Patents by Inventor Hoyun JEON

Hoyun JEON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing semiconductor device using a plurality of etch stop layers
    Patent number: 10192782
    Abstract: A method of manufacturing the semiconductor device includes providing a first interlayer dielectric layer having a conductive pattern, sequentially forming a first etch stop layer, a second etch stop layer, a second interlayer dielectric layer and a mask pattern on the first interlayer dielectric layer, forming an opening in the second interlayer dielectric layer using the mask pattern as a mask, the opening exposing the second etch stop layer, and performing an etching process including simultaneously removing the mask pattern and the second etch stop layer exposed by the opening to expose the first etch stop layer.
    Type: Grant
    Filed: June 23, 2015
    Date of Patent: January 29, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woojin Lee, VietHa Nguyen, Wookyung You, Doo-Sung Yun, Hyunbae Lee, Byunghee Kim, Sang Hoon Ahn, Seungyong Yoo, Naein Lee, Hoyun Jeon
  • METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING A PLURALITY OF ETCH STOP LAYERS
    Publication number: 20160133512
    Abstract: A method of manufacturing the semiconductor device includes providing a first interlayer dielectric layer having a conductive pattern, sequentially forming a first etch stop layer, a second etch stop layer, a second interlayer dielectric layer and a mask pattern on the first interlayer dielectric layer, forming an opening in the second interlayer dielectric layer using the mask pattern as a mask, the opening exposing the second etch stop layer, and performing an etching process including simultaneously removing the mask pattern and the second etch stop layer exposed by the opening to expose the first etch stop layer.
    Type: Application
    Filed: June 23, 2015
    Publication date: May 12, 2016
    Inventors: Woojin LEE, VietHa NGUYEN, Wookyung YOU, Doo-Sung YUN, Hyunbae LEE, Byunghee KIM, Sang Hoon AHN, Seungyong YOO, Naein LEE, Hoyun JEON