillars and an outer metal sealing wall. The sealing wall additionally provides protection from external environmental contamination and interference. The sealing wall may include a number of gaps to reduce stress due to differences in thermal expansion coefficients between the SAW substrate and the metal sealing wall and the gaps may be filled with a flexible sealant. The metal pillars may be round, square or other suitable shape and solder bump terminals may be added to the ends of the pillars and the bottom edge of the sealing wall.
    Type: Grant
    Filed: April 18, 2005
    Date of Patent: April 22, 2008
    Assignee: Amkor Technology, Inc.
    Inventors: Ho Cheol Jang, Choon Heung Lee, Seong Min Seo
  • Patent number: 7359579
    Abstract: Disclosed are an image sensor package and a method for manufacturing the same. A sealing portion is formed between an image sensor die and a glass substrate to completely isolate the sensing portion of the image sensor die from external environment. Electrically conductive bumps are formed outside of the sealing portion to electrically connect the image sensor die to the glass substrate. The image sensor die can be sealed by a cap while the image sensor die is connected to the glass substrate via the electrically conductive bumps.
    Type: Grant
    Filed: October 8, 2004
    Date of Patent: April 15, 2008
    Assignee: Amkor Technology, Inc.
    Inventors: Jong Sik Paek, Ho Cheol Jang, Seong Min Seo
  • Patent number: 7335986
    Abstract: Disclosed is a wafer level chip scale package and a method for manufacturing the same. The wafer level chip scale package includes a semiconductor die having a first coating layer formed thereon; a redistribution layer formed on the first coating layer and connected to the bond pad; an electronic device placed on the first coating layer; a connection member for electrically connecting the electronic device and the redistribution layer; a conductive post formed on the redistribution layer with a predetermined thickness; a second coating layer for enclosing the first coating layer, the redistribution layer, the electronic device, the connection member, and the conductive post; and a solder ball thermally bonded to the conductive post while protruding to the exterior of the second coating layer. This construction makes it easy to manufacture stacked packages and chip scale packages in a wafer level.
    Type: Grant
    Filed: September 14, 2005
    Date of Patent: February 26, 2008
    Assignee: Amkor Technology, Inc.
    Inventors: Jong Sik Paek, Sung Su Park, Ho Cheol Jang, Jung Gi Jin
  • Patent number: 7301203
    Abstract: In accordance with an embodiment of the invention, a superjunction semiconductor device includes an active region and a termination region surrounding the active region. A central vertical axis of a boundary column of a second conductivity type material defines the boundary between the active region and the termination region. The active and termination regions include columns of first and second conductivity type material alternately arranged along a horizontal direction in a semiconductor region having top and bottom surfaces. At least one of the columns of the first conductivity type material in the termination region has a different width than a width of the columns of the first conductivity type material in the active region.
    Type: Grant
    Filed: November 29, 2004
    Date of Patent: November 27, 2007
    Assignee: Fairchild Korea Semiconductor Ltd.
    Inventors: Jae-gil Lee, Jin-young Jung, Ho-cheol Jang
  • Patent number: 7276405
    Abstract: In accordance with one embodiment of the present invention, a power semiconductor device includes a first drift region of a first conductivity type extending over a semiconductor substrate. The first drift region has a lower impurity concentration than the semiconductor substrate. A second drift region of the first conductivity type extends over the first drift region, and has a higher impurity concentration than the first drift region. A plurality of stripe-shaped body regions of a second conductivity type are formed in an upper portion of the second drift region. A third region of the first conductivity type is formed in an upper portion of each body region so as to form a channel region in each body region between the third region and the second drift region. A gate electrode laterally extends over but is insulated from: (i) the channel region in each body region, (ii) a surface area of the second drift region between adjacent stripes of body regions, and (iii) a surface portion of each source region.
    Type: Grant
    Filed: July 14, 2005
    Date of Patent: October 2, 2007
    Assignee: Fairchild Korea Semiconductor Ltd.
    Inventors: Young-chul Choi, Tae-hoon Kim, Ho-cheol Jang, Chong-man Yun
  • Publication number: 20070029597
    Abstract: Provided is a high-voltage semiconductor device which is constructed such that the quantity of P and N charges are balanced in the entire drift region thereby preventing the degradation of the device breakdown characteristics. The high-voltage semiconductor device comprises an active region including N pillars of N conductivity type and P pillars of P conductivity type, arranged alternately in a direction from a center portion of the active region to an outer portion thereof to encircle each other in a horizontal direction. The N and P pillars are formed in a closed shape.
    Type: Application
    Filed: July 28, 2006
    Publication date: February 8, 2007
    Inventors: Jae-gil Lee, Kyu-hyun Lee, Ho-cheol Jang, Chong-man Yun
  • Publication number: 20070001230
    Abstract: A superjunction semiconductor device includes an edge p pillar, an active region, and a termination region. The edge p pillar has a rectangular ring shape with rounded corners surrounding the active region. The active region includes an active n region and active p pillars having vertical stripe shapes disposed at regular intervals in the active n region. The top and bottom ends of the active p pillars are separated from the edge p pillar. The termination region includes termination n pillars and termination p pillars alternately arranged around the edge p pillar. Surplus p charges that are not used to balance the quantity of p charges and the quantity of n charges among p charges included in the upper and lower parts of the edge p pillar are eliminated or n charges are supplemented to balance the quantity of p charges and the quantity of n charges.
