Abstract: The present invention relates to a nonaqueous electrolyte for a battery, and more particularly to a novel nonaqueous electrolyte for a battery in which a furanone based derivative is added to a conventional nonaqueous electrolyte for the lithium battery to inhibit decomposition of the electrolyte, and thereby the rate of increase of the battery thickness when it is allowed to stand at a high temperature is significantly decreased and capacity storage characteristics at high temperature are improved.

Abstract: A non-aqueous electrolyte solution, including a lithium salt, an organic solvent, one or more succinic acid anhydride compounds, and one or more trialkylsilyl borate compounds.

Abstract: A non-aqueous electrolyte for a lithium secondary battery includes a lithium salt, a basic organic solvent including a carbonate-based solvent, and a halogenated diphenyl ether compound represented by Formula 1: wherein Y is —O— or —R1—OR2—, where R1 and R2 are the same or different, and R1 and R2 are a C1-C5 alkyl group, an alkenyl group, or an alkoxy group, and only one of the phenyl rings is substituted with a halogen X1, where n is equal to 1, 2, 3, or 4 and the halogens in di-, tri-, and tetra-halogen substitutions are the same or different.

Abstract: A non-aqueous electrolyte for a lithium battery includes a non-aqueous organic solvent, the organic solvent including one or more of a carbonate-based solvent, an ester-based solvent, an ether-based solvent, and/or a ketone-based solvent, a lithium salt, and a hexafluoroacetylacetone in an amount of about 0.02 parts by weight to about 10 parts by weight, based on 100 parts by weight of the non-aqueous organic solvent.

Abstract: A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a nonionic surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the nonionic surfactant including one or ore of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.