Abstract: A battery pack includes a plurality of battery cell stacks, each battery cell stack having a plurality of battery cells stacked in a first direction; a pack tray in which the plurality of battery cell stacks are accommodated in a plurality of rows extending in a second direction perpendicular to the first direction, each row having multiple battery cell stacks arranged in the second direction, the pack tray including: a base, a plurality of sidewalls extending from the base, a plurality of first beams extending in the second direction to separate the plurality of rows into groups, and a plurality of partition walls extending in the second direction, each partition wall being located within a corresponding group to separate adjacent battery cells stacks from each other; a pack cover covering an opening portion of the pack tray opposite the base; and a plurality of elastic members.

Abstract: Provided are a method and apparatus for providing a network switching service to a user equipment.

Abstract: Provided are a method and apparatus for a user equipment, a core network, and a second device to enable bidirectional communication for second devices. The method of the second device may include receiving internet protocol (IP) configuration information for automatically configuring an IP version 6 (IPv6) address of the second device from a core network through a user equipment; generating the IPv6 address using information in the IP configuration information; and transmitting the generated IPv6 address to the core network through the UE.

Abstract: Provided are a method and apparatus for providing a multi virtual local area network service to user equipments.

Abstract: A Unified Speech and Audio Codec (USAC) that may process a window sequence based on mode switching is provided. The USAC may perform encoding or decoding by overlapping between frames based on a folding point when mode switching occurs. The USAC may process different window sequences for each situation to perform encoding or decoding, and thereby may improve a coding efficiency.

Abstract: The present disclosure in at least one embodiment provides a wireless communication device, comprising a lower case, an upper radome, coupled to the lower case, creating a storage space between the lower case and the upper radome, an antenna disposed in the storage space, and a plurality of internal substrates, disposed between the antenna and the lower case in the storage space, of which one of the plurality of internal substrates is connected to the antenna, wherein each internal substrate of the plurality of internal substrates is disposed along a first direction parallel to a surface of the lower case facing the plurality of internal substrates.

Abstract: A semiconductor device includes a lower insulating layer on a lower substrate, a lower pad structure inside the lower insulating layer, an upper insulating layer on the lower insulating layer, an upper pad structure inside the upper insulating layer, and an upper substrate on the upper insulating layer. A via plug passes through at least a portion of each of the upper substrate, the upper insulating layer, and the lower insulating layer, and in contact with the upper pad structure and the lower pad structure. The upper pad structure includes upper pad conductive layers and an upper connection layer between the upper pad conductive layers. The upper connection layer includes a conductive pattern having a shape different from a shape of at least one of the upper pad conductive layers. The via plug is in direct contact with the upper pad conductive layers and the upper connection layer.

Abstract: A semiconductor device includes a lower insulating layer on a lower substrate, a lower pad structure inside the lower insulating layer, an upper insulating layer on the lower insulating layer, an upper pad structure inside the upper insulating layer, and an upper substrate on the upper insulating layer. A via plug passes through at least a portion of each of the upper substrate, the upper insulating layer, and the lower insulating layer, and in contact with the upper pad structure and the lower pad structure. The upper pad structure includes upper pad conductive layers and an upper connection layer between the upper pad conductive layers. The upper connection layer includes a conductive pattern having a shape different from a shape of at least one of the upper pad conductive layers. The via plug is in direct contact with the upper pad conductive layers and the upper connection layer.

Abstract: A semiconductor device includes source/drain regions, a gate pattern disposed on the semiconductor substrate between the source/drain regions, and L-shaped spacers that are used as masks in the forming of the source/drain regions. The L-shaped spacers each include a vertical portion covering a side wall of the gate pattern, and a lateral portion extending from the bottom of the vertical portion over the source/drain region. Support portions interposed between the L-shaped spacers and the gate pattern support the lateral portions of the L-shaped spacers such that an air gap is defined between at least the lateral portions of the L-shaped spacers and the source/drain regions. The air gap minimizes the parasitic capacitance associated with the gate electrode of the semiconductor device.

Abstract: A semiconductor device includes source/drain regions, a gate pattern disposed on the semiconductor substrate between the source/drain regions, and L-shaped spacers that are used as masks in the forming of the source/drain regions. The L-shaped spacers each include a vertical portion covering a side wall of the gate pattern, and a lateral portion extending from the bottom of the vertical portion over the source/drain region. Support portions interposed between the L-shaped spacers and the gate pattern support the lateral portions of the L-shaped spacers such that an air gap is defined between at least the lateral portions of the L-shaped spacers and the source/drain regions. The air gap minimizes the parasitic capacitance associated with the gate electrode of the semiconductor device.

Abstract: A semiconductor device includes source/drain regions, a gate pattern disposed on the semiconductor substrate between the source/drain regions, and L-shaped spacers that are used as masks in the forming of the source/drain regions. The L-shaped spacers each include a vertical portion covering a side wall of the gate pattern, and a lateral portion extending from the bottom of the vertical portion over the source/drain region. Support portions interposed between the L-shaped spacers and the gate pattern support the lateral portions of the L-shaped spacers such that an air gap is defined between at least the lateral portions of the L-shaped spacers and the source/drain regions. The air gap minimizes the parasitic capacitance associated with the gate electrode of the semiconductor device.

Abstract: In a method of fabricating a metal oxide semiconductor (MOS) transistor with a lightly doped drain (LDD) structure without spacers, gate electrodes and spacers are formed on a semiconductor substrate. A high density source/drain region is formed using the gate electrodes and the spacers as masks. A low density source/drain region is formed after removing the spacers. It is possible to reduce the thermal stress of the low density source/drain region by forming the high density source/drain region before the low density source/drain region is formed and to increase an area, in which suicide is formed, by forming a structure without spacers. Also, it is possible to simplify processes of fabricating a complementary metal oxide semiconductor (CMOS) LDD transistor by reducing the number of photoresist pattern forming processes in the method.

Abstract: In a method of fabricating a metal oxide semiconductor (MOS) transistor with a lightly doped drain (LDD) structure without spacers, gate electrodes and spacers are formed on a semiconductor substrate. A high density source/drain region is formed using the gate electrodes and the spacers as masks. A low density source/drain region is formed after removing the spacers. It is possible to reduce the thermal stress of the low density source/drain region by forming the high density source/drain region before the low density source/drain region is formed and to increase an area, in which silicide is formed, by forming a structure without spacers. Also, it is possible to simplify processes of fabricating a complementary metal oxide semiconductor (CMOS) LDD transistor by reducing the number of photoresist pattern forming processes in the method.