    Type: Application
    Filed: June 29, 2005
    Publication date: January 4, 2007
    Inventors: Jae-gil Lee, Jin-young Jung, Ho-cheol Jang
  • Publication number: 20050263818
    Abstract: In accordance with one embodiment of the present invention, a power semiconductor device includes a first drift region of a first conductivity type extending over a semiconductor substrate. The first drift region has a lower impurity concentration than the semiconductor substrate. A second drift region of the first conductivity type extends over the first drift region, and has a higher impurity concentration than the first drift region. A plurality of stripe-shaped body regions of a second conductivity type are formed in an upper portion of the second drift region. A third region of the first conductivity type is formed in an upper portion of each body region so as to form a channel region in each body region between the third region and the second drift region. A gate electrode laterally extends over but is insulated from: (i) the channel region in each body region, (ii) a surface area of the second drift region between adjacent stripes of body regions, and (iii) a surface portion of each source region.
    Type: Application
    Filed: July 14, 2005
    Publication date: December 1, 2005
    Inventors: Young-chul Choi, Tae-hoon Kim, Ho-cheol Jang, Chong-man Yun
  • Patent number: 6930356
    Abstract: In accordance with one embodiment of the present invention, a power semiconductor device includes a first drift region of a first conductivity type extending over a semiconductor substrate. The first drift region has a lower impurity concentration than the semiconductor substrate. A second drift region of the first conductivity type extends over the first drift region, and has a higher impurity concentration than the first drift region. A plurality of stripe-shaped body regions of a second conductivity type are formed in an upper portion of the second drift region. A third region of the first conductivity type is formed in an upper portion of each body region so as to form a channel region in each body region between the third region and the second drift region. A gate electrode laterally extends over but is insulated from: (i) the channel region in each body region, (ii) a surface area of the second drift region between adjacent stripes of body regions, and (iii) a surface portion of each source region.
    Type: Grant
    Filed: June 17, 2003
    Date of Patent: August 16, 2005
    Assignee: Fairchild Korea Semiconductor Ltd.
    Inventors: Young-chul Choi, Tae-hoon Kim, Ho-cheol Jang, Chong-man Yun
  • Publication number: 20050116313
    Abstract: In accordance with an embodiment of the invention, a superjunction semiconductor device includes an active region and a termination region surrounding the active region. A central vertical axis of a boundary column of a second conductivity type material defines the boundary between the active region and the termination region. The active and termination regions include columns of first and second conductivity type material alternately arranged along a horizontal direction in a semiconductor region having top and bottom surfaces. At least one of the columns of the first conductivity type material in the termination region has a different width than a width of the columns of the first conductivity type material in the active region.
    Type: Application
    Filed: November 29, 2004
    Publication date: June 2, 2005
    Inventors: Jae-gil Lee, Jin-young Jung, Ho-cheol Jang
  • Publication number: 20040041229
    Abstract: In accordance with one embodiment of the present invention, a power semiconductor device includes a first drift region of a first conductivity type extending over a semiconductor substrate. The first drift region has a lower impurity concentration than the semiconductor substrate. A second drift region of the first conductivity type extends over the first drift region, and has a higher impurity concentration than the first drift region. A plurality of stripe-shaped body regions of a second conductivity type are formed in an upper portion of the second drift region. A third region of the first conductivity type is formed in an upper portion of each body region so as to form a channel region in each body region between the third region and the second drift region. A gate electrode laterally extends over but is insulated from: (i) the channel region in each body region, (ii) a surface area of the second drift region between adjacent stripes of body regions, and (iii) a surface portion of each source region.
    Type: Application
    Filed: June 17, 2003
    Publication date: March 4, 2004
    Inventors: Young-chul Chol, Tae-hoon Kim, Ho-cheol Jang, Chong-man Yun
  • Patent number: 6344676
    Abstract: A power semiconductor device having low on-resistance and a high breakdown voltage is disclosed. The power semiconductor device can be a high power MOS transistor or an insulation gate bipolar transistor. The power semiconductor device has unit cells formed in parallel body region strips. A highly-doped drift layer of the same conductivity type as that of a drift region is provided between adjacent body region strips in a unit cell. Both ends of each of the body region strips of the unit cell are connected to a single frame region. This prevents a depletion region of a spherical or cylindrical type from being formed on an edge of the body region, and in so doing, increases a breakdown voltage of the device.
    Type: Grant
    Filed: March 24, 2000
    Date of Patent: February 5, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chong-man Yun, Tae-hoon Kim, Ho-cheol Jang, Young-chull Choi