Patents by Inventor Ho Yu

Ho Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210388458
    Abstract: The present invention provides a high strength steel plate for a structure and a method of manufacturing same, wherein the high strength steel plate fora structure comprises, by weight %, 0.03% (inclusive) to 0.1% (exclusive) of C, 0.1% (inclusive) to 0.8% (exclusive) of Si, 0.3% (inclusive) to 1.5% (exclusive) of Mn, 0.5% (inclusive) to 1.5% (exclusive) of Cr, 0.1% (inclusive) to 0.5% (exclusive) of Cu, 0.01% (inclusive) to 0.08% (exclusive) of Al, 0.01% (inclusive) to 0.1% (exclusive) of Ti, 0.05% (inclusive) to 0.1% (exclusive) of Ni, 0.002% (inclusive) to 0.07% (exclusive) of Nb, 0.03% or less of P, 0.02% or less of S, and the balance of Fe and unavoidable impurities, and has a microstructure comprising, by area fraction, 20% or more of bainite, less than 80% of polygonal ferrite and acicular ferrite in total, and less than 10% of pearlite and MA as the other phases.
    Type: Application
    Filed: November 8, 2019
    Publication date: December 16, 2021
    Inventors: Jin-Ho Park, Ju-Yeon Yi, Seng-Ho Yu, Bong-Ju Kim
  • Patent number: 11171141
    Abstract: Methods of forming memory devices are described. Some embodiments of the disclosure utilize a low temperature anneal process to reduce bottom voids and seams in low melting point, low resistance metal buried word lines. Some embodiments of the disclosure utilize a high density dielectric cap during a high temperature anneal process to reduce bottom voids in buried word lines.
    Type: Grant
    Filed: February 28, 2020
    Date of Patent: November 9, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Priyadarshi Panda, Seshadri Ganguli, Sang Ho Yu, Sung-Kwan Kang, Gill Yong Lee, Sanjay Natarajan, Rajib Lochan Swain, Jorge Pablo Fernandez
  • Publication number: 20210317570
    Abstract: Methods for selectively depositing on surfaces are disclosed. Some embodiments of the disclosure utilize an organometallic precursor that is substantially free of halogen and substantially free of oxygen. Deposition is performed to selectively deposit a metal film on a non-metallic surface over a metallic surface. Some embodiments of the disclosure relate to methods of gap filling.
    Type: Application
    Filed: April 14, 2020
    Publication date: October 14, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Byunghoon Yoon, Wei Lei, Sang Ho Yu
  • Patent number: 11143534
    Abstract: According to an exemplary embodiment, a microneedle probe device for measuring a sap flow rate of a plant includes: a substrate, of which at least a part is inserted into a plant, and a thickness and a width are microscales; a single metal wire provided on the substrate; a power source, which applies a current to the metal wire for a predetermined time and heats the metal wire; and a processor, which calculates a flow rate of sap through a movement of heat generated in the metal wire according to a flow of the sap within the plant.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: October 12, 2021
    Assignees: Seoul National University R&DB Foundation, Republic Of Korea Rural Development Administration
    Inventors: Jung Hoon Lee, Sang Woong Baek, Eun Yong Jeon, Seung Yul Choi, Kyoung Sub Park, Joon Kook Kwon, Kyung Hwan Yeo, In Ho Yu, Jae Han Lee
  • Publication number: 20210291525
    Abstract: A manufacturing method of narrow type inkjet print head chip is provided and includes steps of: (S1) providing a silicon substrate; (S2) arranging and disposing an active component layer by utilizing a first type photomask on at least two high-precision regions of each of a plurality of inkjet print head chip regions on the silicon substrate; (S3) arranging and disposing a passive component layer by utilizing a second type photomask on the active component layer; and (S4) cutting the silicon substrate according to the inkjet print head chip regions so as to form the plurality of narrow type inkjet print head chips.
    Type: Application
    Filed: March 18, 2021
    Publication date: September 23, 2021
    Applicant: Microjet Technology Co., Ltd.
    Inventors: Hao-Jan Mou, Rong-Ho Yu, Cheng-Ming Chang, Hsien-Chung Tai, Wen-Hsiung Liao, Chi-Feng Huang, Yung-Lung Han
  • Publication number: 20210295884
    Abstract: A nonvolatile memory device may include a plurality of memory planes and a plurality of plane-dedicated pad sets. The plurality of memory planes may include a plurality of memory cell arrays including nonvolatile memory cells and a plurality of page buffer circuits. Each of the plurality of page buffer circuits may be connected to ones of the nonvolatile memory cells included in each of the plurality of memory cell arrays through bitlines. A plurality of plane-dedicated pad sets may be connected to the plurality of page buffer circuits through a plurality of data paths respectively such that each of the plurality plane-dedicated pad sets is dedicatedly connected to each of the plurality of page buffer circuits. A bandwidth of a data transfer may be increased by reducing a data transfer delay and supporting a parallel data transfer, and power consumption may be decreased by removing data multiplexing and/or signal routing.
