Abstract: An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.

Abstract: An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.

Abstract: A coating apparatus (20) for forming a photoresist film on a substrate (21) includes a flat table (30), a nozzle unit (40), and a particle cleaning unit (50). The flat table is used for supporting the substrate. The nozzle unit is used for dispensing photoresist material on a top surface of the substrate. The particle cleaning unit is used for removing particles from the top surface before the photoresist material is coated thereon. The coating apparatus can timely clean the substrate before coating. The coating performance is improved, and the nozzle unit is protected from being scratched or damaged.

Abstract: An apparatus (20) for supporting a substrate (S2) includes a number of slats (28), a number of connecting blocks (24) separately positioned on the slats, and a number of soft sleeves (22) connected with the connecting blocks, respectively. Because top surfaces of the soft sleeves are shaped as annular, the force applied between the substrate and the soft sleeves is distributed, and is reduced at each contact point. The surface of the substrate is hardly if at all deformed by the soft sleeves, thereby reducing the risk of or even altogether preventing the formation of undulations. The quality of the pattern to be processed is improved.

Abstract: A glass substrate includes a two-dimensional barcode, which is provided on a peripheral region of a major surface of the glass substrate. A side of the two-dimensional barcode is oblique to a nearest side of the glass substrate. The two-dimensional barcode includes a reference line, and is for recording identification information of the glass substrate. If the two-dimensional barcode sustains partial damage at the nearest side of the glass substrate, there is a reasonable likelihood that only part of the side of the two-dimensional barcode will sustain damage. In such case, the risk of damage occurring to the reference line of the two-dimensional barcode is minimized. If the reference line remains intact, then the two-dimensional barcode can still be properly read.