Abstract: A method for producing a battery module is provided. The method for producing a battery module includes: stacking a plurality of battery cells; disposing a plurality of bus bars adjacent to electrode leads respectively provided at the plurality of battery cells; by a welding jig, pressing the electrode leads so that the electrode leads come into contact with the bus bars, respectively; and welding the electrode leads and the bus bars through an opening formed in the welding jig.

Abstract: Disclosed is a battery pack including a battery module having a plurality of battery cells, and a heat dissipation member provided in contact with a bus bar at a side surface of the battery module where electrode leads of the battery cells and the bus bar coupled to the electrode leads are disposed.

Abstract: The present invention relates to a lithium secondary battery which includes a positive electrode, a negative electrode, a separator disposed between the positive electrode and the negative electrode, and an electrolyte solution, wherein a patterned gel polymer electrolyte layer is included on one surface or both surfaces of at least one structure of the positive electrode, the negative electrode, or the separator.

Abstract: A battery module includes: a battery cell assembly having a plurality of battery cells; a top plate configured to cover an upper side of the battery cell assembly; a bottom plate configured to cover a lower side of the battery cell assembly; a sensing assembly disposed to cover a front side and a rear side of the battery cell assembly; a pair of side plates disposed at side surfaces, respectively, of the battery cell assembly; and a pair of compression pads disposed between the pair of side plates and the battery cell assembly, respectively.

Abstract: A method for producing a battery module is provided. The method for producing a battery module includes: stacking a plurality of battery cells; disposing a plurality of bus bars adjacent to electrode leads respectively provided at the plurality of battery cells; by a welding jig, pressing the electrode leads so that the electrode leads come into contact with the bus bars, respectively; and welding the electrode leads and the bus bars through an opening formed in the welding jig.

Abstract: The present application discloses a method for treating a protein deficiency in the central nervous system of a subject in need thereof, comprising systemically administering to the subject a therapeutically effective dose of a fusion polypeptide comprising the first protein, wherein the fusion polypeptide comprises: (a) the first protein; (b) a second protein that provides extended circulation-lifetime in vivo and (c) blood brain barrier crossing facilitating peptide; wherein the fusion polypeptide crosses the blood brain barrier (BBB).

Abstract: Provided is an exposing method using a variable shaped beam that may minimize a critical dimension (CD) distribution and a mean to target (MTT) difference generated during a process by correcting CD linearity of the design CD of a circuit pattern, and a pattern forming method using the exposing method. In the exposing method, a determination is made as to whether the design size of a beam shot used to expose a circuit pattern is less than a value, or greater than the value. If the design size is greater than the value, the size of the beam shot may be linearly corrected. When the design size is less than the value, the size of the beam shot may be non-linearly corrected.

Abstract: Provided is an exposing method using a variable shaped beam that may minimize a critical dimension (CD) distribution and a mean to target (MTT) difference generated during a process by correcting CD linearity of the design CD of a circuit pattern, and a pattern forming method using the exposing method. In the exposing method, a determination is made as to whether the design size of a beam shot used to expose a circuit pattern is less than a value, or greater than the value. If the design size is greater than the value, the size of the beam shot may be linearly corrected. When the design size is less than the value, the size of the beam shot may be non-linearly corrected.

Abstract: In a photomask layout for forming a photomask pattern, the photomask layout includes a first mother pattern corresponding to a principal pattern of the photomask pattern, a second mother pattern corresponding to a supplementary pattern of the photomask pattern and a guide pattern that controls the shot size of illumination light for transcribing the first and the second mother patterns, respectively. The principal pattern is transcribed onto a semiconductor substrate, and the supplementary pattern is positioned between the principal patterns and prevents transcription failures of the principal pattern without transcription onto the semiconductor substrate. The shot size of the light is reduced on a basis of the guide pattern to thereby accurately form a minute pattern of the semiconductor device.