    Type: Application
    Filed: June 3, 2021
    Publication date: September 23, 2021
    Inventors: HYUN-JIN KIM, Chung-Ho Yu, Yong-Kyu Lee, Jae-Yong Jeong
  • Publication number: 20210291523
    Abstract: A narrow type inkjet print head chip is disclosed and includes a silicon substrate, an active component layer and a passive component layer. The active component layer is stacked on the silicon substrate and includes plural ESD protection units, plural encoder switches, plural discharge protection units and plural heater switches. The ESD protection units, the encoder switches, the discharge protection units and the heater switches are disposed in each of at least two high-precision regions of the active component layer. The corresponding positions and quantities of these components are the same in the at least two high-precision regions. The passive component layer is stacked on the active component layer and includes plural heaters, plural electrode pads, plural encoders and plural circuit traces. The circuit traces are electrically connected to the ESD protection units, the encoder switches, the heater switches, the heaters, the electrode pads and the encoders.
    Type: Application
    Filed: March 19, 2021
    Publication date: September 23, 2021
    Applicant: Microjet Technology Co., Ltd.
    Inventors: Hao-Jan Mou, Rong-Ho Yu, Cheng-Ming Chang, Hsien-Chung Tai, Wen-Hsiung Liao, Chi-Feng Huang, Yung-Lung Han
  • Publication number: 20210288138
    Abstract: A metal-insulator-metal (MIM) capacitor includes a substrate, a first metal layer, a deposition structure, a dielectric layer and a second metal layer. The first metal layer is disposed on the substrate and has a planarized surface. The deposition structure is disposed on the first metal layer, and at least a portion of the deposition structure extends into the planarized surface, wherein the first metal layer and the deposition structure have the same material. The dielectric layer is disposed on the deposition structure. The second metal layer is disposed on the dielectric layer.
    Type: Application
    Filed: April 30, 2020
    Publication date: September 16, 2021
    Inventors: Bo-Wei HUANG, Chun-Wei KANG, Ho-Yu LAI, Chih-Sheng CHANG
  • Publication number: 20210285102
    Abstract: Methods of depositing a metal film are discussed. A metal film is formed on the bottom of feature having a metal bottom and dielectric sidewalls. Formation of the metal film comprises exposure to a metal precursor and an alkyl halide catalyst while the substrate is maintained at a deposition temperature. The metal precursor has a decomposition temperature above the deposition temperature. The alkyl halide comprises carbon and halogen, and the halogen comprises bromine or iodine.
    Type: Application
    Filed: March 11, 2021
    Publication date: September 16, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Byunghoon Yoon, Liqi Wu, Joung Joo Lee, Kai Wu, Xi Cen, Wei Lei, Sang Ho Yu, Seshadri Ganguli
  • Publication number: 20210273031
    Abstract: An organic light-emitting diode display may have thin-film transistor circuitry formed on a substrate. The display and substrate may have rounded corners. A pixel definition layer may be formed on the thin-film transistor circuitry. Openings in the pixel definition layer may be provided with emissive material overlapping respective anodes for organic light-emitting diodes. A cathode layer may cover the array of pixels. A ground power supply path may be used to distribute a ground voltage to the cathode layer. The ground power supply path may be formed from a metal layer that is shorted to the cathode layer using portions of a metal layer that forms anodes for the diodes, may be formed from a mesh shaped metal pattern, may have L-shaped path segments, may include laser-deposited metal on the cathode layer, and may have other structures that facilitate distribution of the ground power supply.
    Type: Application
    Filed: May 14, 2021
    Publication date: September 2, 2021
    Inventors: Chin-Wei Lin, Stephen S. Poon, Warren S. Rieutort-Louis, Cheng-Ho Yu, ChoongHo Lee, Doh-Hyoung Lee, Ting-Kuo Chang, Tsung-Ting Tsai, Vasudha Gupta, Younggu Lee
  • Patent number: 11101337
    Abstract: An organic light-emitting diode display may have thin-film transistor circuitry formed on a substrate. The display and substrate may have rounded corners. A pixel definition layer may be formed on the thin-film transistor circuitry. Openings in the pixel definition layer may be provided with emissive material overlapping respective anodes for organic light-emitting diodes. A cathode layer may cover the array of pixels. A ground power supply path may be used to distribute a ground voltage to the cathode layer. The ground power supply path may be formed from a metal layer that is shorted to the cathode layer using portions of a metal layer that forms anodes, may be formed from a mesh shaped metal pattern, may have L-shaped path segments, and may include laser-deposited metal on the cathode layer. Data lines may be formed from metal layers in the active area to accommodate the rounded corners of the display.
