Abstract: Apparatus and other embodiments associated with high speed and high breakdown voltage MOS rectifier are disclosed. A Junction All Around structure, where a deep trench structure surrounds and encloses a P-N junction or a MOS structure, is created and applied in various rectifiers. In one embodiment, an enclosed deep trench in ring shape surrounds a vertical MOS structure plus a shallow trench gate in the center to create a device with very high breakdown voltage and very low leakage current. This structure is extended to multiple deep trenches and shallow trenches alternating each other.

Abstract: Apparatus and other embodiments associated with high speed and high breakdown voltage MOS rectifier are disclosed. A Junction All Around structure, where a deep trench structure surrounds and encloses a P-N junction or a MOS structure, is created and applied in various rectifiers. In one embodiment, multiple deep trenches in concentric ring circles enclosed several horizontal P-N junctions in concentric ring circles. In another embodiment, an enclosed deep trench in ring circle surrounds a horizontal P-N junction, which results in a planar N-channel MOS during forward bias. This structure can be extended to multiple deep trenches with associated horizontal P-N junctions.

Abstract: Apparatus and other embodiments associated with high speed and high breakdown voltage rectifier are disclosed. A Junction All Around structure, where a deep trench structure surrounds and encloses a P-N junction or a MOS structure, is created and applied in various rectifiers. In one embodiment, multiple deep trenches in ring shape enclosed a vertical P-N junction. For each deep trench, a corresponding wider ring-shape P+ region is created on top of a N? epi layer. This enclosed deep trench surrounding a vertical P-N junction and a thinner N? epitaxial layer allow higher reverse bias voltage and low leakage current. In another embodiment, an enclosed deep trench in ring shape surrounds a horizontal P-N junction, which results in a planar N-channel MOS during forward bias. The structure can be extended to multiple deep trenches with associated horizontal P-N junctions.

Abstract: Apparatus, methods and other embodiments associated with a high speed and high breakdown voltage Schottky rectifier are disclosed. In one embodiment, the Schottky rectifier has three layers of N-type semiconductor, a first layer of highly doped N-type substrate at the bottom, a second layer of lightly doped epitaxial N-type material above the first layer, and a third layer of very low doping concentration N-type material created by converting the top shallow portion of the second layer without turning into P-type. The Schottky device further includes an enclosed deep trench structure close to the bottom of the second layer and can sustain high reverse bias voltage up to 2,000 volt.

Abstract: Apparatus and other embodiments associated with high speed and high breakdown voltage rectifier are disclosed. A Junction All Around structure, where a deep trench structure surrounds and encloses a P-N junction or a MOS structure, is created and applied in various rectifiers. In one embodiment, multiple deep trenches in ring shape enclosed a vertical P-N junction. For each deep trench, a corresponding wider ring-shape P+ region is created on top of a N? epi layer. This enclosed deep trench surrounding a vertical P-N junction and a thinner N? epitaxial layer allow higher reverse bias voltage and low leakage current. In another embodiment, an enclosed deep trench in ring shape surrounds a horizontal P-N junction, which results in a planar N-channel MOS during forward bias. The structure can be extended to multiple deep trenches with associated horizontal P-N junctions.

Abstract: Apparatus, methods and other embodiments associated with a high speed and high breakdown voltage Schottky rectifier are disclosed. In one embodiment, the Schottky rectifier has three layers of N-type semiconductor, a first layer of highly doped N-type substrate at the bottom, a second layer of lightly doped epitaxial N-type material above the first layer, and a third layer of very low doping concentration N-type material created by converting the top shallow portion of the second layer without turning into P-type. The Schottky device further includes an enclosed deep trench structure close to the bottom of the second layer and can sustain high reverse bias voltage up to 2,000 volt.

Abstract: A field effect transistor, in accordance with one embodiment, includes a metal-oxide-semiconductor field effect transistor (MOSFET) having a junction field effect transistor (JFET) embedded as a body diode.

Abstract: Various stress relief structures are provided for effectively reducing thermal stress on a semiconductor chip in a chip package. Trenches on a metal substrate are created in groups in two-dimension, where each trench is opened from top or bottom surface of the metal substrate and in various shapes. The metal substrate is partitioned into many smaller substrates depending on the number of trench groups and partitions, and is attached to a semiconductor chip for stress relief. In an alternative embodiment, a plurality of cylindrical metal structures are used together with a metal substrate in a chip package for the purpose of heat removal and thermal stress relief on a semiconductor chip. In another alternative embodiment, a metal foam is used together with a semiconductor chip to create a chip package. In another alternative embodiment, a semiconductor chip is sandwiched between a heat sink and a circuit board by solder bumps directly with underfill on the circuit board.

Abstract: A fast recovery rectifier structure with the combination of Schottky structure to relieve the minority carriers during the forward bias condition for the further reduction of the reverse recovery time during switching in addition to the lifetime killer such as Pt, Au, and/or irradiation. This fast recovery rectifier uses unpolished substrates and thick impurity diffusion for low cost production. A reduced p-n junction structure with a heavily p-type doped thin film is provided to terminate and shorten the p-n junction space charge region. This reduced p-n junction with less total charge in the p-n junction to further improve the reverse recovery time. This reduced p-n junction can be used alone, with the traditional lifetime killer method, with the Schottky structure and/or with the epitaxial substrate.

