Patents by Inventor Ho-Woung Kim

Ho-Woung Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8513082
    Abstract: An electrostatic discharge protection device includes a substrate where an active region is defined by an isolation layer, a gate electrode simultaneously crossing both the isolation layer and the active region, and a junction region formed in the active region at both sides of the gate electrode and separated from the isolation layer by a certain distance in a direction where the gate electrode is extended. The electrostatic discharge protection device is able to prevent the increase of a leakage current while securing an electrostatic discharge protection property that a semiconductor device requires.
    Type: Grant
    Filed: July 11, 2012
    Date of Patent: August 20, 2013
    Assignee: Hynix Semiconductor inc.
    Inventors: Jang-Hoo Kim, Ho-Woung Kim
  • Publication number: 20120276704
    Abstract: An electrostatic discharge protection device includes a substrate where an active region is defined by an isolation layer, a gate electrode simultaneously crossing both the isolation layer and the active region, and a junction region formed in the active region at both sides of the gate electrode and separated from the isolation layer by a certain distance in a direction where the gate electrode is extended. The electrostatic discharge protection device is able to prevent the increase of a leakage current while securing an electrostatic discharge protection property that a semiconductor device requires.
    Type: Application
    Filed: July 11, 2012
    Publication date: November 1, 2012
    Inventors: Jang-Hoo KIM, Ho-Woung Kim
  • Patent number: 8242565
    Abstract: An electrostatic discharge protection device includes a substrate where an active region is defined by an isolation layer, a gate electrode simultaneously crossing both the isolation layer and the active region, and a junction region formed in the active region at both sides of the gate electrode and separated from the isolation layer by a certain distance in a direction where the gate electrode is extended. The electrostatic discharge protection device is able to prevent the increase of a leakage current while securing an electrostatic discharge protection property that a semiconductor device requires.
    Type: Grant
    Filed: November 23, 2009
    Date of Patent: August 14, 2012
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jang-Hoo Kim, Ho-Woung Kim
  • Publication number: 20100276755
    Abstract: An electrostatic discharge protection device includes a substrate where an active region is defined by an isolation layer, a gate electrode simultaneously crossing both the isolation layer and the active region, and a junction region formed in the active region at both sides of the gate electrode and separated from the isolation layer by a certain distance in a direction where the gate electrode is extended. The electrostatic discharge protection device is able to prevent the increase of a leakage current while securing an electrostatic discharge protection property that a semiconductor device requires.
    Type: Application
    Filed: November 23, 2009
    Publication date: November 4, 2010
    Inventors: Jang-Hoo KIM, Ho-Woung Kim