    Type: Grant
    Filed: May 12, 2020
    Date of Patent: August 24, 2021
    Assignee: Apple Inc.
    Inventors: Yuchi Che, Warren S. Rieutort-Louis, Tsung-Ting Tsai, Abbas Jamshidi Roudbari, Jiun-Jye Chang, Ting-Kuo Chang, Shih Chang Chang, Chin-Wei Lin, Stephen S. Poon, Cheng-Ho Yu, ChoongHo Lee, Doh-Hyoung Lee, Vasudha Gupta, Younggu Lee
  • Patent number: 11085554
    Abstract: A micro fluid actuator includes a first substrate, a chamber layer, a vibration layer, a first metal layer, a piezoelectric actuation layer, a second metal layer, a second substrate, an inlet layer, a resonance layer and an aperture array plate. The first substrate includes a plurality of first outflow apertures and a plurality of second outflow apertures. The chamber layer includes a storage chamber. The second metal layer includes an upper electrode pad and a lower electrode pad. While driving power having different phase charges is provided to the upper electrode pad and the lower electrode pad to drive and control the vibration layer to displace in a reciprocating manner, the fluid is inhaled from the exterior through the inlet layer, converged to the storage chamber, compressed and pushes out the aperture array plate, and then is discharged out from the micro fluid actuator to achieve fluid transportation.
    Type: Grant
    Filed: January 13, 2020
    Date of Patent: August 10, 2021
    Assignee: MICROJET TECHNOLOGY CO., LTD.
    Inventors: Hao-Jan Mou, Rong-Ho Yu, Cheng-Ming Chang, Hsien-Chung Tai, Wen-Hsiung Liao, Chi-Feng Huang, Yung-Lung Han, Hsuan-Kai Chen
  • Patent number: 11075276
    Abstract: Methods and apparatus for forming a semiconductor structure such as an NMOS gate electrode are described. Methods may include depositing a first capping layer having a first surface atop a first surface of a high-k dielectric layer; and depositing at least one metal layer having a first surface atop the first surface of the first capping layer, wherein the at least one metal layer includes titanium aluminum silicide material. Some methods include removing an oxide layer from the first surface of the first capping layer by contacting the first capping layer with metal chloride in an amount sufficient to remove an oxide layer. Some methods for depositing a titanium aluminum silicide material are performed by an atomic layer deposition process performed at a temperature of 350 to 400 degrees Celsius.
    Type: Grant
    Filed: October 7, 2019
    Date of Patent: July 27, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Yongjing Lin, Shih Chung Chen, Naomi Yoshida, Lin Dong, Liqi Wu, Rongjun Wang, Steven Hung, Karla Bernal Ramos, Yixiong Yang, Wei Tang, Sang-Ho Yu
  • Patent number: 11060188
    Abstract: Processing methods for depositing aluminum etch stop layers comprise positioning a substrate within a processing chamber, wherein the substrate comprises a metal surface and a dielectric surface; exposing the substrate to an aluminum precursor gas comprising an isopropoxide based aluminum precursor to selectively form an aluminum oxide (AlOx) etch stop layer onto the metal surface while leaving exposed the dielectric surface during a chemical vapor deposition process. The metal surfaces may be copper, cobalt, or tungsten.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: July 13, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Sang Ho Yu, Seshadri Ganguli
  • Patent number: 11049445
    Abstract: A display may have rows and columns of pixels that form an active area for displaying images. A display driver integrated circuit may provide multiplexed data signals to demultiplexer circuitry in the display. The demultiplexer circuitry may demultiplex the data signals and provide the demultiplexed data signals to the pixels on data lines. Gate lines may control the loading of the data signals into the pixels. The display may have a length dimension and a width dimension that is shorter than the length dimension. The data lines may extend parallel to the width dimension and the gate lines may extend parallel to the length dimension such that there are more data lines than gate lines in the display. A notch that is free of pixels may extend into the active area. Data lines extending parallel to the width dimension of the display may be routed around the notch.
    Type: Grant
    Filed: May 9, 2018
    Date of Patent: June 29, 2021
    Assignee: Apple Inc.
