Patents by Inventor Hoa Dao Truong

Hoa Dao Truong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6251560
    Abstract: Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form photoresist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing cyclic olefin polymer having a cyclic olefin monomer having a lactone moiety, the monomer having no oxygen atoms intervening between the lactone moiety and a ring of the cyclic olefin. Preferred lactone moieties are spirolactones (having a 5 or 6 membered ring) directly to a cyclic olefin ring.
    Type: Grant
    Filed: May 5, 2000
    Date of Patent: June 26, 2001
    Assignee: International Business Machines Corporation
    Inventors: Thomas I. Wallow, Robert D. Allen, Phillip Joe Brock, Richard Anthony DiPietro, Hiroshi Ito, Hoa Dao Truong, Pushkara Rao Varanasi