Abstract: Various stress relief structures are provided for effectively reducing thermal stress on a semiconductor chip in a chip package. Trenches on a metal substrate are created in groups in two-dimension, where each trench is opened from top or bottom surface of the metal substrate and in various shapes. The metal substrate is partitioned into many smaller substrates depending on the number of trench groups and partitions, and is attached to a semiconductor chip for stress relief. In an alternative embodiment, a plurality of cylindrical metal structures are used together with a metal substrate in a chip package for the purpose of heat removal and thermal stress relief on a semiconductor chip. In another alternative embodiment, a metal foam is used together with a semiconductor chip to create a chip package. In another alternative embodiment, a semiconductor chip is sandwiched between a heat sink and a circuit board by solder bumps directly with underfill on the circuit board.

Abstract: A fast recovery rectifier structure with the combination of Schottky structure to relieve the minority carriers during the forward bias condition for the further reduction of the reverse recovery time during switching in addition to the lifetime killer such as Pt, Au, and/or irradiation. This fast recovery rectifier uses unpolished substrates and thick impurity diffusion for low cost production. A reduced p-n junction structure with a heavily p-type doped thin film is provided to terminate and shorten the p-n junction space charge region. This reduced p-n junction with less total charge in the p-n junction to further improve the reverse recovery time. This reduced p-n junction can be used alone, with the traditional lifetime killer method, with the Schottky structure and/or with the epitaxial substrate.

Abstract: A field effect transistor, in accordance with one embodiment, includes a metal-oxide-semiconductor field effect transistor (MOSFET) having a junction field effect transistor (JFET) embedded as a body diode.

Abstract: Circuits and methods of dynamic modulation are disclosed. A dynamic modulator is used to reduce measurable conducted and/or radiated electromagnetic interference (EMI). The dynamic modulator is configured to generate either a set of optimal frequency modulation depths or discrete frequencies or both, and dynamically selects them to use over a series of programmable time durations (dwell time). Together with the utilization of Peak, Average or Quasi-Peak (QP) method of measurement, the dynamic modulator can reduce the spectral amplitude of EMI components, in particular the lower harmonics, to effectively pass regulatory requirements. In alternative embodiments, the dynamic modulator is used in a closed loop system to continuously adjust the frequency and the duty cycle of a PWM signal to reduce conducted and/or radiated EMI.

Abstract: A field effect transistor, in accordance with one embodiment, includes a metal-oxide-semiconductor field effect transistor (MOSFET) having a junction field effect transistor (JFET) embedded as a body diode.

Abstract: A fast recovery rectifier structure with the combination of Schottky structure to relieve the minority carriers during the forward bias condition for the further reduction of the reverse recovery time during switching in addition to the lifetime killer such as Pt, Au, and/or irradiation. This fast recovery rectifier uses unpolished substrates and thick impurity diffusion for low cost production. A reduced p-n junction structure with a heavily doped film is provided to terminate and shorten the p-n junction space charge region. This reduced p-n junction with less total charge in the p-n junction to further improve the reverse recovery time. This reduced p-n junction can be used alone, with the traditional lifetime killer method, with the Schottky structure and/or with the epitaxial substrate.

Abstract: This invention discloses a novel apparatus of fully depleted emitter so that the built-in potential between emitter and the base becomes lower and the charge storage between the emitter and base becomes small. This concept also applies to the diodes or rectifiers. With depleted junction, this results in very fast switching of the diodes and transistors. Another novel structure utilizes the strip base structure to achieve lower on resistance of the bipolar transistor. The emitter region of the strip base can be a normal emitter or depleted emitter.

Abstract: A fast recovery rectifier structure with the combination of Schottky structure to relieve the minority carriers during the forward bias condition for the further reduction of the reverse recovery time during switching in addition to the lifetime killer such as Pt, Au, and/or irradiation. This fast recovery rectifier uses unpolished substrates and thick impurity diffusion for low cost production. A reduced p-n junction structure with a heavily doped film is provided to terminate and shorten the p-n junction space charge region. This reduced p-n junction with less total charge in the p-n junction to further improve the reverse recovery time. This reduced p-n junction can be used alone, with the traditional lifetime killer method, with the Schottky structure and/or with the epitaxial substrate.

Abstract: This invention discloses a novel apparatus of fully depleted emitter so that the built-in potential between emitter and the base becomes lower and the charge storage between the emitter and base becomes small. This concept also applies to the diodes or rectifiers. With depleted junction, this results in very fast switching of the diodes and transistors. Another novel structure utilizes the strip base structure to achieve lower on resistance of the bipolar transistor. The emitter region of the strip base can be a normal emitter or depleted emitter.

Abstract: This invention disclosed a novel method of fully depleted emitter so that the built-in potential between emitter and the base becomes lower and the charge storage between the emitter and base becomes small. This concept also applies to the diodes or rectifiers. With depleted junction, this result in very fast switching of the diodes and transistors. Another novel structure utilizes the strip base structure to achieve lower on resistance of the bipolar transistor. The emitter region of the strip base can be a normal emitter or depleted emitter.

Abstract: Circuits and methods of LED dimming are disclosed. Frequency modulation using controlled modulation depth generates deterministic sidebands of both the fundamental frequency and its harmonics. Various filters including low-pass, band-pass, high-pass and combinations of those are used to selectively filter the deterministic frequency components generated by the frequency modulation to achieve LED dimming.