Patents by Inventor Ho-Seong Nam

Ho-Seong Nam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230357498
    Abstract: The present disclosure relates to a method for preparing a copolyester. More specifically, the present disclosure relates to a method for preparing a copolyester that reduces the use of a cobalt-based coloring agent but minimizes yellowing, by using a specific thermal stabilizer.
    Type: Application
    Filed: August 11, 2021
    Publication date: November 9, 2023
    Applicant: HANWHA SOLUTIONS CORPORATION
    Inventors: Eung Gyu KIM, Ho Seong NAM, Kyoung Won YIM, Ju Mi YUN
  • Patent number: 11214532
    Abstract: Provided is a preparation method for a cyclohexane dimethanol (CHDM), which can have a high trans content through particular conditions, additive addition, or reactant addition, which is controlled in a cyclohexane dicarboxylic acid (CHDA) hydrogenation reaction, and a cyclohexane dimethanol prepared thereby.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: January 4, 2022
    Assignee: HANWHA SOLUTIONS CORPORATION
    Inventors: Jong Kwon Lee, Ki Don Kim, Eun Jeong Kim, Joo Hee Han, Ho Seong Nam
  • Publication number: 20210070682
    Abstract: Provided is a preparation method for a cyclohexane dimethanol (CHDM), which can have a high trans content through particular conditions, additive addition, or reactant addition, which is controlled in a cyclohexane dicarboxylic acid (CHDA) hydrogenation reaction, and a cyclohexane dimethanol prepared thereby.
    Type: Application
    Filed: December 21, 2018
    Publication date: March 11, 2021
    Applicant: HANWHA SOLUTIONS CORPORATION
    Inventors: Jong Kwon LEE, Ki Don KIM, Eun Jeong KIM, Joo Hee HAN, Ho Seong NAM
  • Publication number: 20120021288
    Abstract: The invention provides an anion-deficient lithium transition-metal phosphate as an electrode-active material, which is represented by the chemical formula Li1?xM(PO4)1?y (0?x?0.15, 0?y?0.05). The invention provides a method for preparing said Li1?xM(PO4)1?y, which comprises preparing a precursor of lithium transition-metal phosphate; mixing said precursor with water under reaction conditions of 200˜700 and 180˜550 bar to produce an anion-deficient lithium transition-metal phosphate; and calcining, or granulating and calcining the resultant compound. The invention also provides electrochemical devices employing said Li1?xM(PO4)1?y as an electrode-active material.
    Type: Application
    Filed: January 21, 2010
    Publication date: January 26, 2012
    Applicant: HANWHA CHEMICAL CORPORATION
    Inventors: Kyu Ho Song, Soo Yong Han, Ho Seong Nam, Eui Yong Bang, Se Jin Oh, In Jae Baek, So Yeon Kim, Kyoo Seung Han
  • Patent number: 7497966
    Abstract: The present invention is related to a chemical-mechanical polishing slurry for shallow trench isolation, more concretely, to a chemical-mechanical polishing slurry comprising an aqueous abrasive solution comprised of deionized water, polishing particles, and a polishing particle dispersant; and an aqueous additive solution comprised of a carboxylic acid polymer compound, a nitrogen-containing organic cyclic compound, and an amine-group compound. The removal selectivity of the slurry may be improved by significantly lowering the speed of polishing of nitride film by adding a nitrogen-containing organic cyclic compound to an acrylic acid polymer compound, and by increasing the speed of removal of silicon oxide film by adding an amine-group compound, which is an accelerator of hydrolysis of silicon oxide film.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: March 3, 2009
    Assignee: Hanwha Chemical Corporation
    Inventors: Ho-Seong Nam, Jin-Seo Lee, Gui-Ryong Ahn
  • Publication number: 20070220813
    Abstract: The present invention is related to a chemical-mechanical polishing slurry for shallow trench isolation, more concretely, to a chemical-mechanical polishing slurry comprising an aqueous abrasive solution comprised of deionized water, polishing particles, and a polishing particle dispersant; and an aqueous additive solution comprised of a carboxylic acid polymer compound, a nitrogen-containing organic cyclic compound, and an amine-group compound. The removal selectivity of the slurry may be improved by significantly lowering the speed of polishing of nitride film by adding a nitrogen-containing organic cyclic compound to an acrylic acid polymer compound, and by increasing the speed of removal of silicon oxide film by adding an amine-group compound, which is an accelerator of hydrolysis of silicon oxide film.
    Type: Application
    Filed: March 24, 2005
    Publication date: September 27, 2007
    Applicant: HANWHA CHEMICAL CORPORATION
    Inventors: Ho-Seong Nam, Jin-Seo Lee, Gui-Ryong Ahn
  • Patent number: 6835468
    Abstract: A fluorene-based polymer of the following Formula (I) and electroluminescent devices using the same. wherein, R1, R2, R3 and R4 are same or different and represent hydrogen, aliphatic or alicyclic alkyl or alkoxy groups containing 1 to 22 carbon atoms, aryl or aryloxy group containing 6 to 18 carbon atoms, cyano, cyanoethyl, or an alkyl or aryl derivative of silicon, tin or germanium; X represents diacetylene, diethynyl aryl, divinylaryl group or a single bond; and n is an integer equal to or greater than 1.
    Type: Grant
    Filed: September 4, 2001
    Date of Patent: December 28, 2004
    Assignees: Korea Institute of Science and Technology (KIST), Hanwha Chemical Corporation
    Inventors: Hyun Nam Cho, Young Chul Kim, Jae-Min Hong, Jong-Bok Kim, Doo Kyung Moon, Young Sei Park, Ho Seong Nam
  • Publication number: 20020051895
    Abstract: A fluorene-based polymer of the following Formula (I) and electroluminescent devices using the same.
    Type: Application
    Filed: September 4, 2001
    Publication date: May 2, 2002
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KIST)
    Inventors: Hyun Nam Cho, Young Chul Kim, Jae-Min Hong, Jong-Bok Kim, Doo Kyung Moon, Young Sei Park, Ho Seong Nam