Patents by Inventor Ho-Man Chiu

Ho-Man Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070274876
    Abstract: The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.
    Type: Application
    Filed: August 14, 2007
    Publication date: November 29, 2007
    Inventors: Ho-Man Chiu, Daniel Clark, Shaun Crawford, Jay Jung, Leonard Todd, Robbert Vermeulen
  • Publication number: 20060104879
    Abstract: The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.
    Type: Application
    Filed: November 12, 2004
    Publication date: May 18, 2006
    Inventors: Ho-Man Chiu, Daniel Clark, Shaun Crawford, Jay Jung, Leonard Todd, Robbert Vermeulen
  • Publication number: 20060104878
    Abstract: The present invention relates to a thermal reactor apparatus used to treat industrial effluent fluids, for example waste effluent produced in semiconductor and liquid crystal display manufacturing processes. Specifically, the present invention relates to improved monitoring and control features for the thermal reactor apparatus, including a flame sensing device, an intrinsically safe flammable gas sensing device, and a sequential mode of operation having built-in safety redundancy. The improved monitoring and control features ensure the safe and efficient abatement of waste effluent within the thermal reactor apparatus.
    Type: Application
    Filed: November 18, 2004
    Publication date: May 18, 2006
    Inventors: Ho-Man Chiu, Daniel Clark, Shaun Crawford, Jay Jung, Youssef Loldj, Robbert Vermeulen