    Inventors: Warren S. Rieutort-Louis, Shyuan Yang, Tsung-Ting Tsai, Cheng-Ho Yu, Jae Won Choi, Bhadrinarayana Lalgudi Visweswaran, Abbas Jamshidi Roudbari, Ting-Kuo Chang
  • Patent number: 11048179
    Abstract: An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft direction, and a heater on the head to dissipate heat toward residues in the source vessel, the heater to apply temperature of 200° C. to 800° C.
    Type: Grant
    Filed: January 3, 2020
    Date of Patent: June 29, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ho Yu, Jinhwan Lee, Minseok Choi, Jeonggil Kim, Jongbin Park, Inho Choi
  • Publication number: 20210179190
    Abstract: Disclosed is a lower cross member of a vehicle. The lower cross member includes a core member configured to be disposed on a vehicle floor so as to extend in a width direction of the vehicle, to be formed of a composite material including unidirectional carbon fiber or bidirectional carbon fiber, and to have a cross-section including at least one closed curve, a lower layer configured to extend in an extending direction of the core member, to be disposed between the core member and the vehicle floor, and to be formed of a composite material including a first multi-axial glass fabric, and an upper layer configured to extend in the extending direction of the core member, to be disposed on an upper surface of the core member, and to be formed of a composite material including a second multi-axial glass fabric.
    Type: Application
    Filed: August 17, 2020
    Publication date: June 17, 2021
    Inventors: Hyun Sik Kim, Sang Yoon Park, Deok Hwa Hong, Hee Seouk Chung, Byeong Cheon Lee, Yeun Ho Yu, Young Gyu Kim, Jeong Wan Han, Hyeon Seok Do, Hyun Kyu Shin, Cheol Min Nam, Kum Soo Bae, Seong Jong Kim, Jun Youp Kim
  • Patent number: 11037626
    Abstract: A nonvolatile memory device may include a plurality of memory planes and a plurality of plane-dedicated pad sets. The plurality of memory planes may include a plurality of memory cell arrays including nonvolatile memory cells and a plurality of page buffer circuits. Each of the plurality of page buffer circuits may be connected to ones of the nonvolatile memory cells included in each of the plurality of memory cell arrays through bitlines. A plurality of plane-dedicated pad sets may be connected to the plurality of page buffer circuits through a plurality of data paths respectively such that each of the plurality plane-dedicated pad sets is dedicatedly connected to each of the plurality of page buffer circuits. A bandwidth of a data transfer may be increased by reducing a data transfer delay and supporting a parallel data transfer, and power consumption may be decreased by removing data multiplexing and/or signal routing.
    Type: Grant
    Filed: June 6, 2019
    Date of Patent: June 15, 2021
    Inventors: Hyun-Jin Kim, Chung-Ho Yu, Yong-Kyu Lee, Jae-Yong Jeong
  • Publication number: 20210164079
    Abstract: An embodiment of the present invention provides wear-resistant steel having excellent hardness and impact toughness and a method for producing same, wherein the wear-resistant steel comprises: 0.29-0.37 wt % of carbon (C), 0.1-0.7 wt % of silicon (Si), 0.6-1.6 wt % of manganese (Mn), 0.05 wt % or less of phosphorus (P), 0.02 wt % or less of sulfur (S), 0.07 wt % or less of aluminum (Al), 0.1-1.5 wt % of chromium (Cr), 0.01-0.8 wt % of molybdenum (Mo), 0.01-0.08 wt % of vanadium (V), 50 ppm or less of boron (B), and 0.02 wt % or less of cobalt (Co); further comprises one or more selected from the group consisting of 0.5 wt % or less of nickel (Ni), 0.5 wt % or less of copper (Cu), 0.02 wt % or less of titanium (Ti), 0.05 wt % or less of niobium (Nb), and 2-100 ppm of calcium (Ca); and comprises the remainder of Fe and other inevitable impurities.
    Type: Application
    Filed: December 21, 2018
    Publication date: June 3, 2021
    Inventors: Seng-Ho Yu, Young-Jin Jung, Yong-Woo Kim
  • Publication number: 20210153333
    Abstract: An extreme ultraviolet (EUV) light concentrating apparatus including a main body having a concave inner portion and configured to rotate, a tin generator configured to generate tin drops and spray the tin drops, a tin catcher configured to process the sprayed tin drops, a protective cover configured to block the tin drops from falling into the main body, and a rotation guide configured to rotate the main body may be provided.
    Type: Application
    Filed: January 26, 2021
    Publication date: May 20, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ho YU, Chae-mook LIM, Sung-ho JANG, Min-seok CHOI