Patents by Inventor Ho Shin KANG

Ho Shin KANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240111433
    Abstract: In some embodiments, a memory system includes a memory device and a host configured to transmit, to the memory device, a command and address (C/A) signal and a clock signal, and to transmit or receive data signals to or from the memory device. Each command that is configured to access the memory device is associated with an access timing parameter. The memory device includes an access parameter timer configured to measure an actual timing value of the access timing parameter, a spec register configured to provide a spec timing value defining an effective timing of the access timing parameter, a comparison circuit configured to compare the actual timing value and the spec timing value, and a mode register configured to store an access timing violation flag that is read by the host when the actual timing value deviates from the spec timing value by exceeding a predetermined range.
    Type: Application
    Filed: May 19, 2023
    Publication date: April 4, 2024
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-Kyu KANG, Jieun SHIN, Ho-Cheol BANG, Haewon LEE
  • Publication number: 20220137516
    Abstract: Disclosed is a substrate treating apparatus including a coating module, an exposure module, a plurality of developing modules, and a transfer unit that performs transfer of a substrate between the modules. The plurality of developing modules include a plurality of post-exposure bake units that perform a bake process on a substrate on which an exposure process is completely performed in the exposure module. The substrate treating apparatus further includes a controller that controls the transfer of the substrate by the transfer unit. When transferring a substrate from the exposure module to the plurality of post-exposure bake units, the controller performs control to select a post-exposure bake unit in which the least delay time occurs, among the plurality of post-exposure bake units and to transfer the substrate to the selected post-exposure bake unit.
    Type: Application
    Filed: October 28, 2021
    Publication date: May 5, 2022
    Inventors: Ho Shin KANG, Tae Woong SEO, Sung Min JO
  • Patent number: 9405194
    Abstract: Provided is a method of a substrate treatment. The method includes providing an operation module with substrates contained in a lot and performing an operation treatment thereon and performing a test treatment on the substrates completed with the operation treatment in a test module. The performing of the test treatment includes determining a substrate to be tested, which is provided to the test module, to allow the test treatment to be completed within an operation treatment time for the substrates in a unit lot.
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: August 2, 2016
    Assignee: Semes Co., Ltd.
    Inventors: Soo Min Hwang, Dong Ho Kim, Won Jin Kim, Ho Shin Kang
  • Publication number: 20140152966
    Abstract: Provided is a method of a substrate treatment. The method includes providing an operation module with substrates contained in a lot and performing an operation treatment thereon and performing a test treatment on the substrates completed with the operation treatment in a test module. The performing of the test treatment includes determining a substrate to be tested, which is provided to the test module, to allow the test treatment to be completed within an operation treatment time for the substrates in a unit lot.
    Type: Application
    Filed: November 27, 2013
    Publication date: June 5, 2014
    Applicant: SEMES CO., LTD.
    Inventors: Soo Min HWANG, Dong Ho KIM, Won Jin KIM, Ho Shin KANG