Abstract: In a liquid supplying unit liquid is supplied from a buffer vessel to an external unit by pressurizing the liquid present in the buffer vessel using gas supplied to the buffer vessel. A pressure measuring member is provided to measure the pressure inside the buffer vessel, and when the pressure inside the buffer vessel is equal to or greater than a preset reference pressure during refilling of the buffer vessel, gas is discharged from the buffer vessel through a vent line.

Abstract: Embodiments disclosed herein are generally directed to a chemical supplying apparatus, a semiconductor manufacturing equipment having the same and a method for supplying chemicals. The apparatus includes a tank, a first sensor, and a second sensor. The tank is filled with a liquid chemical and includes an outlet for the liquid chemical. The first sensor transmits a signal to a surface of the liquid chemical to detect a level of the liquid chemical within the tank. The probe includes a gap within which the liquid chemical can flow and the second sensor detects whether the liquid chemical are present inside the gap.

Abstract: An apparatus for supplying a chemical solution includes a mother tank storing a chemical solution, an intermediate tank disposed in a higher position than the mother tank with a first height difference (h), and the intermediate tank is adapted to receive a fixed amount of chemical solution from the mother tank. The apparatus further includes a bubbling tank disposed in a higher position than the intermediate tank with a second height difference (h?) and the bubbling tank is adapted to receive the fixed amount of the chemical solution from the intermediate tank.

Abstract: A particle analyzing system for a clean room smock includes a mannequin corresponding to the shape of a human body and having a clean room smock placed thereon. A gas supply apparatus is connected to the mannequin, and is operative to discharge a gas at a first set of sites on the mannequin. A particle supply apparatus is connected to the mannequin, and is operative to discharge particles at a second set of sites on the mannequin.

Abstract: An air current guiding apparatus includes a plurality of dampers installed on a filter unit on an inner wall of air supply unit for blowing clean air over wafers loaded in a boat for transfer to a reaction chamber for chemical vapor deposition. Each of the dampers has a certain length and angular orientation to force the air in a designated direction so that the air current in a wafer loading chamber maintains an appropriate velocity and is free from air turbulence, thereby minimizing the number of contaminating particles in the wafer loading chamber.